White Light Interferometric Thickness Measurement Instrument
Filter
Showing all 17 results
| Brand | AcuiTik |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | OEM Manufacturer |
| Product Line | NS-Micro Series |
| Wavelength Range | 190–1000 nm |
| Thickness Measurement Range | 1–100 µm |
| Measurement Accuracy | ±1 nm or ±0.2% (whichever is greater) |
| Measurement Precision | 0.02 nm (1σ, 100 measurements on 500 nm SiO₂ reference) |
| Stability | 0.05 nm (2σ mean drift over 20 operational days) |
| Measurement Speed | <1 s per static point |
| Objective Options | 5×, 10×, 15×, 20×, 50×, 100× |
| Spot Size Range | 1–100 µm |
| Sample Diameter Capacity | 1 mm to ≥300 mm |
| Light Source | Deuterium + Tungsten-Halogen Lamp |
| Brand | AcuiTik |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | NS-20 |
| Price Range | USD 7,000 – 35,000 |
| Wavelength Range | 190–1700 nm (configurable UV/VIS/NIR variants) |
| Thickness Measurement Range | 1 nm – 250 µm (dependent on optical configuration) |
| Accuracy | ±1 nm or ±0.2% (UV variant) |
| Precision (repeatability) | 0.02 nm (UV/VIS), 0.1 nm (NIR) |
| Stability (8-hour drift) | ≤0.05 nm (UV/VIS), ≤0.12 nm (NIR) |
| Spot Size | 1.5 mm diameter |
| Measurement Speed | <1 s per single-point acquisition |
| Light Source | Tungsten-halogen + Deuterium lamp (UV), Tungsten-halogen only (VIS/NIR) |
| Sample Diameter Compatibility | 1 mm – 300 mm (custom larger stages available) |
| Brand | AcuiTik |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | NS-20 Pro |
| Price | Upon Request |
| Wavelength Range | 400–700 nm (non-UV, non-actinic) |
| Measurement Range | 15 nm – 1.5 mm |
| Measurement Precision | < 0.02 nm (static repeatability) |
| Spot Size | Standard 0.2 mm (optional micro-spot configuration available) |
| Configuration Options | Benchtop, Portable, and In-Line Integration Capable |
| Brand | AcuiTik |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Model | NS-30 |
| Wavelength Range | 190–1700 nm (configurable UV/VIS/NIR variants) |
| Thickness Measurement Range | 1 nm – 250 µm |
| Accuracy | ±1 nm or ±0.2% (UV variant) |
| Precision | 0.02 nm (UV/VIS), 0.1 nm (NIR) |
| Stability | ≤0.05 nm (UV/VIS), ≤0.12 nm (NIR) |
| Spot Size | 1.5 mm |
| Single-Measurement Time | <1 s |
| Sample Diameter Capacity | 1 mm – 300+ mm |
| Automated Stage Travel | Up to 450 mm × 450 mm |
| Stress & Bow Measurement | Yes |
| Brand | AcuiTik |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Country of Origin | China |
| Model | NS-OEM |
| Wavelength Range | 190–1100 nm |
| Thickness Measurement Range | 1 nm – 1 mm |
| Accuracy | ±2 nm or ±0.2% |
| Static Repeatability | ±0.02 nm |
| Spot Size | 1.5 mm |
| Measurement Speed | <1 s per acquisition |
| Light Source | Tungsten-Halogen Lamp (with optional Deuterium lamp) |
| Probe-to-Host Interface | Fiber Optic (standard length 1.3 m, up to 20 m configurable) |
| Probe Dimensions | Ø19 mm × 86 mm |
| Power Supply | 90–264 VAC, 47–63 Hz |
| Brand | AcuiTik |
|---|---|
| Origin | China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Model | NS-Touch |
| Wavelength Range | 190–1700 nm |
| Thickness Measurement Range | 0.02 µm – 250 µm |
| Thickness Accuracy | ±0.01 µm or ±0.2% (whichever is greater) |
| Brand | AcuiTik |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Domestic (China) |
| Model | NS-Vista |
| Wavelength Range | 190–1700 nm |
| Thickness Measurement Range | 1 nm – 250 µm |
| Accuracy | ±1 nm or ±0.2% (UV configuration) |
| Precision | 0.02 nm (UV/Vis), 0.1 nm (NIR) |
| Stability | 0.05 nm (UV/Vis), 0.12 nm (NIR) |
| Spot Size | Adjustable from 0.2 mm to 1.5 mm |
| Measurement Speed | <1 s per acquisition |
| Light Source | Tungsten-halogen + Deuterium lamp (UV), Tungsten-halogen (Vis/NIR) |
| Sample Diameter Compatibility | 1 mm – 300 mm (or larger) |
| Brand | Applied Spectroscopy |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | TranSpec Lite MC-UVNIR-H |
| Wavelength Range | 190–1020 nm |
| Measurement Range | 0.8–100 µm |
| Accuracy | ±0.005 µm |
| Repeatability | ±0.002 µm (per standard WEG test) |
| Brand | Atometrics |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Manufacturer |
| Product Category | Domestic |
| Model | AF T010 |
| Pricing | Upon Request |
| Brand | Chotest |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | W1 |
| Measurement Volume | 140 × 100 × 100 mm |
| Optical Configuration | White LED Illumination, 1024 × 1024 Imaging Sensor, Standard 10× Interference Objective (Optional: 2.5×, 5×, 20×, 50×, 100×), Standard 0.5× Optical Zoom (Optional: 0.375×, 0.75×, 1×), 3-Position Manual Objective Turret (Optional: 5-Position Motorized), XY Stage Travel: 140 × 100 mm (320 × 200 mm Platform), Z-Scan Range: 10 mm, Max. Sample Load: 10 kg, Host Dimensions: 700 × 606 × 920 mm |
