Ion Sputter Coaters
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Showing 1–30 of 45 results
| Brand | Aibro / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | OEM Manufacturer |
| Region of Origin | Domestic (China) |
| Model | GVC-2200 |
| Target Materials | Gold, Platinum, Silver, Copper, Aluminum, Lead |
| Target Diameter | 57 mm |
| Control Modes | Manual & Automatic |
| Chamber Dimensions | Ø128 × 130 mm |
| Sample Stage | Ø63 mm with 12 SEM stub slots |
| Sputtering Gas | Argon or Ambient Air |
| Input Voltage | AC 220 V ±10%, 50 Hz |
| Max DC Sputtering Voltage | 2400 V |
| Max Power Consumption (Host + Mechanical Pump) | 500 W |
| Vacuum Pump | Two-stage rotary vane pump, 1 L/s pumping speed |
| Operating Temperature | 5–40 °C |
| Relative Humidity (Operating) | <60% RH |
| Storage Conditions | –10 to 60 °C, <80% RH |
| Safety Protections | Overcurrent & Dual Vacuum Interlock |
| Brand | Angstrom Sciences |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported |
| Model | Backing Plates |
| Target Material | Precious Metals |
| Packaging | Inert Gas Sealed |
| Brand | BEQ |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Authorized Distributor |
| Target Market | Domestic (China) |
| Target Applications | SEM Sample Preparation |
| Sputtering Target Diameter | 58 mm |
| Sample Stage Diameter | 40 mm (accommodates up to six standard sample cups) |
| Chamber Dimensions | Ø100 mm × 130 mm (height) |
| Vacuum System | Direct-coupled two-stage rotary vane pump (RVD-2), pumping speed: 2 L/s, ultimate pressure: 5 × 10⁻² Pa |
| Vacuum Gauge | Pirani gauge |
| Process Gas Options | Air or high-purity argon (dedicated Ar inlet with fine-flow micro-regulation valve) |
| Operating Pressure Range | Adjustable from ~1–20 Pa via precision bleed valve |
| Safety Interlock | Automatic cutoff at 20 Pa chamber pressure |
| Brand | Boyuan Weina / VPI |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | SD-900M Magnetron Sputter Coater |
| Target Materials | Au, Ag, Pt, etc. |
| Target Diameter & Thickness | φ50 mm × 0.1 mm |
| Control Mode | Manual and Programmable Auto Mode |
| Chamber Dimensions | φ160 mm × 120 mm (D × H) |
| Sample Stage Diameter | 50 mm (compatible with 70 mm optional) |
| Sputtering Gases | Ar, N₂, O₂, and other process gases |
| Maximum DC Voltage | −1600 V |
| Max Sputtering Current | 100 mA |
| Base Pressure | ≤4 × 10⁻² mbar |
| Pumping Speed | 2 L/s (VRD-8 rotary vane pump) |
| Power Input | 220 V AC, 50 Hz (110 V option available) |
| Deposition Rate | ~40 nm/min (Au, under optimized Ar plasma conditions) |
| Brand | BRIGHT |
|---|---|
| Origin | United Kingdom |
| Manufacturer | BRIGHT (UK) Co., Ltd. |
| Model | KAS-2000F |
| Target Material | Au/Pt (Au standard) |
| Target Diameter | 50 mm |
| Chamber Internal Diameter | 100 mm |
| Sample Stage Dimensions | 420 mm (W) × 220 mm (D) × 230 mm (H) |
| Operating Pressure | 0.1 Torr |
| Maximum Acceleration Voltage | 3 kV |
| Ion Current Range | 0–9 mA |
| Control Mode | Fully Automatic |
| Weight | 10 kg |
| Category | Ion Sputter Coater for SEM/TEM Sample Preparation |
| Brand | Cressington |
|---|---|
| Origin | United Kingdom |
| Model | 208HR |
| Target Materials | Au, Pt, Pt/Pd, AgI, Ir |
| Target Diameter | 57 mm |
| Control Mode | Automatic |
| Chamber Diameter | 150 mm |
| Sample Stage | 100 mm diameter, rotatable and tilt-adjustable |
| Sputtering Gas | Argon |
| Vacuum System | Integrated turbomolecular pumping (implied by HR designation and industry standard) |
