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| Brand | 4D TECHNOLOGY |
|---|---|
| Origin | USA |
| Model | 280SI |
| Automation Level | Fully Automatic |
| Sheet Resistance Range | 0.001 Ω/□ to 8×10⁵ Ω/□ (Standard) |
| Sheet Resistance Accuracy | <0.1% |
| Resistivity Range | 0.001 Ω·cm to 8×10⁵ Ω·cm (derived from sheet resistance and user-input film thickness) |
| Resistivity Accuracy | <0.1% |
| Substrate Size Support | 2–8 inch wafers (333-series supports up to 12 inch |
| Test Current Accuracy | <0.1% |
| Probe Force Adjustment Range | 90–200 g |
| Probe Tip Material | Tungsten carbide with sapphire bushings |
| Edge Correction Capability | Yes, within 3 mm from wafer edge |
| Measurement Speed | >45 points/min |
| Repeatability | <0.2% (per substrate) |
| Data Output | 2D/3D contour maps, statistical summaries, Excel-compatible reports |
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