optiXfab
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| Brand | optiXfab |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Component Type | Optical Element |
| Substrate Material | Fused Silica |
| Diameter | 25.4 ± 0.1 mm |
| Thickness | 6.35 ± 0.1 mm |
| Surface Figure Accuracy | λ/20 @ 632.8 nm |
| Surface Roughness | < 0.2 nm RMS |
| Coating Material | Mo/Si |
| Central Wavelength | 13.5 nm |
| Reflectivity | >65% (AOI = 5°, planar), >67% (AOI = 45°, planar), >65% (AOI = 5°, spherical) |
| Bandwidth (FWHM) | ~500 pm (planar, 5°), ~950 pm (planar, 45°), ~500 pm (spherical, 5°) |
| Radius of Curvature | 500 mm ±1% (spherical variant) |
| Application Domain | EUV Lithography R&D, HHG-based Coherent Imaging, Laser-Driven Plasma Sources |
| Brand | optiXfab |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Category | Optical Component |
| Component Diameter Options | Up to 700 mm |
| Coating Material | Mo/Si Multilayer |
| Central Wavelength | 13.5 nm |
| Application | EUV Light Collection for Laser-Driven Plasma & HHG Sources |
| Reflectivity (Peak, at 13.5 nm, near-normal incidence) | >65% (as-measured, post-coating) |
| Thermal Stability | Engineered for high-heat-load operation in plasma-based EUV environments |
| Serviceability | Refurbishment available for carbon-contaminated optics |
| Brand | optiXfab |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Custom |
| Component Category | EUV Optical Element |
| Wavelength | 13.5 nm |
| Numerical Aperture (NA) | 0.2–0.44 |
| Magnification | 20× / 10× |
| Effective Focal Length | 26.95 mm / 53.06 mm |
| Primary Mirror Radius of Curvature | 100 mm / 140 mm |
| Primary Mirror Diameter | 52 mm / 106 mm |
| Secondary Mirror Radius of Curvature | −35 mm / −175 mm |
| Secondary Mirror Diameter | 11 mm / 48 mm |
| Mounting | Stress-Free Solid-Hinge Mechanical Support |
| In-Operation Alignment Capability | Yes |