Microarray Detection System
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| Brand | GLASER |
|---|---|
| Origin | Jiangsu, China |
| Model | SMART ETCH UV |
| Laser Wavelength | 355 nm |
| Pulse Width | 10 ± 5 ns @ 40 kHz, 20 ± 5 ns @ 100 kHz |
| Average Power | 7 W @ 60 kHz |
| Pulse Energy | 125 µJ |
| Output Power Range | 1–100% |
| Max Scanning Area | 110 mm × 110 mm |
| Beam Quality (M²) | ≤ 1.2 |
| Scan Speed | 13,000 mm/s |
| Delidding Speed | ≥ 3,000 mm/s |
| Single-Pass Depth Control | 0.01–1.0 mm |
| Sample Height Range | 0.5–70 mm |
| Camera Resolution | 20 MP color CCD |
| Filtration Efficiency | >98% for particles ≥ 0.3 µm |
| Operating Gas | Compressed air or N₂, 0.3 MPa |
| Safety Class | Class I (interlocked) |
| Dimensions (W×D×H) | 730 × 1100 × 1600 mm |
| Weight | 280 kg |
| Brand | Kirkstall |
|---|---|
| Origin | United Kingdom |
| Model | Kilby |
| Type | Programmable Tilt-Based Perfusion Rocker for 3D Organoid Culture |
| Compliance | Designed for ISO 13485-aligned lab environments, compatible with GLP/GMP-adjacent workflows requiring audit-trail-capable operation |
| Brand | Kirkstall |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | Quantitative Microgravity 3D Cell Culture System |
| Pricing | Available Upon Request |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SI500 ICP-RIE Plasma Etching System |
| Price Range | USD 68,000 – 136,000 (FOB Hamburg) |
| Temperature Control Range | −120 °C to +150 °C |
| Plasma Source | Inductively Coupled Plasma (ICP) with Separate Bias RF (13.56 MHz) |
| Etch Chemistry Compatibility | Fluorine-based (SF₆, CF₄, CHF₃), Chlorine-based (Cl₂, BCl₃), Oxygen, Argon, and mixed gas chemistries |
| Chamber Material | Anodized aluminum with quartz or ceramic liner options |
| Maximum Wafer Size | 200 mm (8-inch) |
| Vacuum System | Turbo-molecular pump with backing pump (base pressure <5×10⁻⁷ mbar) |
| Process Control | Fully computerized via SENTECH EtchControl™ v4.x with recipe management, real-time parameter logging, and audit trail support |
| Origin | Sichuan, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (China) |
| Model | URE-2000 Series |
| Price Range | USD 42,000 – 70,000 |
| Scanning Throughput | 2 µm feature resolution |
| Resolution | 0.8 µm (with 2 µm positive photoresist) |
| Detection System Type | UV Optical Detection |
| Excitation Wavelength | 365 nm (i-line) |
| Emission Wavelength | 365 nm |
| Exposure Area | Up to 200 mm × 200 mm (URE-2000/A8) |
| Exposure Time Range | 0.1 s – 9999.9 s (programmable timer) |
| Mercury Lamp Power | 1000 W (DC, Osram Ultra-High-Pressure Hg Lamp) |
| Illumination Uniformity | ≤2.5% (Ø100 mm), ≤5% (Ø200 mm) |
| Alignment Accuracy | ±0.8 µm (single-side), ±2 µm (double-side, 0.8 mm wafer thickness) |
| Maximum Resist Thickness | 500 µm (SU-8, user-provided conditions) |