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| Brand | ATLANT3D |
|---|---|
| Origin | Denmark |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | NANOFABRICATOR™ LITE |
| Substrate Size | Up to 4-inch wafers |
| Process Temperature Range | 50 °C – 300 °C |
| Precursor Channels | 2 |
| Dimensions (W × H × D) | 1400 mm × 800 mm × (depth not specified) |
| Thickness Uniformity | Capable of controlled thickness gradients across substrate |
| Brand | Phenom |
|---|---|
| Origin | Netherlands |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | Phenom Pharos-STEM |
| Price | Upon Request |
| Brand | Phenom |
|---|---|
| Origin | Netherlands |
| Model | Pharos STEM |
| Accelerating Voltage | 20 kV |
| Resolution | ≤ 1 nm |
| Sample Holder | Standard 3 mm TEM grid clamp |
| Imaging Modes | Bright-Field (BF), Dark-Field (DF), High-Angle Annular Dark-Field (HAADF), User-Defined Detector Segmentation |
| Vacuum Levels | 0.1, 10, and 60 Pa |
| Imaging Time (Sample-to-Image) | < 40 s |
| Working Distance | Fixed for optimal STEM performance |
| Detector Configuration | 11-segment annular STEM detector with fully configurable quadrant/group selection |
| Brand | Neoscan |
|---|---|
| Origin | Belgium |
| Detector Type | Flat-Panel Detector |
| Scan Mode | Sample Rotation Only (RO) |
| Spatial Resolution | 2 µm |
| X-ray Energy | 110 kV |
| Field of View | 100 mm × 163 mm |
| Maximum Sample Weight | 20 kg |
| System Dimensions | 1200 mm × 640 mm × 520 mm |
| Precision | Micron-Level |
| Brand | Femtonics |
|---|---|
| Origin | Hungary |
| Model | Atlas |
| Objective Lenses | 16× water immersion, 25× water immersion, 25× multi-immersion |
| Spatial Resolution | X: 450 nm, Y: 450 nm, Z: 2300 nm |
| Scan Speed | 100 kHz point access, 40 fps @ 510×510 px (500×500 µm²), up to 3000 fps in ROI mode |
| Compliance | CE-marked, ISO 13485–aligned design, compatible with GLP/GMP audit trails via optional software modules |
| Brand | Forge Nano |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | PROMETHEUS |
| Quotation | Upon Request |
| Substrate Capacity | 5–5000 g powder |
| Process Temperature | Up to 200 °C |
| Precursor Channels | 2–8 |
| Weight | >200 kg |
| Footprint | Floor-Standing |
| Uniformity | Conformal atomic-layer coating across entire powder surface |
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