| Cooling | Cold-stage sputtering architecture |
| Compliance | Designed for SEM/EPMA sample preparation per ISO 16700 and ASTM E1558 practices |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Model | ETD-2000MH |
| Target Material | Multiple weak-magnetic targets (e.g., Au, Ag, Pt) |
| Target Diameter | 60–80 mm |
| Control Mode | Manual |
| Chamber Dimensions | Borosilicate glass, Ø180 mm × H240 mm |
| Sample Stage Diameter | 180 mm |
| Sputtering Gases | Ar, N₂, O₂, or custom gas mixtures |
| Ultimate Vacuum | ≤5×10⁻⁵ Pa |
| Pumping System | Turbo-molecular pump (80 L/s) + Two-stage rotary vane backing pump |
| Operating Voltage | 220 V, 50 Hz |
| Sputtering Current Range | 0–500 mA |
| Standard Target | Au (60 mm Ø × 0.1 mm thick) |
| Optional Targets | Ag, Pt, Cr, NiCr, C, etc. |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Model | ETD-80AF |
| Target Material | Carbon Rod |
| Control Method | Manual |
| Chamber Dimensions (D×H) | 170 mm × 200 mm |
| Sample Stage Diameter | 170 mm |
| Base Pressure | 2×10⁻² mbar |
| Operating Voltage | 220 V, 50 Hz |
| Maximum Evaporation Current | 100 A |
| Adjustable Evaporation Current Range | 0–80 A |
| Vacuum Pump | High-Performance Two-Stage Rotary Vane Pump (2 L/s) |
| Compatible Substrates | Non-conductive, beam-sensitive specimens (e.g., biological tissues, polymers, ceramics) |
| Brand | EMCN |
|---|---|
| Origin | Imported |
| Model | 108A |
| Target Material | Pure Gold (Au) |
| Target Diameter | 58 mm |
| Chamber Dimensions | 120 mm OD × 120 mm H (4.75″ × 4.75″) |
| Sample Stage | 12-position SEM pin-type holder, height adjustable from 0–60 mm |
| Sputtering Gas | Argon (Ar) or compressed dry air |
| Control Mode | Fully automatic with programmable time/pressure/current logic |
| Vacuum Range | Atmospheric pressure down to ≤1 × 10⁻³ mbar |
| Operating Voltage | 200–240 VAC, 50 Hz |
| Power Consumption | 300 W |
| Cooling | Passive (low-heat “cold” sputtering design) |
| Optional Thickness Monitoring | MTM-20 quartz crystal microbalance (QCM) interface supported |
| Brand | Kojin (Hefei) |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Authorized Distributor |
| Region of Manufacture | Domestic (China) |
| Model | VTC-3RF |
| Price Range | USD 7,000 – 14,000 |
| Input Power | 220 VAC, 50/60 Hz, Single-Phase, 800 W (including vacuum pump) |
| RF Power Supply | 13.56 MHz, 100 W (manual impedance matching) or optional 300 W (auto-matching) |
| Target Diameter | 25.4 mm (1 inch), Max Thickness: 3 mm |
| Cooling Water Flow Rate | 10 L/min (integrated 16 L/min recirculating chiller) |
| Chamber Dimensions | Ø256 mm × 250 mm ID × 276 mm H (high-purity quartz) |
| Chamber Seal | Aluminum flange (Ø274 mm) with silicone O-ring |
| Plasma Shielding | Stainless steel mesh enclosure |
| Base Pressure | <1.0×10⁻² Torr (dual-stage rotary vane pump) or <5×10⁻⁵ Torr (turbo-molecular pump option) |
| Substrate Stage | Rotatable (0–20 rpm), heated (max 700 °C short-term, 500 °C continuous), Ø50 mm (accommodates up to 2-inch wafers), temperature stability ±10 °C |
| Optional Quartz Crystal Microbalance (QCM) | Real-time thickness monitoring, 0.10 Å resolution, LED display with material parameter input |
| Certification | CE compliant |
| Warranty | 12 months, lifetime technical support |
| Brand | KEJING |
|---|---|
| Model | GSL1100X-SPC-12 |
| Origin | Anhui, China |
| Vacuum Chamber Dimensions (Bell Jar) | Ø250 mm × 340 mm H |
| Glass Chamber Options | Ø88 mm × 140 mm H / Ø88 mm × 57 mm H |
| Max Sample Stage Diameter | 40 mm |
