KJ GROUP SKZD-3 Automated Dispensing Dropper for Suspension-Based Polishing Liquids
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (China) |
| Model | SKZD-3 |
| Pricing | Upon Request |
| Voltage/Power | DC 12 V / 25 W |
| Reservoir Capacity | 500 mL |
| Flow Rate | 0.5–7 mL/min (1 mL ≈ 25 drops) |
| Dimensions | 190 mm × 290 mm × 140 mm |
| Weight | 2.5 kg |
| Operating Environment | Altitude ≤ 1000 m |
| Power Input | AC 110/220 V, 50/60 Hz → DC 12 V adapter included |
| Mounting Footprint Required | 300 mm × 300 mm × 700 mm (benchtop space) |
| Ventilation | Required |
| Compatibility | Designed exclusively for integration with UNIPOL series lapping & polishing systems |
Overview
The KJ GROUP SKZD-3 Automated Dispensing Dropper is an engineered fluid delivery module designed specifically for precision-controlled application of suspension-based polishing media in semiconductor, optics, and advanced materials sample preparation workflows. Unlike peristaltic or syringe-based dispensers, the SKZD-3 operates on a gravity-fed, valve-regulated principle—optimized for low-viscosity, particle-stabilized slurries such as colloidal silica (SiO₂) and diamond suspensions. Its mechanical simplicity eliminates moving parts that could induce shear-induced agglomeration or sedimentation disturbance, preserving the colloidal stability critical to consistent material removal rates and surface finish quality. The unit integrates directly onto UNIPOL-series lapping and polishing platforms without requiring external controllers or compressed air infrastructure, making it suitable for ISO Class 7 cleanroom-adjacent benchtop environments where electromagnetic compatibility and minimal footprint are essential.
Key Features
- Gravity-driven, adjustable needle-valve flow control enabling precise, pulse-free dispensing across a calibrated range of 0.5–7 mL/min (equivalent to 12–175 drops/min, assuming 1 mL = 25 drops)
- 500 mL transparent polycarbonate reservoir with integrated level indicator and anti-spill cap—chemically resistant to aqueous and alcohol-based suspensions
- Compact modular footprint (190 × 290 × 140 mm) and lightweight construction (2.5 kg) for direct mounting on UNIPOL machine frames without load-bearing modification
- DC 12 V / 25 W power architecture ensures thermal stability and eliminates RF noise interference during sensitive metrology-grade polishing
- No internal stirring mechanism—intentionally omitted to prevent destabilization of suspended abrasive particles and avoid re-sedimentation during idle periods
- Compliant with IEC 61000-6-3 (EMI emission limits) and rated for continuous operation under GLP-aligned laboratory conditions (10–40 °C, 45–65 % RH)
Sample Compatibility & Compliance
The SKZD-3 is validated for use with non-aggressive, pH-neutral aqueous suspensions containing submicron abrasives (e.g., SiO₂ nanoparticles, 10–50 nm; diamond particles ≤ 1 µm). It is not rated for organic solvents, high-acidity/alkalinity slurries (pH 10), or viscous polymer-thickened formulations. While not certified to ISO 13485 or FDA 21 CFR Part 11, its design supports audit-ready documentation practices: flow calibration records, maintenance logs, and environmental monitoring data can be maintained manually per internal SOPs. The absence of firmware or network connectivity renders it inherently compliant with air-gapped lab networks and avoids cybersecurity validation overhead.
Software & Data Management
The SKZD-3 is a hardware-only, analog-controlled device with no embedded software, firmware, or digital interface. Flow rate adjustment is performed manually via calibrated micrometer screw valve—enabling deterministic, repeatable settings traceable to physical position. This architecture eliminates dependency on proprietary drivers or operating system compatibility, ensuring long-term operational continuity independent of IT infrastructure upgrades. For laboratories implementing electronic lab notebooks (ELN), dispensing parameters may be logged alongside polishing run metadata (e.g., UNIPOL speed, pressure, time) to support root-cause analysis of surface roughness (Ra) or subsurface damage trends.
Applications
- Uniform delivery of colloidal silica slurry during final polishing of silicon wafers (200 mm and 300 mm) prior to AFM or ellipsometry inspection
- Controlled dosing of diamond suspension in ceria-free CMP processes for sapphire substrates used in GaN-on-sapphire LED fabrication
- Reproducible abrasive feed in metallographic specimen preparation of Ni-based superalloys and Ti-6Al-4V, minimizing edge rounding artifacts
- Low-shear introduction of nanodispersions into optical glass (BK7, fused silica) lapping protocols to reduce haze and improve transmission homogeneity
- Integration into automated polishing lines where PLC-triggered start/stop signals are routed via dry-contact relay (optional accessory)
FAQ
Is the SKZD-3 compatible with non-UNIPOL polishing systems?
Yes—mechanical mounting is adaptable via custom brackets; however, electrical synchronization (e.g., timed dispensing aligned with platen rotation) requires third-party relay integration.
Can the flow rate be calibrated and verified traceably?
Yes—users may perform gravimetric flow verification using analytical balance and timed collection; KJ GROUP provides a recommended calibration protocol in the operator manual.
Does the unit require periodic filter replacement or maintenance?
No filters are installed; however, the needle valve seat should be inspected quarterly for particulate accumulation when used with diamond suspensions—cleaning with ultrasonic bath and IPA is advised.
What safety certifications does the SKZD-3 hold?
It carries CE marking per EMC Directive 2014/30/EU and Low Voltage Directive 2014/35/EU; full test reports available upon request from KJ GROUP technical support.
Is the reservoir autoclavable?
No—the polycarbonate reservoir is not rated for steam sterilization; cleaning is limited to isopropyl alcohol wipe-down or ultrasonic cleaning at ≤40 °C.
