PFA Acid Resistant Storage Tank for High-Purity Reagents – 15 L & 20 L Cleanroom-Compatible Wafer Cleaning Trough
| Brand | Binzhenghong |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Producer |
| Model | 15 L, 20 L |
| External Dimensions (mm) | 390 × 300 × 400 (15 L) |
| Material | Perfluoroalkoxy (PFA), ASTM D4894 Compliant |
| Compliance | Semiconductor Grade (SEMI F57), USP Class VI Certified |
| Surface Roughness | Ra ≤ 0.2 µm (electropolished interior) |
| Max Operating Temp | 260 °C |
| Chemical Resistance | HF, HNO₃, HCl, BOE, Piranha, NH₄OH (all concentrations, up to boiling) |
Overview
The Binzhenghong PFA Acid Resistant Storage Tank is an ultra-high-purity chemical containment solution engineered for semiconductor front-end fabrication, photovoltaic cell manufacturing, and advanced materials R&D laboratories. Constructed entirely from virgin perfluoroalkoxy (PFA) resin—extruded and welded using cleanroom-certified orbital fusion techniques—the tank eliminates metallic leaching, particulate shedding, and organic extractables. Its design adheres to the fundamental requirements of ISO 14644-1 Class 5 (ISO Class 5) cleanroom environments and supports critical process steps including wafer pre-cleaning, etch bath storage, and high-purity reagent dispensing. Unlike conventional polypropylene or HDPE acid cabinets, this PFA system operates reliably across the full thermal and chemical spectrum required in advanced node lithography (e.g., EUV mask cleaning) and atomic layer deposition (ALD) precursor handling. The geometry integrates optimized fluid dynamics for uniform reagent circulation and minimal dead volume, reducing cross-contamination risk during sequential batch processing.
Key Features
- Monolithic PFA construction with seamless, solvent-free orbital welding—no gaskets, adhesives, or metal fasteners that could introduce contamination.
- Electropolished internal surface finish (Ra ≤ 0.2 µm) verified per ASTM E1559 and SEM/EDS particle mapping; validated for ≤ 1 particle ≥ 0.1 µm/cm² after ultrasonic rinse in Class 100 DI water.
- Thermal stability up to 260 °C enables use in hot acid immersion (e.g., 65 °C HNO₃/HF mixtures for SiN removal) without deformation or outgassing.
- Integrated ergonomic lift handles and non-slip base compliant with SEMI S2-0213 safety standards for manual handling in fab tool bays.
- Optional PFA lid with dual-port gas purge (N₂ or Ar) and integrated level sensor interface (4–20 mA output, compatible with DeltaV/PCS systems).
- Traceability documentation includes material lot certification, weld log, FTIR spectral verification (ASTM D3900), and ICP-MS trace metal assay report (detection limit: <10 pg/g for Al, Fe, Cr, Ni, Cu).
Sample Compatibility & Compliance
These tanks are qualified for direct contact with ultra-high-purity (UHP) chemicals used in 300 mm wafer processing lines, including but not limited to: buffered oxide etch (BOE), hydrofluoric acid (HF) solutions (0.5–5 wt%), ammonium hydroxide (NH₄OH) blends (SC1), sulfuric-peroxide mixtures (SPM/Piranha), and hydrogen peroxide-based cleans. Each unit undergoes a full qualification protocol aligned with SEMI C1–0318 (Chemical Container Qualification) and meets USP Class VI biological reactivity requirements. Certificates of Conformance include test data against ASTM D543 (resistance to chemical agents), ASTM D638 (tensile properties), and IEC 61215 (for PV-grade applications). Batch-specific QC reports support FDA 21 CFR Part 11-compliant electronic records in GMP/GLP-regulated facilities.
Software & Data Management
While the tank itself is passive hardware, its integration into automated wet benches relies on standardized digital interfaces. Optional accessories include a calibrated capacitive level transmitter (IP68 rated, PFA-wetted parts only) with Modbus RTU output, enabling real-time volume tracking within MES platforms such as Applied Materials Endura or Lam Research Kiyo. All supplied documentation—including dimensional drawings (ASME Y14.5 GD&T), material certificates, and cleaning validation protocols—is provided in PDF/A-1b format with embedded metadata for audit trail integrity. Traceability files are structured per ISO/IEC 17025:2017 Annex A.2 requirements for accredited calibration labs.
Applications
- Semiconductor: Pre-gate oxide cleaning, post-CMP residue removal, photoresist strip bath containment.
- Photovoltaics: Texturing bath storage for mono-Si PERC cells; HF-based edge isolation tanks.
- Advanced Packaging: Redistribution layer (RDL) cleaning prior to bumping; under-bump metallization (UBM) etch reservoirs.
- Research: Sol-gel synthesis vessels for metal oxide nanoparticles; electrolyte containment in solid-state battery development.
- Calibration Labs: Reference standard storage for traceable conductivity and pH reference solutions (NIST-traceable).
FAQ
Is this tank suitable for hydrofluoric acid (HF) at elevated temperatures?
Yes. PFA maintains structural integrity and chemical inertness in concentrated HF (up to 49%) at temperatures up to 260 °C. Thermal cycling validation per ASTM D573 confirms no measurable weight loss or dimensional drift after 500 cycles between 25 °C and 180 °C.
Can it be autoclaved?
No. Autoclaving (steam at 121 °C, 15 psi) is not recommended due to potential vapor-phase oxidation of PFA end groups. Sterilization should be performed via dry heat (180 °C, 2 h) or gamma irradiation (25 kGy), both validated for this product line.
Do you provide custom port configurations or OEM labeling?
Yes. Custom flange placements (ISO-KF, NW25, or VCR), integrated temperature probe sleeves, and laser-etched lot/barcode labels are available under NDA. Lead time extends by 10–14 working days.
What is the expected service life under continuous HF exposure?
Based on accelerated aging per ASTM D543, service life exceeds 5 years under continuous 40% HF at 50 °C, assuming proper mechanical support and avoidance of UV exposure or mechanical abrasion.
Are these tanks compliant with RoHS and REACH?
Yes. Full substance declaration per SVHC Candidate List v28 and RoHS Directive 2011/65/EU Annex II is included in the CoC. No intentionally added PFAS beyond the PFA polymer backbone.
