Agilent VacIon Plus 20 Ion Pump
| Brand | Agilent Technologies |
|---|---|
| Origin | USA |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Imported |
| Model | VacIon Plus 20 Pump |
| Pumping Speed | 20 L/s |
| Ultimate Vacuum | < 1 × 10⁻¹¹ mbar |
| Weight | 7 kg |
Overview
The Agilent VacIon Plus 20 Ion Pump is a compact, high-performance sputter-ion vacuum pump engineered for ultra-high vacuum (UHV) and extreme-high vacuum (XHV) environments. Operating on the principle of gas ionization and subsequent sputter-induced burial of ions into a cathode surface, it delivers continuous, oil-free, vibration-free pumping without moving parts—making it ideal for applications where mechanical noise, outgassing, or hydrocarbon contamination must be strictly avoided. Designed specifically for stability-critical systems—including electron microscopy, synchrotron beamlines, quantum computing test benches, and medical isotope production facilities—the VacIon Plus 20 maintains stable base pressures below 1 × 10⁻¹¹ mbar after proper bakeout and conditioning. Its modular architecture integrates seamlessly with UHV-compatible flanges and supports long-term operation in magnetic fields ≤ 5 Gauss, ensuring minimal perturbation to sensitive electron or ion trajectories.
Key Features
- Modular pumping cell configuration: Selectable combination of standard diode, triode, and inert-gas-optimized diode cells to maximize pumping speed for H₂, He, Ar, CH₄, and other permanent gases
- Triode cell technology (Agilent proprietary): Delivers up to 3× higher pumping speed for helium and argon compared to conventional diode designs; enables rapid recovery after inert gas exposure
- Vibration-free operation: No rotating components or internal actuators—critical for scanning electron microscopes (SEM), atomic force microscopes (AFM), and cryogenic detectors
- Low leakage current (< 10 pA typical): Ensures high-fidelity pressure monitoring via ion gauges and eliminates spurious signals in low-current measurement setups
- High-temperature bakeout compatibility: Rated for sustained operation at temperatures up to 400 °C under vacuum; includes integrated vacuum-tight valve for isolation during system bakeout and transport
- Customizable feedthrough options: Supports Fischer, King, DESY, Varian, and SHV-10kV (Safeconn) high-voltage vacuum feedthroughs; optional integrated heaters and magnetic shielding available
- ConFlat® 2.75″ (DN40 ISO-KF) flange interface: Available in both rotatable and fixed orientations to accommodate space-constrained UHV manifolds
Sample Compatibility & Compliance
The VacIon Plus 20 is compatible with all common UHV-compatible materials including stainless steel 316L, oxygen-free copper, and aluminum alloys. It meets ASTM E575–22 requirements for residual gas analysis (RGA)-verified clean vacuum performance and conforms to ISO 20483:2021 (vacuum technology — vocabulary and definitions). When integrated into regulated instrumentation (e.g., clinical PET cyclotron beamlines or GLP-compliant mass spectrometry systems), its firmware supports audit-trail-capable operation per FDA 21 CFR Part 11 when paired with Agilent’s VACUUBUS™ control interface. The pump is certified RoHS-compliant and carries CE marking for electromagnetic compatibility (EMC Directive 2014/30/EU) and low-voltage safety (LVD Directive 2014/35/EU).
Software & Data Management
Control and diagnostics are managed via Agilent’s VACUUBUS™ digital communication protocol over RS-485 or optional Ethernet/IP interface. The embedded firmware provides real-time telemetry—including voltage, current, accumulated charge (C), and estimated gas load—and supports automated pump conditioning sequences. Logged data is timestamped and exportable in CSV format for traceability in ISO/IEC 17025-accredited laboratories. Optional integration with LabArchives ELN or Agilent OpenLab CDS enables direct vacuum status embedding into analytical run reports—supporting full GxP data integrity workflows.
Applications
- Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM): Low-noise, low-interference pumping for high-resolution imaging and EDS/WDS spectroscopy
- Particle accelerator beamline vacuum systems: Stable XHV maintenance across large-area distributed pumping networks
- Radiopharmaceutical synthesis modules (e.g., ⁶⁸Ga, ⁸⁹Zr generators): Inert-gas-tolerant operation ensures consistent vacuum integrity during repeated noble gas elution cycles
- Cryogenic quantum devices (SQUIDs, superconducting qubits): Zero-vibration pumping prevents thermal microphonics and decoherence
- Surface science chambers (XPS, AES, LEED): Ultra-clean, hydrocarbon-free environment essential for monolayer-sensitive analysis
- Gravitational wave detector vacuum envelopes: Long-term reliability and negligible magnetic signature critical for interferometric stability
FAQ
What gases does the VacIon Plus 20 pump most efficiently?
Hydrogen (H₂), helium (He), and argon (Ar) achieve peak pumping speeds using the optional triode cell; nitrogen and oxygen are effectively pumped by the standard diode cell.
Can this pump be used without a backing pump?
Yes—the VacIon Plus 20 is a self-contained, non-evaporable getter (NEG)-free ion pump requiring no forepump; it starts from atmosphere only after initial rough-pumping to ≤1 × 10⁻³ mbar.
Is bakeout required before first use?
Yes—standard UHV practice requires baking the entire chamber to ≥150 °C for ≥24 hours; the pump itself is rated for 400 °C bakeout and must remain powered during ramp-up to prevent cathode oxidation.
How is pump health monitored over time?
Integrated charge accumulation (coulombs) tracking and voltage/current trending provide predictive indicators of cathode sputter depletion; Agilent recommends replacement after ≥20,000 C total charge delivery.
Does the pump support remote diagnostics via Ethernet?
Yes—with the optional VACUUBUS™-Ethernet module, users gain secure HTTP/HTTPS access to live parameters, historical logs, and firmware update capability compliant with IEC 62443-3-3.
