Hanuo HN-10AL Adjustable-Power Ultrasonic Cleaner

Overview

The Hanuo HN-10AL Adjustable-Power Ultrasonic Cleaner is an engineered laboratory-grade cleaning system designed for reproducible, non-destructive removal of particulate, organic, and ionic contaminants from delicate and complex-surface components. It operates on the principle of ultrasonic cavitation—where high-frequency acoustic energy (40 kHz) generates controlled micro-bubbles in a liquid medium that implode near submerged surfaces, producing localized shear forces and micro-jets capable of dislodging sub-micron residues without mechanical abrasion. This physics-based cleaning mechanism ensures consistent performance across diverse substrates—from precision optical lenses and dental instruments to printed circuit boards (PCBs) and micro-machined metal parts—making it suitable for routine QC/QA workflows, R&D sample preparation, and pre-analytical cleaning prior to SEM, XRF, or surface spectroscopy.

Key Features

• Digitally adjustable ultrasonic power output (40–100% in 10% increments), enabling optimization for sensitive samples (e.g., coated optics or soldered assemblies) versus heavily soiled industrial parts.
• Precise digital temperature control (20–80 °C) with integrated heating element (250 W), facilitating enhanced cleaning efficacy for waxy, greasy, or polymerized residues via thermal activation of detergent chemistry.
• Programmable timer (0–30 minutes) with auto-shutdown, supporting standardized cleaning protocols compliant with internal SOPs or external quality frameworks.
• Stainless steel tank (304 grade) with dimensions 300 × 240 × 150 mm (L × W × H), providing a 10-liter working volume and corrosion resistance against common aqueous cleaning solutions, including alkaline, neutral, and mild acidic formulations.
• Integrated sound-dampening lid reduces ambient noise to ≤55 dB(A) at 1 m distance, meeting occupational health guidelines for continuous operation in shared lab environments.
• Manual fill-and-drain configuration with bottom-mounted drain valve—designed for compatibility with standard lab sink setups and avoiding reliance on permanent plumbing infrastructure.

Sample Compatibility & Compliance

The HN-10AL accommodates a broad range of sample geometries and material classes: rigid and semi-rigid items up to 280 mm in length (e.g., dental handpieces, syringe barrels, PCBs, watch components, surgical forceps), as well as porous or textured objects such as golf club heads and stamped metal badges. Its 40 kHz transducer array delivers uniform energy distribution across the tank floor, minimizing dead zones. While not certified to ISO 13485 or FDA 21 CFR Part 11 out-of-the-box, the unit supports GLP/GMP-aligned documentation practices through operator-recorded parameters (time, temp, power %) and is routinely deployed in environments adhering to ASTM D2603 (standard guide for ultrasonic cleaning), ISO 15797 (textile testing), and USP (cleaning validation of pharmaceutical equipment). For regulated applications, users are advised to perform in-house qualification (IQ/OQ/PQ) using traceable thermometers and calibrated ultrasonic intensity meters.

Software & Data Management

The HN-10AL operates via a front-panel membrane keypad with LED display—intentionally hardware-based to ensure long-term reliability, electromagnetic immunity, and absence of firmware vulnerabilities. No proprietary software, drivers, or cloud connectivity are required. All operational parameters (power level, temperature setpoint, timer duration) are retained in non-volatile memory after power cycling. While the device does not generate electronic audit trails, its deterministic control logic enables full manual logging for compliance with ISO/IEC 17025 clause 7.7 (control of equipment records) and FDA 21 CFR Part 11 Subpart B (if paired with validated paper-based or LIMS-integrated logbooks).

Applications

• Life sciences & clinical labs: Decontamination of reusable pipette tips, glassware, endodontic files, and orthodontic appliances; removal of biofilm from titanium implants prior to surface analysis.
• Electronics manufacturing: Post-reflow flux residue removal from SMT assemblies; cleaning of MEMS sensors, inkjet printheads, and RF connectors without damaging fine-pitch solder joints.
• Materials research: Pre-characterization cleaning of metal coupons for corrosion studies; particle-free preparation of TEM grids and AFM calibration standards.
• Jewelry & precision mechanics: Restoration of antique watch movements, polishing of platinum crucibles, and degreasing of bearing assemblies prior to dimensional metrology.

FAQ

What cleaning solutions are compatible with the HN-10AL?
Aqueous-based detergents—including low-foaming alkaline, neutral pH, and citric-acid formulations—are recommended. Avoid halogenated solvents, strong oxidizers (e.g., undiluted nitric acid), or flammable liquids unless explicitly validated for ultrasonic use.
Can the unit be used continuously for extended cycles?
Yes—continuous operation up to 30 minutes per cycle is supported; however, for >3 consecutive cycles, allow ≥10 minutes cooling interval to maintain transducer longevity and thermal stability.
Is the stainless steel tank electropolished?
No—the interior surface is mechanically polished 304 stainless steel, sufficient for general lab use but not rated for ultra-high-purity (UHP) semiconductor applications requiring Ra < 0.4 µm finish.
Does the HN-10AL include a degassing function?
No dedicated degas mode is provided; however, initiating operation at 40% power for 2–3 minutes before ramping up achieves effective dissolved gas removal in most aqueous baths.
What safety certifications does the unit carry?
It complies with IEC 61010-1:2010 for electrical safety in laboratory equipment and meets CE marking requirements under the Low Voltage Directive (2014/35/EU) and EMC Directive (2014/30/EU).