| Brand | Chotest |
|---|---|
| Origin | Guangdong, China |
| Model | W293 |
| Measurement Area | 140 × 100 mm |
| Type | Non-contact Optical 3D Surface Metrology System |
| Compliance | ISO 25178-2, ISO 25178-601, VDI/VDE 2634 Part 3 |
| Software Certification | FDA 21 CFR Part 11–compliant audit trail & electronic signature support (optional module) |
| Vertical Resolution | Sub-nanometer (≤0.1 nm typical) |
| Lateral Resolution | ≤0.5 µm (dependent on objective lens) |
| Z-Scan Range | Up to 10 mm (configurable with high-precision PZT or motorized stage) |
| Automation | Auto-focus, auto-fringe search, auto-brightness adjustment, multi-region stitching, programmable stage navigation |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | Filmetrics (a KLA company) |
| Type | Benchtop Spectroscopic Reflectometry System |
| Model | F3-sX |
| Wavelength Options | 980 nm / 1310 nm / 1550 nm |
| Thickness Range | 15 nm – 3 mm (depending on configuration and film type) |
| Spot Size | 10 µm |
| Material Library | >130 preloaded optical constants |
| Software | FILMeasure 8 (local acquisition & analysis), FILMeasure Standalone (remote data processing) |
| Compliance | Designed for semiconductor fab, R&D, and QC environments supporting GLP/GMP traceability workflows |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Imported Instrument |
| Model | F54 Series |
| Pricing | Upon Request |
| Thickness Range | 4 nm – 100 µm (depending on configuration) |
| Wavelength Range | 190–1700 nm (F54-UVX) |
| Spot Size | Down to 1 µm (with 50× objective) |
| Aperture Options | 500, 250, 100, and 50 µm |
| Measurement Speed | Up to 2 points per second |
| Maximum Sample Diameter | 450 mm |
| Built-in Material Library | >130 refractive index & extinction coefficient datasets |
| Compliance | ASTM F398, ISO/IEC 17025-compatible operation environment |
| Software | Filmetrics F54 Metrology Suite v6.x (Windows 10/11, USB 3.0 interface) |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Imported Instrument |
| Model | F54-XY Series |
| Pricing | Upon Request |
| Thickness Range (F54-XY) | 20 nm – 50 µm |
| Wavelength Range (F54-XY) | 380–1050 nm |
| Thickness Range (F54-XY-UV) | 4 nm – 35 µm |
| Wavelength Range (F54-XY-UV) | 190–1100 nm |
| Thickness Range (F54-XY-NIR) | 100 nm – 120 µm |
| Wavelength Range (F54-XY-NIR) | 950–1700 nm |
| Thickness Range (F54-XY-EXR) | 20 nm – 120 µm |
| Wavelength Range (F54-XY-EXR) | 380–1700 nm |
| Thickness Range (F54-XY-UVX) | 4 nm – 120 µm |
| Wavelength Range (F54-XY-UVX) | 190–1700 nm |
| Maximum Sample Size (F54-XY-200) | 200 mm |
| Maximum Sample Size (F54-XYT-300) | 300 mm |
| Measurement Speed | Up to 2 fields of view per second |
| Stage Type | Motorized XY stage (F54-XY-200) |
| Pattern Recognition | Yes, supports both arrayed and non-arrayed wafers |
| Software | FILMapper v6.x or later |
| Compliance | NIST-traceable calibration standards included |
| Material Library | >130 built-in optical constants |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | Profilm 3D |
| Measurement Principle | Vertical Scanning Interferometry (VSI) & Phase-Shifting Interferometry (PSI) |
| Thickness Range (VSI) | 50 nm – 100 mm |
| Thickness Range (PSI) | 0 – 3 µm |
| Reflectance Range | 0.05% – 100% |
| Piezo Scan Range | 500 µm |
| XY Stage Options | 100 mm × 100 mm or 200 mm × 200 mm |
| Compliance | ISO 25178-604, ISO 9000, ASME B46.1 |
| Roughness Parameters | 47 standardized (ASME Y14.36M, ISO 4287, ISO 25178-2) |
| Software | ProfilmOnline cloud-based analysis platform |
| Brand | Rtec |
|---|---|
| Origin | Switzerland |
| Model | FT-100 |
| Thickness Range | 1 nm – 1.8 mm |
| Wavelength Range | 200 nm – 1700 nm |
| Precision | <0.01 nm or 0.01% |
| Stability | <0.02 nm or 0.03% |
| Spot Size | 4 µm – 200 µm (optional 2 mm field) |
| Measurement Capabilities | Single/multilayer thickness, refractive index (n), extinction coefficient (k), reflectance, transmittance |
| Sample Compatibility | Transparent, semi-transparent, low-absorption films—including liquid films and air-gap layers |
| Platform Integration | Compatible with XY motorized stages for full-sample thickness mapping |
| Brand | Rtec |
|---|---|
| Origin | Switzerland |
| Model | UP-WLI |
| Imaging Modes | White Light Interferometry (WLI), Confocal Microscopy, Dark-Field Microscopy, Bright-Field Microscopy |
| Vertical Measurement Range | up to 100 mm |
| XY Stage Resolution | 0.1 µm |
| Standard Motorized Stage | 150 × 150 mm (optional 210 × 310 mm) |
| Tilt Stage | ±6° |
| Automated Stitching Capability | Yes |
| Head Options | Sigma Head (WLI-only) / Lambda Head (WLI + Confocal + Dark-Field + Bright-Field) |
| Compliance | ASTM E2923, ISO 25178-2, ISO 4287, USP <1059>, FDA 21 CFR Part 11 (software audit trail enabled) |