Ellipsometer
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Showing all 11 results
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | EP4 |
| Pricing | Upon Request |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Model | Nanofilm_EP4 |
| Spectral Range | 190–2750 nm |
| Spot Size | 1 µm |
| Angle of Incidence | 38°–90° |
| Sample Diameter | 2–12 inches |
| Spectral Resolution | 0.1 nm |
| Thickness Measurement Accuracy | 0.1 nm |
| Thickness Repeatability | 0.01 nm |
| Brand | Accurion |
|---|---|
| Origin | Switzerland |
| Model | RSE Referenced Spectroscopic Ellipsometry Fast Inspection System |
| Spectral Range | 450–900 nm |
| Spot Size | 50 × 100 µm (at 60° incidence) |
| Thickness Measurement Range | <1 nm to 10 µm |
| Acquisition Rate | 200 full spectroscopic ellipsometric spectra per second |
| Mapping Area | 100 mm × 100 mm in ≤12 min |
| Data Processing | Real-time look-up table (LUT)-based fitting |
| Compliance | Designed for ISO/IEC 17025-aligned QC environments, supports GLP/GMP traceability via audit-ready software logs |
| Brand | Eoptics |
|---|---|
| Origin | Hubei, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | SE-VF |
| Pricing | Upon Request |
| Brand | HORIBA |
|---|---|
| Origin | France |
| Model | Smart SE |
| Spectral Range | 450–1000 nm |
| Spot Size Options | Multiple Micro-Spot Sizes with Real-Time Visual Observation |
| Incidence Angle | Variable (Motorized Multi-Angle Capability) |
| Measurement Speed | Full-Spectrum Acquisition in <1 Second |
| Single-Measurement Time | <2 s (Typical, Including Stage Positioning) |
| Sample Stage | Motorized XYZ Translation (200 mm × 200 mm Travel, Z-Travel >35 mm) |
| Detector | CCD-Based Spectral Analyzer |
| Modulation Technology | Liquid Crystal Variable Retarder (LCVR), No Moving Parts in Optical Path |
| Configuration Flexibility | Supports Both In-Line Process Integration and Stand-Alone Lab Use |
| Compliance | Designed for ISO/IEC 17025-Compatible Metrology Environments |
| Software | HORIBA DeltaPsi² Platform with Audit Trail, User Access Control, and Exportable Raw Data (CSV, XML, HDF5) |
| Brand | HORIBA |
|---|---|
| Origin | France |
| Model | Smart SE |
| Measurement Speed | 5 s (typical), down to 1 s (max) |
| Wavelength Range | 450–1000 nm |
| Spot Sizes | 7 selectable configurations (e.g., 75 µm × 150 µm to 500 µm × 500 µm) |
| Software | DeltaPsi² v5.x (Windows-based) |
| Compliance | Designed for GLP/GMP-aligned workflows |
| Brand | HORIBA |
|---|---|
| Origin | France |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | UVISEL |
| Pricing | Available Upon Request |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | SpectraRay/4 |
| Spectral Range | Configurable per instrument integration (e.g., 190–1700 nm) |
| Spot Size | Instrument-dependent (typically 10–100 µm) |
| Incidence Angle | Adjustable (40°–90°, motorized goniometer support) |
| Measurement Speed | Up to 100 ms per spectrum (full spectral acquisition) |
| Single-Measurement Time | < 5 s (typical auto-alignment + acquisition + fit) |
| Sample Size Compatibility | Up to Ø300 mm wafers or custom substrates |
| Spectral Resolution | ≤ 1 nm (dependent on spectrometer configuration) |
| Thickness Measurement Accuracy | Sub-nanometer for single-layer SiO₂ on Si (calibration traceable to NIST standards) |
| Repeatability | ≤ ±0.05 nm (1σ, over 24 h, controlled environment) |
| Direct Reflectance Accuracy | ±0.2% absolute reflectance (NIST-traceable calibration source) |
| Brand | Top Instruments (TP) |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | Direct Manufacturer |
| Product Origin | Domestic (China) |
| Model | TPY-1 |
| Price | Upon Request |
| Angle of Incidence | 20°–90° (±0.05° resolution) |
| Film Thickness Measurement Accuracy | ±1 nm |
| Thickness Range | 1–300 nm |
| Refractive Index Range | 1.0–10.0 |
| Minimum Display Resolution | ≤1 nm |
| Laser Wavelength | 632.8 nm (He-Ne) |
| Optical Center Height | 80 mm |
| Max Sample Diameter | φ140 mm |
| Min Sample Diameter | φ10 mm |
| Max Sample Thickness | 16 mm |
| Polarizer Azimuth Range | 0°–180° (0.05° resolution) |
| Thickness Repeatability | ±1 nm |
| Refractive Index Repeatability | ±0.01 |
| Instrument Weight | 25 kg |
| Brand | Topo |
|---|---|
| Model | TPY-2 |
| Origin | Tianjin, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Spectral Range | 632.8 nm (He–Ne laser) |
| Thickness Measurement Range | 1–4000 nm |
| Refractive Index Range | 1.0–10.0 |
| Incidence Angle Range | 20°–90° (±0.05° angular resolution) |
| Sample Diameter Compatibility | Ø10–Ø140 mm, max thickness 16 mm |
| Thickness Accuracy | ±0.5 nm (for films 10–100 nm), ±1 nm (full range) |
| Refractive Index Repeatability | ±0.005 |
| Polarizer Azimuth Range | 0°–180° |
| Optical Center Height | 80 mm |
| Dimensions (L×W×H) | 680 × 390 × 310 mm |
| Weight | 26 kg |
| Interface | USB 2.0 |
| Software | Windows-based ellipsometry analysis suite with real-time data acquisition, multi-layer modeling, and export to CSV, TXT, and XML |
| Brand | ULVAC KIKO |
|---|---|
| Origin | Japan |
| Model | UNECS Series |
| Measurement Principle | Spectroscopic Ellipsometry (SE) |
| Wavelength Range Options | Standard: 530–750 nm |
| Visible-Extended | 380–760 nm |
| Minimum Acquisition Time | 20 ms per spectrum |
| Sensor Architecture | Fixed-optics, no rotating elements |
| Environmental Configurations | Ambient-air, vacuum-integrated, and in-situ chamber-mounted variants |
| Sample Stage Options | Manual, motorized XY, large-substrate (up to 300 mm), portable benchtop, and OEM-integrated modules |
| Compliance | Designed for ISO/IEC 17025-aligned calibration traceability |