| Vacuum System | Turbo-molecular Pump + Mechanical Pump |
| Base Pressure | 1.3×10⁻² – 6×10⁻³ Pa |
| Vacuum Gauges | Thermocouple Gauge + Cold Cathode Gauge |
| Sputtering Power Supply | DC 0–3 kV / 0–10 mA (adjustable) |
| Low-Voltage Evaporation Supply | AC 0–10 V / 0–100 A (adjustable) |
| Process Gas | ≥99.9% Argon |
| Cooling | Forced-air or water-cooling (fan-cooled ≤32°C ambient |
| Net Weight | ~150 kg |
| Footprint | 800 mm × 560 mm × 1340 mm (L×W×H) |
| Brand | KJ-Science |
|---|---|
| Origin | Anhui, China |
| Model | VTC-2RF |
| RF Power | 300 W, 13.56 MHz |
| Target Diameter | 50 mm (2") |
| Chamber Material | High-purity quartz (OD 160 mm × ID 150 mm × H 250 mm) |
| Base Pressure | ≤1×10⁻³ Torr (with dual-stage rotary vane pump) / ≤1×10⁻⁵ Torr (with optional turbomolecular pump) |
| Substrate Holder | Rotatable (1–20 rpm), heated up to 700 °C (short-term), 500 °C continuous |
| max. substrate size | 50 mm dia. (accommodates 2" wafers) |
| Cooling | Integrated recirculating chiller (16 L/min flow rate |
| required flow at sputter head | ≥10 L/min) |
| Thickness Monitoring | In-situ quartz crystal microbalance (QCM) with 0.1 Å resolution and LED display |
| Compliance | CE-certified |
| Warranty | 12 months |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ETD-SSS |
| Target Material | Stainless Steel |
| Target Diameter | 50 mm |
| Control Method | Manual |
| Chamber Dimensions (Ø × H) | 100 mm |
| Sample Stage Diameter | 15 mm |
| Sputtering Gas | Ambient Air |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | JY-S120A |
| Target Materials | Au, Pt, Au/Pd, Pd, Ag, Pt/Pd |
| Target Diameter | 57 mm |
| Control Method | Fully Automatic Digital Control |
| Sample Stage Diameter | 63 mm |
| Sputtering Gases | Argon (Ar) and Air |
| Operating Vacuum Range | 3–15 Pa (1 Pa step) |
| Sputtering Current | 3–40 mA (1 mA step) |
| Sputtering Time | 1–999 s (1 s step) |
| Chamber Material | Borosilicate Glass (Ø120 × 120 mm) |
| Pumping Speed | 2.2 L/s |
| Ultimate Vacuum | 5 × 10⁻² Pa |
| Power Consumption | 80 W (coater), 400 W (pump) |
| Noise Level | 56 dB(A) |
| Display | Touch-enabled IPS LCD with Chinese/English UI |
| Preset Programs | 6 user-configurable protocols |
| Vacuum Gauge | Digital Pirani sensor |
| Data Logging | Real-time current & pressure curves |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | JY-S120A |
| Target Materials | Au, Pt |
| Target Diameter | 57 mm |
| Control Method | Fully Automatic |
| Sample Stage Diameter | 63 mm |
| Sputtering Gases | Air and Argon |
| Chamber Material | High-silica borosilicate glass |
| Chamber Dimensions | Ø120 × 120 mm |
| Operating Vacuum Range | 3–15 Pa (1 Pa step) |
| Sputtering Current | 3–40 mA (1 mA step) |
| Sputtering Time | 1–999 s (1 s step) |
| Pumping Speed | 8 m³/h (2.2 L/s) |
| Ultimate Vacuum | 5×10⁻² Pa |
| Power Consumption | 80 W (coater), 400 W (pump) |
| Noise Level | 56 dB(A) |
| Display | Touch-enabled IPS LCD with Chinese/English toggle |
| Brand | Hefei Kejing |
|---|---|
| Origin | Anhui, China |
| Model | VTC-5RF (Optimized for Materials Genome Initiative Thin-Film Research) |
| Target Material Options | Au, Ag, Cu |
| Target Diameter | 25.4 mm |
| Target Thickness Max | 3 mm |
| Sputtering Distance | 50–80 mm (adjustable) |
| Sputtering Angle | 0–25° (adjustable) |
| Chamber Dimensions | 470 mm L × 445 mm D × 522 mm H (~105 L) |
| Sample Stage Diameter | 150 mm |
| Rotation Capability | Programmable, 16-position indexing |
| Maximum Stage Temperature | 600 °C |
