ULVAC KIKO
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| Brand | ULVAC KIKO |
|---|---|
| Origin | Japan |
| Model | CS-200Z |
| Configuration | Load-lock type, high-vacuum DC/RF magnetron sputtering system |
| Substrate Compatibility | Ti trays for Φ2″–Φ4″ wafers (max. Φ320 mm) and custom-shaped substrates (e.g., 50×50 mm²) |
| Control System | ULVAC GPCS-2700 integrated PLC + PC-based HMI (English interface) |
| Data Logging | Real-time parameter logging to PC with Excel export capability |
| Footprint | 1500 × 4500 mm (including service clearance) |
| Environment | Designed for Class 100–Class 1000 cleanroom integration |
| Brand | ULVAC KIKO |
|---|---|
| Origin | Japan |
| Model | IMX-350 |
| Product Type | Low-Energy, High-Beam-Current Implanter |
| Implantation Energy | 50 keV |
| Dose Range | 1×10¹⁶ ions/cm² |
| Wafer Size | 6-inch |
| Implant Species | p⁺ (Boron, Phosphorus, Arsenic compatible) |
| Beam Current Capability | High-current configuration |
| Ion Source Options | Liquid Metal Ion Source (LMIS), Dual Plasma Source (for O⁺, N⁺), Mass Analyzer Column |
| Imaging Resolution | 4 nm (dual-beam SEM column) |
| Positioning Accuracy | ≤20 nm (with piezo-driven stage and 1 nm optical encoder) |
| Brand | ULVAC KIKO |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Regional Classification | Domestic (PRC) |
| Model | Customized |
| Product Type | High-Energy Ion Implanter |
| Implant Dose Range | 1×10¹¹ – 1×10¹⁶ atoms/cm² |
| Wafer Sizes Supported | 2", 3", 4", 6", 8" |
| Available Ion Species | B, P, As, Al, S, H, Mg, Si |
| Single-Charge Ion Acceleration Energy | ≥200 keV (with deceleration down to 5 keV) |
| Dose Accuracy | ≤±1.5% |
| Ion Source Configuration | 5-channel solid-source vaporizer (up to 700 °C) |
| Tilt Angles | 0° and 7° (room-temperature stage) |
| Vacuum Performance | Ion Source ≤7×10⁻⁴ Pa |
| Brand | ULVAC KIKO |
|---|---|
| Origin | Japan |
| Model | UNECS Series |
| Measurement Principle | Spectroscopic Ellipsometry (SE) |
| Wavelength Range Options | Standard: 530–750 nm |
| Visible-Extended | 380–760 nm |
| Minimum Acquisition Time | 20 ms per spectrum |
| Sensor Architecture | Fixed-optics, no rotating elements |
| Environmental Configurations | Ambient-air, vacuum-integrated, and in-situ chamber-mounted variants |
| Sample Stage Options | Manual, motorized XY, large-substrate (up to 300 mm), portable benchtop, and OEM-integrated modules |
| Compliance | Designed for ISO/IEC 17025-aligned calibration traceability |