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| Brand | Aibro / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | OEM Manufacturer |
| Region of Origin | Domestic (China) |
| Model | GVC-2200 |
| Target Materials | Gold, Platinum, Silver, Copper, Aluminum, Lead |
| Target Diameter | 57 mm |
| Control Modes | Manual & Automatic |
| Chamber Dimensions | Ø128 × 130 mm |
| Sample Stage | Ø63 mm with 12 SEM stub slots |
| Sputtering Gas | Argon or Ambient Air |
| Input Voltage | AC 220 V ±10%, 50 Hz |
| Max DC Sputtering Voltage | 2400 V |
| Max Power Consumption (Host + Mechanical Pump) | 500 W |
| Vacuum Pump | Two-stage rotary vane pump, 1 L/s pumping speed |
| Operating Temperature | 5–40 °C |
| Relative Humidity (Operating) | <60% RH |
| Storage Conditions | –10 to 60 °C, <80% RH |
| Safety Protections | Overcurrent & Dual Vacuum Interlock |
| Brand | Aibo |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | AL-900 |
| Pricing | Available Upon Request |
| Brand | Abel/Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer | Yes |
| Country of Origin | China |
| Model | AL-1600 |
| Vacuum Base Pressure | ≤5×10⁻³ Pa (without Ar flow) |
| Acceleration Voltage Range | 200–6000 V |
| Sample Stage | Rotatable |
| Ion Source | Single Ion Gun |
| Cooling Option | Thermoelectric (optional) |
| Glovebox Integration | Yes |
| Primary Functions | Plasma Cleaning, Ion Beam Sputter Deposition, Reactive Ion Beam Etching (with reactive gas introduction) |
| Beam Uniformity | Optimized for Ø25 mm and Ø50 mm substrates |
| Typical Deposited Grain Size | ~3 nm |
| Low-Energy Ion Impact | Minimized substrate damage, suitable for thermally sensitive samples |
| In-situ Cleaning & Deposition | Integrated within single vacuum chamber |
| Control System | Digital, Programmable, Automated |
| Brand | Abbe / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | OEM Manufacturer |
| Region Category | Domestic (China) |
| Model | AL-2000 |
| Pricing | Upon Request |
| Sample Diameter Capacity | Ø0–25 mm |
| Ultimate Vacuum | 5 × 10⁻³ Pa (without Ar gas) |
| Acceleration Voltage Range | 200–10,000 V |
| Brand | Abel / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | AL-2600 |
| Pricing | Upon Request |
| Brand | Abel/Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Region Classification | Domestic (China) |
| Model | AL-1000 |
| Pricing | Upon Request |
| Maximum Sample Diameter | Ø25 mm and Ø50 mm |
| Minimum Particle Size | ~3 nm |
| Ion Beam Energy Range | 200–6000 V |
| Base Vacuum | ≤5×10⁻³ Pa (without Ar flow) |
| Sample Stage | Motorized Rotation |
| Cooling Option | Peltier-based Semiconductor Cooling (optional) |
| Integrated Functions | Plasma Cleaning + Ion Beam Sputtering + Reactive Ion Beam Etching (with reactive gas inlet) |
| Control System | Digital Automated Controller with Real-time Parameter Logging |
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