| RF Power Supply | 13.56 MHz, 300 W, auto-matching |
| Gas | High-purity Ar (99.999%) |
| Base Vacuum | ≤4×10⁻⁵ Torr (with turbomolecular pump, KF40 flange) |
| Cooling | Recirculating chiller, 10 L/min flow rate |
| Compliance | CE-certified |
| Weight | 60 kg |
| Brand | Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | JY-S120-PJ |
| Target Materials | Au, Pt |
| Target Diameter | 57 mm |
| Control Method | Fully Automatic |
| Sample Stage Diameter | 63 mm |
| Sputtering Gases | Air and Argon |
| Chamber Material | High-Borosilicate Glass |
| Operating Vacuum Range | 3–15 Pa (1 Pa increments) |
| Sputtering Current | 3–40 mA (1 mA increments) |
| Sputtering Time | 1–999 s (1 s increments) |
| Chamber Dimensions | Ø120 × 120 mm |
| Pumping Speed | 8 m³/h (2.2 L/s) |
| Ultimate Vacuum | 5 × 10⁻² Pa |
| Power Consumption | 80 W (coater), 400 W (pump) |
| Noise Level | 56 dB(A) |
| Display | Touch-enabled IPS LCD with Chinese/English UI |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | JY-S120A |
| Target Materials | Au, Pt, Au/Pd, Pd, Ag, Pt/Pd |
| Target Diameter | 57 mm |
| Control Mode | Fully Automatic |
| Sample Stage Diameter | 63 mm |
| Sputtering Gases | Argon (Ar) and Air |
| Operating Vacuum Range | 3–15 Pa (1 Pa step) |
| Sputtering Current | 3–40 mA (1 mA step) |
| Sputtering Time | 1–999 s (1 s step) |
| Chamber Material | Borosilicate Glass (Ø120 × 120 mm) |
| Pump Speed | 8 m³/h (2.2 L/s) |
| Ultimate Vacuum | 5 × 10⁻² Pa |
| Power Consumption | 80 W (coater), 400 W (pump) |
| Noise Level | 56 dB(A) |
| Display | Touch-enabled IPS LCD with Chinese/English UI |
| Preset Programs | 6 user-configurable protocols |
| Vacuum Gauge Type | Digital Pirani sensor |
| Current Regulation | Digital closed-loop control |
| Data Logging | Real-time I-t & P-t curves |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Region Classification | Domestic (China) |
| Model | JY-S100 |
| Target Materials | Au, Pt (standard), Au/Pd, Pt/Pd |
| Target Diameter | 57 mm |
| Control Method | Manual Microprocessor-Based Controller |
| Sample Stage Diameter | 63 mm |
| Sputtering Gases | Argon (primary), Air (limited use) |
| Chamber Dimensions | Ø120 mm × H75 mm |
| Viewport | Ø120 mm × H45 mm |
| Base Vacuum | ≤0.05 Pa |
| Operating Pressure Range | Atmosphere to 3 Pa |
| Sputtering Current Range | 0–99 mA (digitally regulated, pressure-independent) |
| Timer Range | 1–999 s |
| Pumping Speed | 133 L/min |
| Noise Level | 56 dB(A) |
| Standard Sample Capacity | 12 SEM stubs (Ø25 mm) on fixed stage |
| Optional Rotating/Tilting Stage | 0–60 rpm, –90° to +90° tilt, Ø40 mm platform for 4 stubs |
| Safety | Interlocked chamber door, dual mechanical locking mechanism |
| Power Supply | AC 220 V, 50 Hz |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Region | Domestic (China) |
| Model | JY-S100 PLUS |
| Price Range | USD 7,000 – 8,500 (FOB) |
| Target Materials | Pt (standard), Au, Au/Pd, Pt/Pd |
| Target Diameter | 57 mm |
| Control Mode | Microprocessor-Controlled Automatic Operation |
| Chamber Dimensions | 120 mm (D) × 75 mm (H) |
| Sample Stage Diameter | 40 mm |
| Sputtering Gases | Argon (recommended), Air (limited use) |
| Rotating/Tilting Stage | 0–60 rpm (adjustable), ±45° tilt (adjustable) |
| Sputtering Current Range | 0–40 mA |
| Vacuum Range | Atmospheric pressure to ≤3 Pa (operating), ≤0.05 Pa (ultimate) |
| Pumping Speed | 133 L/min |
| Acoustic Noise Level | ≤56 dB(A) |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | VTC-600G |
