SENTECH
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| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | MDPinline |
| Application | In-line quantitative minority carrier lifetime mapping of silicon wafers |
| Measurement Principle | Microwave-detected photoconductance decay (µ-PCD) |
| Scan Speed | <1 second per wafer |
| Integration | Conveyor-compatible, no moving mechanical parts |
| Compliance | Designed for semiconductor manufacturing environments compliant with ISO 9001 and SEMI S2/S8 safety standards |
| Software Interface | Ethernet-enabled, supports SECS/GEM protocol for factory automation integration |
| Data Output | Full-wafer lifetime map (pixel-resolved), dual-line resistivity profile, CSV/HDF5 export |
| Calibration | Traceable to NIST-traceable reference wafers |
| Operating Environment | Class 1000 cleanroom compatible (ISO 4), 18–28 °C, <60% RH non-condensing |
| Power Supply | 100–240 V AC, 50/60 Hz, <500 W |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | MDPspot |
| Type | Contactless, Microwave Photoconductance Decay (μ-PCD) Based Lifetime Tester |
| Sample Handling | Manual Z-axis adjustment (up to 156 mm height) |
| Measurement Mode | Single-point, non-contact, room-temperature operation |
| Material Compatibility | Crystalline and multicrystalline silicon wafers & bricks |
| Compliance | Designed for R&D and process monitoring in PV and semiconductor fabrication environments |
| Software | MDP Control Suite (Windows-based, real-time visualization, CSV export, GLP-compliant data logging) |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | SENTECH Multi-Chamber Platform |
| Etching Principle | Capacitively Coupled Plasma (CCP) and/or Inductively Coupled Plasma (ICP) |
| Chamber Configuration | Modular multi-port transfer chamber (3–6 ports) |
| Wafer Handling | Load-lock pre-vacuum chamber and/or vacuum cassette station |
| Maximum Wafer Size | 200 mm |
| Integration Capabilities | ICP etcher, RIE etcher, ALD, PECVD, ICPECVD modules |
| Control Interface | GUI-based process control software compliant with industrial automation standards |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SENTTECH Cluster System |
| Price | Upon Request |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | SENDIRA |
| Spectral Range | 400–6,000 cm⁻¹ (1.7–25 µm) |
| Detector Options | DTGS or MCT |
| Integrated FTIR Platform | Compatible with Thermo Fisher iS50 |
| Software | SpectraRay/4 + Dedicated FTIR Control Suite |
| Optical Configuration | Purged ellipsometer optics, motorized goniometer, horizontal sample stage, auto-collimating telescope |
| Application Domain | Vibrational spectroscopic ellipsometry for thin-film metrology |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | SI 500 D |
| Plasma Source | Planar Triple-Spiral Antenna (PTSA) |
| Substrate Temperature Range | RT to +350 °C |
| Vacuum System | Fully Integrated, High-Stability |
| Process Compatibility | SiO₂, SiNₓ, SiONₓ, a-Si, SiC, TEOS-derived films |
| Substrate Size | Up to 200 mm wafers or carrier-mounted substrates |
| Optional Features | Load-lock integration, Laser Endpoint Detection, Substrate Biasing, He-backside Cooling with Real-Time Backside Temperature Sensing |
| Control Architecture | SENTECH Fieldbus-Based SCADA Software with Audit-Trail-Capable UI |
| Compliance Context | Designed for GLP/GMP-aligned R&D and pilot-line fabrication |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | SpectraRay/4 |
| Spectral Range | Configurable per instrument integration (e.g., 190–1700 nm) |
| Spot Size | Instrument-dependent (typically 10–100 µm) |
| Incidence Angle | Adjustable (40°–90°, motorized goniometer support) |
| Measurement Speed | Up to 100 ms per spectrum (full spectral acquisition) |
| Single-Measurement Time | < 5 s (typical auto-alignment + acquisition + fit) |
| Sample Size Compatibility | Up to Ø300 mm wafers or custom substrates |
| Spectral Resolution | ≤ 1 nm (dependent on spectrometer configuration) |
| Thickness Measurement Accuracy | Sub-nanometer for single-layer SiO₂ on Si (calibration traceable to NIST standards) |
| Repeatability | ≤ ±0.05 nm (1σ, over 24 h, controlled environment) |
| Direct Reflectance Accuracy | ±0.2% absolute reflectance (NIST-traceable calibration source) |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Model | SpectraRay/4 |
| Software Type | Spectroscopic Ellipsometry Data Acquisition, Modeling & Analysis Platform |
| Material Database | Integrated Comprehensive Library (Oxides, Nitrides, Metals, Polymers, Amorphous Si, Organic Layers, etc.) |
| Dispersion Models | Cauchy, Tauc-Lorentz, Cody-Lorentz, Drude, Sellmeier, B-Spline, User-Defined Custom Models |
| Mapping Capabilities | 2D Color/Contour/Deviation/3D Surface Plots, Statistical Summary (Mean, Std Dev, Min/Max, Histograms) |
| Simulation Engine | Wavelength-, Angle-, Energy-, Temperature-, Time-Dependent Optical Response Modeling |
| Reporting | Export to Microsoft Word (*.doc), Full Experiment Archiving (Raw Data, Model Definitions, Fitting Logs, Annotations) |
| Scripting | Python-based Automation Interface for Hardware Control (Stages, Heaters, Cryostats, Environmental Chambers) |
| Compliance Support | Audit Trail Logging, User Access Levels, Electronic Signature Ready (FDA 21 CFR Part 11–ready architecture) |