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| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Optical System | Full-Spectrum Holographic Grating |
| Vacuum Requirement | None |
| Wavelength Range | Configurable (typically 130–800 nm) |
| Resolution | High spectral resolution enabled by optimized optical path and CCD pixel density |
| Sample Handling | Open-type spark stand with X-Y motorized sample stage |
| Compliance | Designed to support ISO/IEC 17025, ASTM E415, ASTM E1086, and GB/T 4336 workflows |
| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Calibus 3B |
| Instrument Type | Handheld |
| Integration | Fully Integrated |
| Laser Pulse Energy | Not Specified (Nanosecond-Pulsed Solid-State Laser) |
| Wavelength Range | 190–700 nm |
| Detector | CMOS Array |
| Cooling | Active PID-Controlled Thermal Stabilization |
| Gas Purge | Argon Circulation System |
| Operating Temperature Range | −10 °C to +40 °C |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS-based Multi-Channel Array |
| Optical Configuration | Paschen-Runge Mount |
| Wavelength Range | Configurable (Typically 130–800 nm) |
| Number of Simultaneous Channels | Up to 60 (Software-Defined) |
| Argon Purge System | Sealed Argon-Circulating Optical Chamber with Four-Point Purge |
| Operating Environment | Industrial Lab / Foundry Floor |
| Compliance | Designed to Support ISO/IEC 17025, ASTM E415, ASTM E1086, and GB/T 4336 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | M5000 PLUS |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | Scientific-grade CMOS |
| Wavelength Range | Configurable (UV–VIS, typically 130–800 nm) |
| Optical Design | Dual-chamber with dedicated UV optical path |
| UV Optimization | Uncoated high-quantum-efficiency CMOS for N, C, S, P detection |
| Stability Architecture | Cast aluminum vacuum-sealed spectrometer chamber with 4-stage stress-relief annealing and active temperature stabilization (±0.1 °C) |
| Light Source | Fully digital pulsed spark generator with real-time energy optimization (RTMC) |
| Software Capability | Full-spectrum acquisition, model-free analysis via intelligent calibration curves, remote firmware update & health monitoring |
| Compliance Framework | Designed to support GLP/GMP workflows, ASTM E415, ISO 11573, and GB/T 4336 analytical protocols |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark Discharge |
| Detector | Charge-Coupled Device (CCD) |
| Optical Configuration | Paschen-Runge Mount |
| Wavelength Range | Configurable (Typical Range: 130–800 nm) |
| Number of Simultaneous Channels | Multi-channel (CCD-based full-spectrum acquisition) |
| Argon Purge System | Sealed argon recirculation with four-way purging |
| Operating Environment | Industrial floor and laboratory settings |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, ASTM E1086, and GB/T 4336 standards |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Scientific-grade CMOS |
| Wavelength Range | Configurable (130–800 nm) |
| Optical System | Dual-chamber with dedicated vacuum UV optical path for N, C, S, P |
| Spectral Resolution | ≤ 10 pm at 200 nm |
| Effective Pixel Count | ≥ 4.2 MP (full-frame CMOS) |
| Analysis Speed | < 30 s per sample (including flushing, sparking, and quantification) |
| Calibration Stability | ±0.5% RSD over 8 hours (under controlled lab conditions) |
| Compliance | Meets ISO 11577:2022, ASTM E415-22, GB/T 4333.1–2022 |
| Brand | EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | SUPEC 6020 / SUPEC 7020 |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES (6020) / Quadrupole ICP-MS (7020) |
| Detection Limit | Not Specified |
| Precision (RSD) | Not Specified |
| Stability | Not Specified |
| Wavelength Range | Not Specified |
| Optical Resolution | Not Specified |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS |
| Wavelength Range | Configurable (Typical Range: 130–800 nm) |
