EQ185nm Ultraviolet Lamp by Deepflow
| Brand | Deepflow |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | CYEQ7UVLP0 |
| Pricing | Available Upon Request |
Overview
The EQ185nm Ultraviolet Lamp (Model CYEQ7UVLP0) is a low-pressure mercury vapor lamp engineered to emit intense, narrow-band ultraviolet radiation at a wavelength of 185 nm. Unlike standard 254 nm UV lamps used for germicidal applications, the 185 nm emission enables direct photolysis of molecular oxygen (O₂) and water vapor (H₂O) in air or gas streams—generating atomic oxygen and hydroxyl radicals that rapidly oxidize trace organic contaminants, including volatile organic compounds (VOCs), ozone precursors, and total organic carbon (TOC) residuals. This lamp is specifically designed for integration into high-purity water purification systems, particularly as a pre- or post-treatment stage within ultra-pure water (UPW) generation loops compliant with ASTM D5127, ISO 3696 Grade 1, and SEMI F63 specifications. Its primary function is not microbial inactivation but rather photochemical oxidation of non-volatile and semi-volatile organics that resist conventional reverse osmosis and ion exchange.
Key Features
- Optimized quartz envelope with high transmittance at 185 nm (≥85% at 185 nm after 1,000 h operation)
- Stable output intensity maintained over rated lifetime (≥8,000 hours under continuous operation at 25°C ambient)
- Low thermal drift design ensuring consistent photon flux across variable flow conditions in UPW recirculation loops
- Compact form factor (L × W × H: 320 mm × 32 mm × 32 mm) compatible with inline mounting in stainless steel 316L sanitary tubing (1/2″–3/4″ NPT or Tri-Clamp)
- Integrated ballast compatibility with standard 120/230 VAC, 50/60 Hz input; optional DC-powered variants available for battery-backed or cleanroom UPS integration
- CE-marked electromagnetic compatibility (EMC) per EN 61000-6-3 and EN 61000-6-4; RoHS 2015/863/EU compliant
Sample Compatibility & Compliance
This lamp operates exclusively in gaseous or liquid-phase environments where UV transparency is maintained—most commonly installed in the off-gas line of UPW storage tanks or in dedicated TOC reduction modules downstream of mixed-bed polishers. It is not intended for direct immersion in water without protective quartz sleeves rated for 185 nm transmission. The device complies with key industry requirements for semiconductor-grade water systems, including SEMI F63-0320 (TOC ≤ 1 ppb specification), ASTM D5127-22 Annex A3 (UV oxidation validation protocol), and ISO 14644-1 Class 5 cleanroom-compatible mechanical construction. When deployed in GMP-regulated pharmaceutical water systems, it supports compliance with USP “Water for Pharmaceutical Purposes” and EU Annex 1 requirements for bioburden and endotoxin control via organic load minimization.
Software & Data Management
As a passive hardware component, the EQ185nm lamp does not incorporate embedded firmware or digital interfaces. However, it is routinely integrated into supervisory control and data acquisition (SCADA) architectures via external UV intensity sensors (e.g., calibrated silicon carbide photodiodes traceable to NIST SRM 2069) and programmable logic controllers (PLCs). Real-time monitoring of lamp status—including on-time accumulation, power supply voltage ripple, and downstream TOC analyzer correlation—is supported through Modbus RTU/TCP or OPC UA protocols. Audit trails for lamp replacement cycles, intensity decay trending, and calibration logs are maintained within validated LIMS or MES platforms to satisfy FDA 21 CFR Part 11 requirements for electronic records and signatures in regulated environments.
Applications
- Final-stage TOC abatement in >18.2 MΩ·cm ultra-pure water systems for semiconductor wafer fabrication
- Oxidative pretreatment of feedwater to electrodeionization (EDI) units to prevent organic fouling of ion-exchange membranes
- Gas-phase VOC destruction in nitrogen purge lines servicing analytical instrument sample chambers
- Reduction of pyrogenic potential in water-for-injection (WFI) distribution loops through organic precursor elimination
- Supporting ISO/IEC 17025 accredited laboratories requiring documented TOC stability per CLSI EP21-A
FAQ
What is the primary mechanism of organic removal at 185 nm?
Photolysis of dissolved O₂ and H₂O generates reactive oxygen species (ROS), primarily atomic oxygen (O•) and hydroxyl radicals (•OH), which non-selectively oxidize organic molecules to CO₂, H₂O, and low-molecular-weight acids.
Can this lamp be used independently, or must it be integrated into a water system?
It is a component-level device requiring integration into a closed-loop UPW system with appropriate flow control, temperature stabilization, and downstream TOC monitoring—standalone operation is neither specified nor supported.
Does the lamp require periodic recalibration?
No optical recalibration is needed; however, intensity decay must be tracked using NIST-traceable UV radiometers, and lamp replacement is recommended upon ≥20% output loss or after 8,000 operational hours—whichever occurs first.
Is ozone generation a concern during operation?
Yes—185 nm irradiation of ambient air produces ozone (O₃); therefore, the lamp must be housed in sealed, vented enclosures with catalytic ozone destruct units when installed outside pressurized water circuits.
