PIE
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| Brand | PIE |
|---|---|
| Origin | USA |
| Model | EM-KLEEN |
| RF Frequency | 13.56 MHz |
| RF Power | 75 W |
| Control | Fully Automated |
| Gas Configuration | Single- or Triple-Gas Mixing System (O₂, H₂, Ar, N₂, CF₄, NF₃, NH₃, HF, H₂S) |
| Plasma Type | Remote Inductively Coupled Plasma (ICP), Non-Microwave, Non-Underfill, Non-Wafer-Specific |
| Chamber Compatibility | Direct integration with SEM, FIB-SEM, TEM, XPS, ALD, CD-SEM, EBR, EBI, EUVL, and other UHV/XHV systems |
| Sample & Chamber Cleaning | Simultaneous in-situ cleaning of both specimen surface and vacuum chamber interior |
| Plasma Intensity Monitoring | Integrated real-time plasma emission sensor |
| Flow Control | Pressure-feedback-based automated mass flow control (no manual needle valve) |
| User Interface | Capacitive touchscreen with 60 programmable cleaning protocols |
| Safety Modes | Dual-mode operation (Smart Safety Mode + Expert Control Mode) |
| Scheduling | SmartSchedule™ logic triggered by chamber venting cycles, sample load count, or time-based intervals |
| Electromagnetic Compatibility | Low-EMI architecture |
| Optional Upgrades | Sapphire plasma tube assembly |
| Brand | PIE |
|---|---|
| Origin | USA |
| Model | TEM Cube |
| Vacuum Performance | ≤1×10⁻⁷ Torr (with turbomolecular pump) |
| Chamber Dimensions | 9 in × 9 in × 9 in (229 mm × 229 mm × 229 mm) |
| Sample Holder Capacity | Up to 8 TEM holders (4 per side) with universal adapters for JEOL, Hitachi, Thermo Fisher/FEI, and ZEISS systems |
| Plasma Source | EM-KLEEN remote RF plasma source (O₂, H₂, or ambient air compatible) |
| Vacuum Isolation | Electromagnetically actuated valves per holder port |
| Pump Configuration | Separated turbomolecular or oil-free dry scroll vacuum station |
| Chamber Door | Hinged tempered glass door with mechanical locking knob |
| Operating Temperature | Slightly above ambient (±2 °C stability) |
| Compliance | Designed for GLP/GMP-aligned lab environments |