| Number of Spectral Channels | Not Fixed (Multi-Channel CCD/CMOS Array-Based Detection) |
| Optical System | Paschen-Runge Mount |
| Purge Medium | Sealed Argon Circulation System |
| Operating Environment | Industrial Lab / Foundry Floor |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Domestic Product | Yes |
| Model | CS5000 |
| Measurement Principle | Infrared Absorption Spectroscopy |
| Heating System | High-Frequency Induction Furnace |
| Carbon Range | 0.00001–12 wt% |
| Sulfur Range | 0.00001–45 wt% |
| Sensitivity | 0.000001 wt% |
| Precision | ±1.0 ppm |
| Analysis Time | 20–40 s |
| Furnace Output Power | Adjustable (0–2.5 kW typical for HF induction) |
| Brand | Supernova / EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | EXPEC 6500 |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Detection Limit | Not Specified |
| Precision (RSD) | <1% @ 8 h |
| Wavelength Range | 160–900 nm |
| Optical Resolution | Not Specified |
| RF Power Range | 500–1600 W (Digital Self-Excited Solid-State Generator) |
| Observation Mode | Dual-View Vertical Torch (Axial & Radial) |
| Detector | Custom Large-Area E-CCD |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | ONH5000 |
| Power Supply | 8.0 kW Pulse Electrode Furnace |
| Max Furnace Temperature | >3500 °C |
| Detection Principles | Infrared Absorption (O), Thermal Conductivity (N, H) |
| Carrier Gases | He or N₂ |
| Compliance | ASTM E1019, ISO 14284, GB/T 11261–2022, GB/T 20123–2006 |
| Sample Form | Solid metallic & non-metallic materials |
| Measurement Elements | O, N, H (simultaneous or individual) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | MiX5 500 |
| Form Factor | Handheld / Portable |
| Target Materials | Ferrous Alloys |
| Pre-installed Alloy Libraries | AISI, DIN, JIS, GB (1600+ grades) |
| Detector | Silicon Drift Detector (SDD) |
| X-ray Tube | High-Performance Microfocus Tube |
| Display | 4.3-inch Color Touchscreen |
| Weight | 1.5 kg |
| Battery Life | 10–12 hours |
| IP Rating | IP54 |
| Data Storage | Up to 100,000 results with spectra and optional images |
| Output Formats | CSV, PDF |
| Connectivity | USB, Wi-Fi, Bluetooth |
| Compliance Support | GLP/GMP audit trail capability, FDA 21 CFR Part 11–ready software architecture |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Scientific-grade CMOS |
| Wavelength Coverage | Configurable (130–800 nm typical) |
| Optical Configuration | Dual-chamber (Vacuum UV + Visible/NIR) |
| UV Optimization | Dedicated uncoated UV optical path for N, C, S, P analysis |
| Spectral Resolution | ≤ 10 pm at 200 nm (typical) |
| Channel Flexibility | Full-spectrum acquisition — no fixed channels |
| Software Compliance | Supports ASTM E415, E1086, ISO 11577, and GLP/GMP audit trails per FDA 21 CFR Part 11 requirements |
| Thermal Stability | Thermostatically controlled optical chamber (±0.1 °C) |
| Mechanical Construction | Stress-relieved die-cast aluminum optical housing (4-stage annealing) |
| Brand | EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | FAAS 8000 |
| Pricing | Available Upon Request |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable |
| Sample Compatibility | Fe-, Al-, Cu-based alloys |
| Optical Design | Paschen-Runge mount |
| Environmental Operation | Factory-floor compatible |
| Gas Purge | Sealed argon-circulation optical chamber with quad-channel argon purge |
| Software Features | Real-time drift correction, intelligent curve selection, grade identification, CE/CRE calculation, QC limit enforcement, automated system diagnostics |
| Compliance Context | Designed for GLP-compliant metal analysis workflows |
| Brand | SpectrUM / EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Model | EXPEC 6000 |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Detection Limit | Not Specified |
| Precision (RSD) | Not Specified |