| Vacuum Chamber Configuration | Benchtop Front-Loading |
| Ultimate Vacuum | ≤6.0 × 10⁻⁵ Pa |
| Leak Rate | ≤0.5 Pa/h |
| Pumping Time (Atm → 5.0 × 10⁻³ Pa) | ~20 min |
| Vacuum System | Dual-stage (Rotary Vane Pump + Turbomolecular Pump) |
| Substrate Holder | Ø140 mm, Temp. Range: RT–500 °C (±1 °C), Rotation Speed: 5–20 rpm |
| Gas Inlet | 2-channel MFC (Ar & N₂) |
| Target Arrangement | 3 × Ø2″ magnetron cathodes at 120° spacing, 34° tilt angle to substrate normal |
| Target Cooling | Water-cooled |
| Optional Features | RF/DC dual-power configuration, substrate bias module, rotating shutter mask, sample stage baffle |
| Brand | Kojin |
|---|---|
| Origin | Anhui, China |
| Model | VTC-600-2HD |
| Power Supply | 220 VAC, 50/60 Hz, single-phase, 2000 W (including vacuum pump) |
| DC Sputter Power | 500 W |
| RF Sputter Power | 600 W (optional 300 W RF module available) |
| Chamber Dimensions | Ø300 mm × 300 mm H, stainless steel |
| Viewport Diameter | 100 mm |
| Chamber Opening | Top-hinged lid |
| Substrate Holder | Ø140 mm, rotatable (1–20 rpm), heated up to 500 °C (±1.0 °C stability) |
| Target Size | 50 mm diameter |
| Cooling Water Flow | 10 mL/min (integrated chiller: 16 mL/min) |
| MFC Range | 0–200 sccm (dual-channel) |
| Thickness Monitor | Quartz crystal microbalance (QCM), resolution: 0.10 Å, LED display |
| Vacuum System | Integrated German-made turbomolecular pump with one-touch operation |
| Overall Dimensions | 1300 mm (L) × 660 mm (W) × 1200 mm (H) |
| Weight | 160 kg |
| Warranty | 1 year standard, lifetime technical support |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | SBC-12 |
| Target Materials | Au, Ag, Pt, Cr, Ti, Cu, Ni, Au-Pd alloy |
| Target Diameter & Thickness | Φ58 mm × 0.12 mm |
| Control Method | Manual |
| Chamber Dimensions | Φ40 mm × 130 mm (sample compartment) |
| Stage Diameter | Φ40 mm (standard), optional Φ60 mm stage |
| Sputtering Gas | Air or Argon |
| Vacuum System | Two-stage direct-coupled rotary vane pump |
| Vacuum Gauge | Pirani gauge |
| Safety Feature | Micro-flow gas inlet valve for ion current regulation |
| Chamber Viewport | Reinforced borosilicate glass with optimized sealing |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | SBC-16 |
| Target Material (Standard) | Au (57 mm diameter × 0.1 mm thickness) |
| Optional Targets | Pt, Au/Pd, Pt/Pd |
| Control System | Microprocessor-based timer (1–999 s), automatic pump-down, sputtering, and venting sequence |
| Chamber Dimensions | Stainless steel, Ø120 mm × H75 mm |
| Viewport Dimensions | Ø120 mm × H45 mm |
| Sample Stage | Standard rotary stage (Ø40 mm), accommodates 4 standard SEM stubs |
| Sputtering Gas | Argon (recommended) or dry air |
| Operating Pressure Range | Atmospheric to 1×10⁻³ mbar |
| Ultimate Vacuum | ≤1×10⁻⁴ mbar |
| Pumping Speed | 133 L/min |
| Sputtering Current | 5–30 mA (digitally regulated, pressure-independent) |
| Acoustic Noise Level | ≤56 dB(A) |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | nanoEM |
| Target Material | Metal |
| Target Diameter | 2 inch |
| Control System | Fully Automatic Touchscreen Interface |
| Chamber Volume | 13 L |
| Sample Stage Diameter | 3 inch |
| Sputtering Gas | Argon (Ar) |
| Base Pressure | <5×10⁻⁷ mbar |
| DC Sputtering Power Output | Up to 300 W |
| Vacuum Pump Options | Configurable |
| Optional Features | Stage Rotation & Tilt, Plasma Glow Monitoring, Quartz Crystal Thickness Monitor, Pneumatic Shutter, Viewport, Auto Pressure Control |
| Compliance | Designed for ISO Class 5 cleanroom compatibility |
