Ion Sputter Coaters
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Showing all 9 results
| Brand | Aibro / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | OEM Manufacturer |
| Region of Origin | Domestic (China) |
| Model | GVC-2200 |
| Target Materials | Gold, Platinum, Silver, Copper, Aluminum, Lead |
| Target Diameter | 57 mm |
| Control Modes | Manual & Automatic |
| Chamber Dimensions | Ø128 × 130 mm |
| Sample Stage | Ø63 mm with 12 SEM stub slots |
| Sputtering Gas | Argon or Ambient Air |
| Input Voltage | AC 220 V ±10%, 50 Hz |
| Max DC Sputtering Voltage | 2400 V |
| Max Power Consumption (Host + Mechanical Pump) | 500 W |
| Vacuum Pump | Two-stage rotary vane pump, 1 L/s pumping speed |
| Operating Temperature | 5–40 °C |
| Relative Humidity (Operating) | <60% RH |
| Storage Conditions | –10 to 60 °C, <80% RH |
| Safety Protections | Overcurrent & Dual Vacuum Interlock |
| Brand | Angstrom Sciences |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported |
| Model | Backing Plates |
| Target Material | Precious Metals |
| Packaging | Inert Gas Sealed |
| Brand | BEQ |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Authorized Distributor |
| Target Market | Domestic (China) |
| Target Applications | SEM Sample Preparation |
| Sputtering Target Diameter | 58 mm |
| Sample Stage Diameter | 40 mm (accommodates up to six standard sample cups) |
| Chamber Dimensions | Ø100 mm × 130 mm (height) |
| Vacuum System | Direct-coupled two-stage rotary vane pump (RVD-2), pumping speed: 2 L/s, ultimate pressure: 5 × 10⁻² Pa |
| Vacuum Gauge | Pirani gauge |
| Process Gas Options | Air or high-purity argon (dedicated Ar inlet with fine-flow micro-regulation valve) |
| Operating Pressure Range | Adjustable from ~1–20 Pa via precision bleed valve |
| Safety Interlock | Automatic cutoff at 20 Pa chamber pressure |
| Brand | Cressington |
|---|---|
| Origin | United Kingdom |
| Model | 208HR |
| Target Materials | Au, Pt, Pt/Pd, AgI, Ir |
| Target Diameter | 57 mm |
| Control Mode | Automatic |
| Chamber Diameter | 150 mm |
| Sample Stage | 100 mm diameter, rotatable and tilt-adjustable |
| Sputtering Gas | Argon |
| Vacuum System | Integrated turbomolecular pumping (implied by HR designation and industry standard) |
| Cooling | Cold-stage sputtering architecture |
| Compliance | Designed for SEM/EPMA sample preparation per ISO 16700 and ASTM E1558 practices |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | SBC-12 |
| Target Materials | Au, Ag, Pt, Cr, Ti, Cu, Ni, Au-Pd alloy |
| Target Diameter & Thickness | Φ58 mm × 0.12 mm |
| Control Method | Manual |
| Chamber Dimensions | Φ40 mm × 130 mm (sample compartment) |
| Stage Diameter | Φ40 mm (standard), optional Φ60 mm stage |
| Sputtering Gas | Air or Argon |
| Vacuum System | Two-stage direct-coupled rotary vane pump |
| Vacuum Gauge | Pirani gauge |
| Safety Feature | Micro-flow gas inlet valve for ion current regulation |
| Chamber Viewport | Reinforced borosilicate glass with optimized sealing |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | SBC-16 |
| Target Material (Standard) | Au (57 mm diameter × 0.1 mm thickness) |
| Optional Targets | Pt, Au/Pd, Pt/Pd |
| Control System | Microprocessor-based timer (1–999 s), automatic pump-down, sputtering, and venting sequence |
| Chamber Dimensions | Stainless steel, Ø120 mm × H75 mm |
| Viewport Dimensions | Ø120 mm × H45 mm |
| Sample Stage | Standard rotary stage (Ø40 mm), accommodates 4 standard SEM stubs |
| Sputtering Gas | Argon (recommended) or dry air |
| Operating Pressure Range | Atmospheric to 1×10⁻³ mbar |
| Ultimate Vacuum | ≤1×10⁻⁴ mbar |
| Pumping Speed | 133 L/min |
| Sputtering Current | 5–30 mA (digitally regulated, pressure-independent) |
| Acoustic Noise Level | ≤56 dB(A) |
| Brand | Shuyun |
|---|---|
| Origin | United Kingdom |
| Model | C60-20S |
| Operating Voltage Range | 5–20 kV |
| Beam Current | 50 nA |
| Spot Size | 100 µm |
| Scan Area | 4 × 4 mm |
| Source-to-Head Distance | 142 mm |
| Recommended Working Distance | 50 mm |
| Power Supply | 3U 19″ rack-mountable unit |
| Input Power | 110–240 VAC, 13 A, 50/60 Hz |
| Software Platform | Windows 10 or later |
| Integration Flange | NW 63 CF |
| Valve Type | Integrated gate valve |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900C |
| Sputtering Target Materials | Au, Ag, Pt, Cr, Al, Cu |
| Target Dimensions | Ø50 mm × 0.12 mm |
| Sputtering Voltage Range | 0–1600 V DC |
| Sputtering Current Range | 0–50 mA |
| Sputtering Time Control | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate Glass |
| Chamber Dimensions | 160 mm × 110 mm (D × H) |
| Sample Stage Diameter Range | Ø50–70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Vacuum System | VRD-8 Rotary Vane Pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V configuration) |
| Brand | VPI |
|---|---|
| Model | SD-980 |
| Type | Thermal Evaporation Coater |
| Origin | Beijing, China |
| Target Material | Carbon Fiber Rope |
| Target Diameter | 30 mm |
| Chamber Dimensions (W×D×H) | 340 × 390 × 300 mm |
| Sample Stage Diameter | 70 mm |
| Vacuum Chamber (D×H) | 160 × 110 mm (Borosilicate Glass) |
| Ultimate Vacuum | 5 Pa |
| Evaporation Current Range | 50–80 A |
| Pulse Count Setting | 0–9 pulses |
| Control Interface | Touchscreen HMI |
| Power Supply | 220 V AC, 50 Hz, Grounded |
| Pump | VRD-8 Rotary Vane Pump (2 L/min) |
| Weight | ~50 kg |
| Max. Power Consumption | 1.6 kW |
| Sputtering Gas Required | None |