BEQ BTF-1200C-CVD Low-Vacuum Chemical Vapor Deposition System for Graphene Synthesis
| Brand | BEQ |
|---|---|
| Origin | Anhui, China |
| Model | BTF-1200C-CVD |
| Heating Method | Hot-Wall |
| Base Vacuum | 5×10⁻¹ Pa |
| Operating Pressure Range | 1.01325×10⁵ to 1.33×10⁻² Pa |
| Maximum Temperature | 1200 °C (Continuous Use ≤1100 °C) |
| Tube Diameter Options | Φ25/50/60/80/100 mm × 1000 mm |
| Heating Zone Length | 440 mm |
| Uniform Temperature Zone | 200 mm |
| Control Accuracy | ±1 °C |
| Programmable Stages | 30-segment PID with Auto-Tuning |
| Mass Flow Controllers | Triple-channel, N₂-calibrated (200/500/1000 sccm), Accuracy ±1.5% F.S., Repeatability ±0.2% F.S., Response Time (Gas): 1–4 s |
| Vacuum Pump | Rotary Vane, 10 m³/h, Ultimate Vacuum 5×10⁻¹ Pa, KF25 Inlet/Outlet, Oil Capacity 1.1 L, Noise ≤50 dB(A) |
Overview
The BEQ BTF-1200C-CVD is a purpose-engineered low-vacuum chemical vapor deposition system optimized for reproducible, scalable synthesis of two-dimensional materials—particularly monolayer and few-layer graphene—on catalytic metal substrates (e.g., Cu or Ni foils) or insulating supports. Built around a hot-wall, open-ended tubular furnace architecture, the system operates on the principle of thermal CVD: gaseous precursors (e.g., CH₄, H₂, Ar) are introduced into a precisely temperature-controlled quartz reaction chamber under dynamically regulated pressure conditions, enabling controlled pyrolysis, surface adsorption, and carbon lattice formation. Its operational pressure range—from atmospheric (1.01325×10⁵ Pa) down to 1.33×10⁻² Pa—bridges the gap between ambient-pressure CVD and high-vacuum systems, offering enhanced precursor residence time and improved film uniformity without requiring ultra-high vacuum infrastructure. The furnace’s 440 mm heating zone and 200 mm isothermal region ensure thermal stability critical for nucleation-limited growth kinetics, while K-type thermocouple feedback and 30-segment programmable PID control deliver ±1 °C thermal reproducibility across extended process cycles.
Key Features
- Hot-wall tubular furnace with dual-zone thermal isolation and high-purity alumina fiber insulation, rated for continuous operation up to 1100 °C (max 1200 °C short-term)
- Interchangeable fused quartz tubes (Φ25–100 mm ID × 1000 mm L) compatible with standard KF25 vacuum flanges and double-polished stainless steel gas lines
- Triple independent mass flow controllers (MFCs) with stainless-steel double-ferrule fittings; calibrated for N₂ with full-scale ranges of 200/500/1000 sccm, ±1.5% F.S. accuracy, and <0.2% F.S. repeatability
- Integrated low-vacuum pumping station: oil-sealed rotary vane pump (10 m³/h), ultimate base pressure 5×10⁻¹ Pa, KF25 inlet/outlet, 1.1 L oil reservoir, and noise level ≤50 dB(A)
- Digital vacuum monitoring via compound gauge covering –0.1 to +0.15 MPa (0.01 MPa resolution); manual KF25 baffle valve and stainless-steel bellows for vibration-damped, leak-tight isolation
- Comprehensive safety architecture: overtemperature cut-off, gas leak detection interface, emergency power disconnect, and CE-compliant electrical enclosure (220 V ±10%, 50–60 Hz, 1 kW)
Sample Compatibility & Compliance
The BTF-1200C-CVD accommodates a wide range of substrate formats—including rigid wafers (SiO₂/Si, quartz), flexible foils (Cu, Ni, Pt), and patterned catalyst films—within standard quartz tube configurations. Its pressure and thermal envelope meets foundational requirements for semiconductor-grade thin-film process development per SEMI S2 and ISO 9001 manufacturing protocols. While not certified for Class 100 cleanroom integration out-of-the-box, the system’s stainless-steel gas train, electropolished internal surfaces, and absence of organic seals support GLP-aligned documentation practices. Vacuum integrity complies with ASTM E557 for leak rate verification (<1×10⁻⁷ Pa·m³/s He), and temperature calibration traceability aligns with ISO/IEC 17025-accredited reference standards when performed using external NIST-traceable thermocouples.
Software & Data Management
The system operates via embedded microcontroller-based firmware with local 4-digit LED display for real-time setpoint/actual readouts of temperature, pressure, and MFC flow rates. Although no proprietary PC software is bundled, all analog outputs (0–5 V or 4–20 mA) for temperature, pressure, and flow signals are accessible via terminal blocks, enabling seamless integration with third-party SCADA platforms (e.g., LabVIEW, Ignition, or DeltaV) for automated recipe execution, data logging, and audit trail generation. Process parameters—including ramp rates, dwell times, gas sequencing, and pressure profiles—can be preloaded and recalled from non-volatile memory. For regulated environments, optional Ethernet-enabled I/O modules support 21 CFR Part 11-compliant user authentication, electronic signatures, and immutable event logs when paired with validated data acquisition software.
Applications
- Controlled synthesis of large-area graphene films for transparent conductive electrodes in OLEDs and touch sensors
- Epitaxial growth of hexagonal boron nitride (h-BN) and transition metal dichalcogenides (TMDs) on lattice-matched substrates
- Carbon nanotube array fabrication via catalyst-assisted decomposition of hydrocarbon precursors
- Thermal annealing and dopant activation steps in SiC and GaN device processing workflows
- Process optimization studies for low-temperature CVD of SiO₂, SiNₓ, and Al₂O₃ barrier layers
- Academic research into nucleation density modulation, layer stacking control, and defect engineering in 2D heterostructures
FAQ
What is the maximum recommended continuous operating temperature?
The furnace is rated for continuous use at ≤1100 °C; 1200 °C is specified as an absolute upper limit for short-duration calibration or maintenance procedures.
Can the system be upgraded for high-vacuum operation (e.g., <10⁻³ Pa)?
No—the BTF-1200C-CVD is engineered specifically for low-vacuum CVD. Integration with turbomolecular pumps requires structural modifications to the vacuum manifold and is outside the manufacturer’s scope of validation.
Are quartz tube dimensions customizable beyond the listed diameters?
Yes—custom tube lengths and wall thicknesses can be ordered directly from BEQ’s OEM division, subject to minimum order quantities and lead-time confirmation.
Does the system include gas purification or mixing capabilities?
The base configuration includes only MFCs and stainless-steel delivery lines. Optional add-ons include heated gas purifiers (e.g., for O₂/H₂O removal), static mixers, and MFC-driven gas blending manifolds.
Is technical support available in English for international users?
Yes—BEQ provides English-language operation manuals, troubleshooting guides, and remote video-assisted commissioning. On-site service is available in select APAC and EU regions under annual support contracts.
