KLA-Filmetrics
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| Brand | KLA-Filmetrics |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | F20 |
| Price Range | USD $28,000–$50,000 |
| Measurement Principle | Spectral Reflectance Interferometry |
| Thickness Range | 15 nm – 450 µm |
| Thickness Resolution | ≤0.1 nm (1 Å) |
| Thickness Repeatability | ±0.7 Å |
| Measurement Time | 1–2 s per spot |
| Spectral Range Options | 200–1700 nm (configurable by model variant: UV, VIS-NIR, EXR, NIR) |
| Sample Compatibility | Smooth, transparent or semi-transparent films on reflective or transmissive substrates |
| Optical Constants Measured | n (refractive index), k (extinction coefficient), surface roughness (via effective medium approximation) |
| Software Platform | Filmetrics F20™ Suite (Windows-based, USB-connected) |
| Compliance | Supports GLP/GMP audit trails, ASTM E2386-22 (Standard Practice for Spectral Reflectance-Based Film Thickness Measurement), ISO/IEC 17025 traceable calibration protocols |
| Brand | KLA-Filmetrics |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported |
| Model | Candela® 8720 |
| Instrument Type | Optical Patterned Wafer Defect Inspection System |
| Primary Application | Automated wafer inspection with Statistical Process Control (SPC) integration |
| Wafer Diameter | 200 mm |
| Detection Principle | Multi-angle elastic and inelastic scattering imaging |
| Key Capabilities | Simultaneous dual-angle scatterometry, surface topography mapping, reflectance profiling, phase contrast imaging, and photoluminescence (PL) detection |
| Compliance | Designed for semiconductor fab environments compliant with SEMI E30 (SECS/GEM), ISO 9001, and industry-aligned GLP/GMP data integrity expectations |