Secondary Ion Mass Spectrometer
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| Brand | Hiden |
|---|---|
| Origin | United Kingdom |
| Model | SIMS Workstation |
| Mass Analyzer Type | Quadrupole |
| Primary Beam Energy | 25 keV Ga⁺ |
| Mass Range | 1000 amu |
| Mass Resolution | 0.5 amu (5% valley between adjacent equal-height peaks) |
| Detection Mode | Pulsed Ion Counting (positive/negative ions) |
| Dynamic Range | 7 decades |
| Spatial Resolution | 50 nm (Ga⁺ beam), 100–150 µm (O₂⁺/Cs⁺ beams) |
| Vacuum System | UHV-compatible, three-stage differential pumping |
| Control Interface | Ethernet LAN, RS232, RS485 |
| Software | MASsoft v6.x (GLP-compliant audit trail, method templating, automated sequence execution) |
| Origin | USA |
|---|---|
| Manufacturer Type | Distributor |
| Origin Category | Imported |
| Model | MIBIscope |
| Price Range | USD 1.4M – 2.8M |
| Instrument Type | Time-of-Flight (TOF) |
| Primary Ion Beam Energy | 30 kV |
| Mass Range | >12,000 u |
| Mass Resolution | 11,000–16,000 (at m/z 150–200) |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI ADEPT-1010 |
| Instrument Type | Quadrupole |
| Primary Beam Energy Range | 0.25–11 keV |
| Mass Range | 1–340 amu |
| Distribution Status | Authorized Distributor (Imported) |
| Brand | PHI |
|---|---|
| Origin | Japan |
| Model | oTOF 3 |
| Instrument Type | Time-of-Flight (TOF) |
| Primary Beam Energy | 30 kV |
| Mass Range | 15,000 u |
| Mass Resolution | 13,500 |
| Configuration | Parallel Imaging MS/MS |
| Charge Neutralization | Dual-beam (low-energy electrons + low-energy inert gas ions), self-regulating, position-resolved |
| Optional Features | Dual-cluster ion source, sub-500 nm HR2 chemical imaging, DE-free acquisition mode, high beam current HR2 imaging, large angular acceptance & depth of field |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI oTOF3+ |
| Type | TOF-SIMS Instrument with TRIFT Analyzer |
| Ion Sources | Liquid Metal Ion Gun (Ga⁺), Optional Ar-GCIB, Cs⁺, O₂⁺ |
| Spatial Resolution | <50 nm (high-resolution mode), <500 nm (high-mass-resolving mode) |
| Automation | Fully Automated Sample Transfer & Unattended Multi-Sample Analysis |
| Charge Neutralization | Dual-Beam Electron/Ar⁺ Neutralization System |
| Optional Features | Parallel Imaging MS/MS, FIB Cross-Sectioning, Cryo-Stage, Detachable Glovebox Integration |
| Compliance | Designed for GLP/GMP environments |