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| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Optical System | Full-Spectrum Holographic Grating |
| Vacuum Requirement | None |
| Wavelength Range | Configurable (typically 130–800 nm) |
| Resolution | High spectral resolution enabled by optimized optical path and CCD pixel density |
| Sample Handling | Open-type spark stand with X-Y motorized sample stage |
| Compliance | Designed to support ISO/IEC 17025, ASTM E415, ASTM E1086, and GB/T 4336 workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS-based Multi-Channel Array |
| Optical Configuration | Paschen-Runge Mount |
| Wavelength Range | Configurable (Typically 130–800 nm) |
| Number of Simultaneous Channels | Up to 60 (Software-Defined) |
| Argon Purge System | Sealed Argon-Circulating Optical Chamber with Four-Point Purge |
| Operating Environment | Industrial Lab / Foundry Floor |
| Compliance | Designed to Support ISO/IEC 17025, ASTM E415, ASTM E1086, and GB/T 4336 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | M5000 PLUS |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | Scientific-grade CMOS |
| Wavelength Range | Configurable (UV–VIS, typically 130–800 nm) |
| Optical Design | Dual-chamber with dedicated UV optical path |
| UV Optimization | Uncoated high-quantum-efficiency CMOS for N, C, S, P detection |
| Stability Architecture | Cast aluminum vacuum-sealed spectrometer chamber with 4-stage stress-relief annealing and active temperature stabilization (±0.1 °C) |
| Light Source | Fully digital pulsed spark generator with real-time energy optimization (RTMC) |
| Software Capability | Full-spectrum acquisition, model-free analysis via intelligent calibration curves, remote firmware update & health monitoring |
| Compliance Framework | Designed to support GLP/GMP workflows, ASTM E415, ISO 11573, and GB/T 4336 analytical protocols |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark Discharge |
| Detector | Charge-Coupled Device (CCD) |
| Optical Configuration | Paschen-Runge Mount |
| Wavelength Range | Configurable (Typical Range: 130–800 nm) |
| Number of Simultaneous Channels | Multi-channel (CCD-based full-spectrum acquisition) |
| Argon Purge System | Sealed argon recirculation with four-way purging |
| Operating Environment | Industrial floor and laboratory settings |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, ASTM E1086, and GB/T 4336 standards |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Scientific-grade CMOS |
| Wavelength Range | Configurable (130–800 nm) |
| Optical System | Dual-chamber with dedicated vacuum UV optical path for N, C, S, P |
| Spectral Resolution | ≤ 10 pm at 200 nm |
| Effective Pixel Count | ≥ 4.2 MP (full-frame CMOS) |
| Analysis Speed | < 30 s per sample (including flushing, sparking, and quantification) |
| Calibration Stability | ±0.5% RSD over 8 hours (under controlled lab conditions) |
| Compliance | Meets ISO 11577:2022, ASTM E415-22, GB/T 4333.1–2022 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS |
| Wavelength Range | Configurable (Typical Range: 130–800 nm) |
| Number of Spectral Channels | Not Fixed (Multi-Channel CCD/CMOS Array-Based Detection) |
| Optical System | Paschen-Runge Mount |
| Purge Medium | Sealed Argon Circulation System |
| Operating Environment | Industrial Lab / Foundry Floor |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Scientific-grade CMOS |
| Wavelength Coverage | Configurable (130–800 nm typical) |
| Optical Configuration | Dual-chamber (Vacuum UV + Visible/NIR) |
| UV Optimization | Dedicated uncoated UV optical path for N, C, S, P analysis |
| Spectral Resolution | ≤ 10 pm at 200 nm (typical) |
| Channel Flexibility | Full-spectrum acquisition — no fixed channels |
| Software Compliance | Supports ASTM E415, E1086, ISO 11577, and GLP/GMP audit trails per FDA 21 CFR Part 11 requirements |
| Thermal Stability | Thermostatically controlled optical chamber (±0.1 °C) |
| Mechanical Construction | Stress-relieved die-cast aluminum optical housing (4-stage annealing) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable |
| Sample Compatibility | Fe-, Al-, Cu-based alloys |
| Optical Design | Paschen-Runge mount |
| Environmental Operation | Factory-floor compatible |
| Gas Purge | Sealed argon-circulation optical chamber with quad-channel argon purge |
| Software Features | Real-time drift correction, intelligent curve selection, grade identification, CE/CRE calculation, QC limit enforcement, automated system diagnostics |
| Compliance Context | Designed for GLP-compliant metal analysis workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS-based CCD array |
| Optical Configuration | Paschen-Runge mount |
| Wavelength Range | Configurable (typically 130–800 nm) |
| Number of Simultaneous Channels | Up to 60 (software-defined) |
| Argon Purge System | Sealed argon-circulation optical chamber with four-way purge |
| Operating Environment | Industrial workshop / QC lab (IP54-rated spark stand) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | M5000 PLUS F |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Scientific-grade CMOS |
| Focal Length | 400 mm |
| Grating Line Density | 2400 l/mm (Visible), 3600 l/mm (UV) |
| Wavelength Range | 140–680 nm |
| Spectral Acquisition Mode | Full-Spectrum Direct Reading |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (130–800 nm typical for metal analysis) |
| Spectral Resolution | ≤ 10 pm (typical at 200 nm) |
| Optical System | Paschen-Runge mount with dual vacuum-UV/visible chambers |
| Number of Simultaneous Detection Pixels | > 30,000 per CCD |
| Calibration Flexibility | Multi-matrix, on-site element/basis expansion supported |
| Compliance | Designed to support ISO 17025-compliant workflows, ASTM E415, E1086, and GB/T 4336 methodologies |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (typically 130–800 nm) |
| Spectral Resolution | < 10 pm (at 200 nm) |
| Optical System | Pascchen-Runge Mount with Dual Chambers (UV + VIS) |
| Number of Simultaneous Spectral Lines | > 9,000 |
| Calibration Flexibility | Full-Spectrum Multi-Matrix Capability |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, E1086, and GB/T 4336 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable (130–800 nm typical for spark OES) |
| Optical Configuration | Paschen-Runge mount with dual vacuum-UV/visible chambers |
| Number of Simultaneously Acquired Spectral Lines | >10,000 |
| Analytical Elements | Up to 72 metallic and non-metallic elements (e.g., C, P, S, N, Si, Mn, Cr, Ni, Cu, Al, Ti, Mo, V, Co, Nb, B, Ca, Mg, Zn, Pb, Sn, As, Bi, rare earths) |
| Calibration Flexibility | On-site matrix and element expansion without hardware modification |
| Compliance | Designed to support ISO/IEC 17025, ASTM E415, ASTM E1086, ASTM E3061, and GB/T 4336 workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable |
| Optical Configuration | Paschen–Runge Mount |
| Environmental Operation | Argon-purged Sealed Optical Chamber |
| Sample Interface | Open-type Spark Stand with Quadruple Argon Purge |
| Temperature Control | Thermostatically Stabilized Optics Chamber |
| Software Features | Real-time Drift Correction, Intelligent Calibration Curve Matching, Grade Identification, CE/CRE Calculation, QC Limit Enforcement, System Self-Diagnosis |
| Compliance Context | Designed for GLP-compliant metal analysis workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (typically 130–800 nm) |
| Spectral Resolution | ≤ 10 pm (typical at 200 nm) |
| Optical System | Paschen-Runge Mount with Dual Chambers (UV + VIS) |
| Number of Simultaneously Acquired Spectral Lines | > 9,000 |
| Calibration Flexibility | Full-spectrum recalibration without hardware modification |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, E1086, and GB/T 4336 methodologies |
| Brand | ARUN TECHNOLOGY LTD. |
|---|---|
| Origin | United Kingdom |
| Model | ARTUS 8 U |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | High-Resolution CCD Array |
| Focal Length | 400 mm |
| Grating Line Density | 2400 l/mm (Visible), 3600 l/mm (UV) |
| Wavelength Range | 140–680 nm |
| Spectral Acquisition Mode | Full-Spectrum Direct Reading |
| Brand | ARUN TECHNOLOGY LTD. |
|---|---|