| Long-Term Stability | Not Specified |
| Wavelength Range | Not Specified |
| Optical Resolution | Not Specified |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS-based CCD array |
| Optical Configuration | Paschen-Runge mount |
| Wavelength Range | Configurable (typically 130–800 nm) |
| Number of Simultaneous Channels | Up to 60 (software-defined) |
| Argon Purge System | Sealed argon-circulation optical chamber with four-way purge |
| Operating Environment | Industrial workshop / QC lab (IP54-rated spark stand) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | M5000 PLUS F |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Scientific-grade CMOS |
| Focal Length | 400 mm |
| Grating Line Density | 2400 l/mm (Visible), 3600 l/mm (UV) |
| Wavelength Range | 140–680 nm |
| Spectral Acquisition Mode | Full-Spectrum Direct Reading |
| Brand | SpectrUM / EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (China) |
| Model | EXPEC 7200 |
| Instrument Type | Quadrupole ICP-MS |
| Application Environment | Laboratory |
| Mass Range (amu) | 1–280 |
| Resolution (Unit Mass Resolution, amu) | ≤0.75 |
| Detection Limit (ng·L⁻¹) | <0.05 for ⁹Be, <0.003 for ²³⁸U |
| Sensitivity (Mcps/mg·L⁻¹) | >350 for ²³⁸U |
| Short-Term Stability (RSD, 10 min) | <2% |
| Long-Term Stability (RSD, 2 h) | <3% |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (130–800 nm typical for metal analysis) |
| Spectral Resolution | ≤ 10 pm (typical at 200 nm) |
| Optical System | Paschen-Runge mount with dual vacuum-UV/visible chambers |
| Number of Simultaneous Detection Pixels | > 30,000 per CCD |
| Calibration Flexibility | Multi-matrix, on-site element/basis expansion supported |
| Compliance | Designed to support ISO 17025-compliant workflows, ASTM E415, E1086, and GB/T 4336 methodologies |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (typically 130–800 nm) |
| Spectral Resolution | < 10 pm (at 200 nm) |
| Optical System | Pascchen-Runge Mount with Dual Chambers (UV + VIS) |
| Number of Simultaneous Spectral Lines | > 9,000 |
| Calibration Flexibility | Full-Spectrum Multi-Matrix Capability |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, E1086, and GB/T 4336 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable (130–800 nm typical for spark OES) |
| Optical Configuration | Paschen-Runge mount with dual vacuum-UV/visible chambers |
| Number of Simultaneously Acquired Spectral Lines | >10,000 |
| Analytical Elements | Up to 72 metallic and non-metallic elements (e.g., C, P, S, N, Si, Mn, Cr, Ni, Cu, Al, Ti, Mo, V, Co, Nb, B, Ca, Mg, Zn, Pb, Sn, As, Bi, rare earths) |
| Calibration Flexibility | On-site matrix and element expansion without hardware modification |
| Compliance | Designed to support ISO/IEC 17025, ASTM E415, ASTM E1086, ASTM E3061, and GB/T 4336 workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable |
| Optical Configuration | Paschen–Runge Mount |
| Environmental Operation | Argon-purged Sealed Optical Chamber |
| Sample Interface | Open-type Spark Stand with Quadruple Argon Purge |
| Temperature Control | Thermostatically Stabilized Optics Chamber |
| Software Features | Real-time Drift Correction, Intelligent Calibration Curve Matching, Grade Identification, CE/CRE Calculation, QC Limit Enforcement, System Self-Diagnosis |
| Compliance Context | Designed for GLP-compliant metal analysis workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (typically 130–800 nm) |
| Spectral Resolution | ≤ 10 pm (typical at 200 nm) |
| Optical System | Paschen-Runge Mount with Dual Chambers (UV + VIS) |
| Number of Simultaneously Acquired Spectral Lines | > 9,000 |
| Calibration Flexibility | Full-spectrum recalibration without hardware modification |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, E1086, and GB/T 4336 methodologies |
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