Ultraviolet Photoelectron Spectrometer
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| Brand | Csi-lab |
|---|---|
| Model | HR-ARPES200 |
| Energy Resolution | ≤1.8 meV |
| Base Temperature | ≤6.0 K |
| Photon Flux | ≥6×10¹¹ ph/s |
| Origin | Jiangsu, China |
| Distribution Type | Authorized Distributor |
| Brand | PREVAC |
|---|---|
| Origin | Poland |
| Model | HPPES |
| Pressure Range | 2×10⁻⁹ mbar – 50 mbar |
| Base Pressure (UHV mode) | ≤1×10⁻⁹ mbar (configuration-dependent) |
| Sample Temperature Range | 20 K (LHe/LN₂-cooled) to 1400 °C |
| Analyzer Type | High-Pressure Hemispherical Energy Analyzer (EA15-HP5 / EA15-HP50) |
| X-ray Sources | Dual-anode monochromated AlKα / AgLα and non-monochromated AlKα / MgKα |
| UV Source | Powered He(I)/He(II) discharge lamp |
| Ion Source | Broad-beam Ar⁺ for sputter depth profiling or surface cleaning |
| Neutralizer | Electron flood gun |
| Manipulator | Motorized or manual 4–6 axis, with precise angular and translational control |
| Load-Lock Chamber | Integrated, with linear transfer to analysis chamber |
| Vacuum System | Composite pumping stack including roughing pump, turbomolecular pump (TMP), titanium sublimation pump (TSP), and cryo-shielded ion pump |
| Software Platform | Spectrium (Tango-compatible, PLC-integrated) |
| Compliance | UHV/HPXPS/APXPS/UPS/ARPES/AES/EELS/ISS/IPES/LEIPS standards |
| Brand | PREVAC |
|---|---|
| Origin | Poland |
| Model | PES |
| Base Pressure | ≤1×10⁻¹¹ mbar |
| Analysis Chamber Diameter | Ø310 mm |
| Sample Temperature Range | 20 K (LHe) to 1400 °C |
| Sample Manipulator | 4–6-axis motorized |
| Energy Analyzer | Hemispherical EA15 UHV |
| X-ray Sources | Monochromated dual-anode (AlKα/AgLα) and non-monochromated dual-anode (AlKα/MgKα) |
| UV Source | Powered He-I (21.2 eV) and He-II (40.8 eV) lamps |
| Flood Gun | Electron flood source for charge neutralization |
| Ion Sources | Ar⁺ sputter gun and gas cluster ion beam (GCIB) for depth profiling/cleaning |
| Optional Add-ons | LEED, RGA, IPES/LEIPS, AES, EELS, ISS modules |
| Control Software | Spectrium (Tango-compliant, PLC-integrated) |
| Vacuum System | Composite pumping stack including roughing pump, turbomolecular pump (TMP), ion pump, and titanium sublimation pump (TSP) with LN₂ shroud |