| Origin | United Kingdom |
| Model | Calibus M |
| Instrument Type | Portable / Field-Deployable LIBS Analyzer |
| Optical Range | 190–700 nm |
| Detector | CMOS Array |
| Laser | Q-switched Nanosecond Solid-State, <0.1 °C Thermal Stability Control |
| Pulse Width | Nanosecond |
| Argon Purge | Integrated Recirculating System (≥200 analyses per charge) |
| Operating Temperature | –10 °C to +40 °C |
| Safety | Class 4 Laser (IEC 60825-1 compliant), Interlocked Trigger, Zero X-ray Emission |
| Quantification Method | Empirical Calibration with Multi-Parameter Spectral Correction (Background Subtraction, Matrix Correction, Spectral Drift Compensation) |
| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Optical Design | Full-Spectrum Holographic Grating |
| Sample Handling | Open-Style Horizontal/Vertical Translational Spark Stand |
| Compliance | Designed for ISO/IEC 17025-aligned laboratories, supports ASTM E415, E1086, and ISO 6892-1 elemental analysis workflows |
| Software | ARUN SpectraSuite with audit trail, user access levels, and data export compliant with FDA 21 CFR Part 11 requirements |
| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Source | Spark Discharge |
| Detector Type | Cooled Scientific-Grade CMOS |
| Wavelength Range | Configurable (UV–Vis, down to ~130 nm) |
| Optical System | Dual-Chamber Paschen–Runge Mount |
| Cooling | Thermoelectric (Peltier) |
| Detection Limit | ≤1 ppm for C, P, S, N, and other metallic/non-metallic elements |
| Stability | Drift-Free Operation (No Recalibration Required Under Normal Conditions) |
| Analysis Time | <10 s per sample |
| Argon Consumption | Reduced by ~67% vs. conventional systems |
| Compliance | Designed for ISO/IEC 17025, ASTM E415, E1086, E3061, and EN 10315 environments |
| Brand | ARUN TECHNOLOGY LTD. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Spectral Range | Configurable (130–700 nm) |
| Optical Design | Paschen-Runge Mount with Long Focal Length |
| Temperature Control Stability | ±0.1 °C |
| Software Platform | iAPS Intelligent Alloy Identification System, OMVR Calibration Engine, ASR Spark Filtering Algorithm |
| Compliance | Designed for ISO/IEC 17025-compliant laboratories |
| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Spectral Range | Configurable (130–700 nm) |
| Optical Design | Paschen-Runge Mount with Long Focal Length |
| Gas Environment | Argon-Flushed Optical Chamber |
| Temperature Control Accuracy | ±0.1 °C |
| Software Compliance | Supports 21 CFR Part 11 Audit Trail & GLP/GMP Data Integrity Requirements |
| Sample Handling | Open-Design Spark Stand with Gravity-Driven Electrode, 32 kg Max Load |
| Brand | Arun Technology Ltd. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Optical Design | Full-Spectrum Holographic Grating |
| Sample Handling | Open-Type Adjustable Spark Stand with X-Y Translation |
| Compliance | Designed for ISO/IEC 17025-compliant laboratories, supports ASTM E415, E1086, and ISO 6892-2 traceable analysis workflows |
| Brand | ARUN TECHNOLOGY LTD. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Spectral Range | Configurable from 130 nm to 700 nm |
| Optical Design | Paschen–Runge mounting with extended focal length |
| Temperature Control Stability | ±0.1 °C |
| Software Platform | iAPS Intelligent Alloy Identification System, OMVR Optimized Multi-Variable Regression, ASR Aberrant Spark Removal Algorithm |
| Compliance Ready | ASTM E415, ASTM E1086, ISO 11577, ISO 17025-aligned workflows, FDA 21 CFR Part 11 optional audit trail module |
| Brand | ARUN TECHNOLOGY LTD. |
|---|---|
| Origin | United Kingdom |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | Cooled Scientific-Grade CMOS |
| Wavelength Range | Configurable (UV–VIS, down to ~130 nm) |
| Optical Design | Dual Chamber |
| Detection Limit | ≤1 ppm for key metallic and non-metallic elements |
| Stability | Drift-Free Operation Without Recalibration |
| Analysis Time | ≤10 s per sample |
| Gas Consumption | Reduced Argon Usage (≈33% of conventional systems) |
| Compliance | Designed for ISO/IEC 17025-compliant laboratories |
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