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| Brand | ARMS SYSTEM |
|---|---|
| Origin | Japan |
| Manufacturer Status | Authorized Distributor |
| Product Origin | Imported |
| Model | UTA-IA |
| Exposure Mode | Projection-Based |
| Resolution | 1–2 µm |
| Light Source | High-Power LED |
| Wavelength Range | Visible Spectrum (400–700 nm) |
| Maximum Exposure Field | 2.5 mm × 1.5 mm |
| Minimum Patterned Area | 100 µm × 100 µm |
| Optical Architecture | Integrated Metallurgical Microscope + DLP Digital Micromirror Device (DMD) Projection Engine |
| Software-Controlled Pattern Generation | Yes |
| Compatibility | Standalone or Coupled to User-Provided Microscope (Optional Adapter Kit) |
| Brand | Adamant Namiki |
|---|---|
| Origin | Japan |
| Model | NMH-01 |
| Measurement Principle | Optical Interference (Near-Infrared) |
| Measurement Method | Non-contact |
| Measured Parameter | Ra |
| Minimum Measurable Internal Diameter | 1.1 mm |
| Repeatability | σ = 0.2 µm |
| Key | Brand: Photonic Lattice |
|---|---|
| Origin | Japan |
| Model | PA-300 |
| Measurement Range | 0–130 nm (retardation) |
| Wavelength | 520 nm |
| Minimum Resolution | 0.001 nm |
| Repeatability | < 0.1 nm (σ) |
| Field of View (Standard) | 27 × 36 mm to 99 × 132 mm |
| Optional FOV (with beam-expanding lens) | 7 × 8.4 mm |
| Camera Resolution | 2056 × 2464 pixels |
| Output Parameters | Retardation (nm), Fast Axis Orientation (°), Stress Conversion (MPa, optional) |
| Compliance | ISO 11146, ASTM F2649, JIS R3203 |
| Brand | Photonic Lattice |
|---|---|
| Origin | Japan |
| Model | WPA-100-S |
| Measurement Range | 0–4000 nm |
| Repeatability | <1.0 nm |
| Pixel Resolution | 384 × 288 (≈110,000 pixels) |
| Measurement Wavelengths | 523 nm, 543 nm, 575 nm |
| Field of View | 11.6 × 15.8 mm |
| Dimensions | 200 × 275 × 309.5 mm |
| Weight | 9 kg (unit), 4 kg (power supply) |
| Power Supply | AC 100–240 V, 50/60 Hz |
| Software | WPA-View (dedicated for WPA-100-S) |
| Brand | Photonic Lattice |
|---|---|
| Origin | Japan |
| Model | PA-300-XL |
| Measurement Wavelength | 520 nm |
| Birefringence Range | 0–130 nm |
| Minimum Resolution | 0.001 nm |
| Repeatability | <0.1 nm |
| Field of View (Standard) | 40×48 mm to 240×320 mm |
| Polarization Camera | 2056×2464 pixels |
| Output Parameters | Retardance [nm], Fast-Axis Orientation [°], Stress-Converted Value [MPa] (optional) |
| Optional Modules | Real-time Analysis Software, Lens Aberration Analysis Software, External Control Interface, Interchangeable Lens Kits |
| Brand | Other brands |
|---|---|
| Origin | Hong Kong |
| Manufacturer Type | General distributor |
| Domestic/Imported | Domestic |
| Model | FP NanoPrinter |
| Price Range | USD 140,000 – 700,000 |
| Key Features | DMD-based dynamic holographic patterning |
| Laser Safety Class | Class 4 |
| XY/Z Feature Size | 142 nm / 175 nm |
| Resolution (Diffraction-Limited) | 285 nm / 500 nm |
| Layer Spacing | ≥ 0.05 µm |
| Throughput | 100 mm³/hr |
| Parallel Foci | ≥ 100 |
| Surface Roughness | ≤ 20 nm |
| Operating Temp | 23 ± 1 ℃ |
| RH | < 50% (recommended < 35%) |
| Vibration Requirement | Active isolation required |
| Power Supply | 220 V, > 35 A |
| Brand | Photonic Lattice |
|---|---|
| Origin | Japan |
| Model | WPA-200, WPA-200-L |
| Measurement Range | 0–3500 nm |
| Repeatability | <0.1 nm |
| Pixel Resolution | 384 × 288 |
| Measurement Wavelengths | 523 nm, 543 nm, 575 nm |
| Field of View | 100 × 136 mm (WPA-200), 250 × 340 mm (WPA-200-L) |
| Dimensions | 310 × 466 × 605.5 mm (WPA-200), 450 × 593 × 915.5 mm (WPA-200-L) |
| Weight | 20 kg (WPA-200), 26 kg (WPA-200-L) |
| Data Interface | GigE (camera), RS232C (motor control) |
| Power Supply | AC 100–240 V, 50/60 Hz |
| Software | WPA-View |
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