| Safety | Interlocked chamber door, overpressure/overtemperature protection, real-time arc suppression |
| Brand | EMCN |
|---|---|
| Origin | Henan, China |
| Manufacturer Type | Authorized Distributor |
| Country of Manufacture | China |
| Model | MSBC-12 |
| Target Material | Pure Gold (Au) |
| Target Diameter | 58 mm |
| Control Mode | Fully Automatic |
| Chamber Dimensions | Ø100 mm × 130 mm (H) |
| Sample Stage Diameter | Ø40 mm (holds up to six standard specimen cups) |
| Sputtering Gas | Ambient Air or Argon (Ar) with dedicated Ar inlet and fine-flow needle valve |
| Vacuum System | Direct-coupled rotary vane pump (2 L/s) |
| Vacuum Gauge | Pirani gauge |
| Operating Pressure Range | Adjustable down to ~20 Pa via precision bleed valve |
| Gas Inlet | Dual-mode (air default |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | MVS-Sputter |
| Target Material Options | Single or Multi-Target Configuration |
| Target Diameter | Standard 2-inch (50.8 mm) or Custom (e.g., 3-inch, 4-inch) |
| Control Interface | Manual Knob + Analog Metering or Optional Digital PID Controller with RS-232/USB Output |
| Chamber Dimensions (W×D×H) | 180 × 180 × 220 mm (7.1 × 7.1 × 8.7 in) |
| Sample Stage Diameter | 100 mm (3.9 in), Adjustable Height & Tilt |
| Sputtering Gas Compatibility | Argon (Ar), Gold (Au), Platinum (Pt), Palladium (Pd), Chromium (Cr), Iridium (Ir), and Reactive Gases (e.g., O₂, N₂) for Oxide/Nitride Coating |
| Base Pressure | ≤5 × 10⁻⁶ Torr (achieved via dual-stage vacuum system: rotary vane pump + turbomolecular pump) |
| Deposition Uniformity | ±5% across 100 mm substrate (measured by quartz crystal microbalance and profilometry) |
| Film Thickness Control | Real-time monitoring via integrated quartz crystal thickness monitor (QCM), resolution: 0.1 Å |
| Brand | Safematic |
|---|---|
| Origin | Switzerland |
| Model | CCU-010 HV_SP-010 |
| Sputtering Target Materials | Au, Pt, Cr, Al, Ir, W, C, ferromagnetic materials, ITO, DLC |
| Control Mode | Fully Automatic |
| Sample Stage Diameter | ≥60 mm |
| Sputtering Gas | Argon or Air |
| Vacuum System | Integrated diaphragm pump + turbomolecular pump |
| Vacuum Measurement | Full-range (Pirani + cold cathode gauge) |
| Film Thickness Monitoring | Dual-position FTM sensor with real-time feedback |
| Brand | Saintins |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | JS-1600 |
| Target Material | Gold (99.999% purity) |
| Target Diameter | 50 mm |
| Control Mode | Manual |
| Chamber Dimensions | Ø160 mm × H110 mm |
| Sample Stage Diameter | 50 mm |
| Sputtering Gas | Air or Argon |
| Vacuum Pump | VRD-4 rotary vane pump (1.1 L/s) |
| Operating Pressure Range | 1×10⁻¹–2×10⁻¹ mbar |
| Sputtering Voltage | –1600 V DC |
| Ion Current Range | 0–50 mA |
| Timer | Adjustable single-run duration |
| Gas Inlet | Precision needle valve with φ4×2.5 mm tubing port |
| Brand | Saintins |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | JS-1600M |
| Target Material | Gold (99.999% purity) |
| Target Diameter | Ø50 mm |
| Control Mode | Manual |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage Diameter | Ø50 mm |
| Sputtering Gases | Air, Argon |
| Cooling | Water-cooled magnetron cathode (6×4 mm quick-connect fittings) |
| Operating Vacuum Range | 2×10⁻¹ – 6×10⁻² mbar |
| Sputtering Voltage | −1600 V DC |
| Ion Current Range | 0–100 mA |
| Timer | Adjustable preset duration |
| Vacuum Pump | VRD-4 rotary vane pump (1.1 L/s) |
| Power Supply | Integrated DC high-voltage source |