N4R/N4C Series Electrostatic Suppression System for Ultrapure Water
| Origin | Japan |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | N4R-1.0-50 |
| Price Range | USD 4,200–7,000 (FOB) |
| Water Flow Rate | 100–1000 L/h |
| Controllable Resistivity Range | 0.15–1.7 MΩ·cm |
| Control Accuracy | ±0.03 MΩ·cm |
| Max. Inlet Water Pressure | 0.5 MPa |
| Pressure Drop | 0.06 MPa at 3000 L/h |
| Connection Ports | 3/4″ female screw |
| Power Supply | AC 100–130 V / 220–240 V, 50/60 Hz, single-phase, 1 A |
| Enclosure Type | Rack or Cabinet |
| H₂O₂-Compatible Sterilization | Yes (3% hydrogen peroxide) |
Overview
The N4R/N4C Series Electrostatic Suppression System is an engineered solution designed specifically for semiconductor fabrication, flat-panel display (FPD) manufacturing, and advanced wafer dicing processes where ultrapure water (UPW) resistivity must be precisely maintained to prevent electrostatic discharge (ESD) and particle adhesion. Unlike conventional CO₂-dosing deionization units, this system employs real-time, closed-loop resistivity control based on high-stability impedance sensing—eliminating reliance on consumable membranes, CO₂ gas cylinders, or associated exhaust infrastructure. It operates by dynamically adjusting ion exchange kinetics in response to upstream UPW quality fluctuations, ensuring stable resistivity within ±0.03 MΩ·cm across variable flow conditions (100–1000 L/h for N4R-1.0-50). The system complies with industry-critical purity requirements defined in SEMI F63 (Ultrapure Water Specifications) and supports ISO 14644-1 Class 1–5 cleanroom integration. Its pressure-tolerant architecture (rated to 0.5 MPa inlet pressure) enables direct installation into high-pressure UPW distribution loops without booster pumps or pressure-reduction stations.
Key Features
- Real-time resistivity control via integrated, temperature-compensated conductivity/resistivity probe—no external calibration required during operation.
- Rack-mount (N4R) and floor-standing cabinet (N4C) configurations available for flexible integration into tool-side UPW manifolds or central purification skids.
- Zero-consumable operation: eliminates CO₂ dissolution membranes, gas regulators, vent lines, and associated maintenance downtime.
- Fast dynamic response: maintains setpoint stability even during abrupt flow transitions (e.g., tool purge cycles or batch rinse sequencing).
- H₂O₂-compatible wetted materials (316L stainless steel, EPDM-free fluoropolymer seals) enabling validated 3% hydrogen peroxide sanitization per ISO 14644-2 Annex B protocols.
- Low-pressure-drop design: ≤0.06 MPa at rated maximum flow (3000 L/h), minimizing impact on system-wide UPW pressure budgets.
- Dual-voltage power input (100–130 V / 220–240 V, 50/60 Hz) with internal auto-sensing—suitable for global deployment without transformer dependency.
Sample Compatibility & Compliance
The N4R/N4C series interfaces exclusively with ultrapure water streams meeting ASTM D5127 Type E or SEMI F63 Grade C specifications (TOC ≤ 0.5 ppb, silica ≤ 0.1 ppb, particles ≥ 0.05 µm < 10/mL). All wetted surfaces conform to USP Class VI biocompatibility and meet FDA 21 CFR 177.2400 for food-contact polymers. Electrical safety complies with IEC 61010-1:2010 Ed.3 (Measurement, Control and Laboratory Equipment). The system supports audit-ready operation under ISO 9001:2015 and ISO 13485:2016 quality management frameworks, with optional firmware logging for GLP/GMP traceability (including timestamped resistivity setpoints, deviations, and sterilization cycle records).
Software & Data Management
The embedded controller features a local LCD interface with intuitive menu navigation and password-protected parameter access. Resistivity setpoints, alarm thresholds (high/low deviation, sensor fault), and manual override modes are configurable without external software. Optional RS-485 Modbus RTU output enables integration into facility SCADA systems for centralized monitoring and historical trending. Audit trail functionality (enabled via firmware update) logs all configuration changes with user ID, timestamp, and pre-/post-value—fully compliant with FDA 21 CFR Part 11 electronic record requirements when paired with validated identity authentication.
Applications
- Semiconductor front-end: UPW resistivity stabilization during wafer dicing, chemical mechanical polishing (CMP) rinse, and photolithography track rinses.
- FPD manufacturing: High-pressure spray rinsing of TFT-LCD and OLED substrates where static-induced particle redeposition compromises yield.
- Advanced packaging: Die attach and underfill rinse stages requiring sub-0.1 ppb metallic ion control and ESD mitigation.
- Research cleanrooms: Integration into custom UPW recirculation loops for synchrotron beamline cooling or nanoimprint lithography tool support.
- Life science instrumentation: UPW supply conditioning for LC-MS mobile phase preparation systems where resistivity drift affects baseline stability.
FAQ
Does the N4R/N4C system require CO₂ gas or consumable membranes?
No. It uses solid-phase ion exchange modulation controlled by real-time resistivity feedback—eliminating CO₂ cylinders, membranes, and associated exhaust piping.
Can it operate under high-pressure UPW distribution networks?
Yes. Rated for continuous operation at up to 0.5 MPa inlet pressure, supporting direct connection to main UPW headers without pressure reduction.
Is sterilization with hydrogen peroxide supported?
Yes. All fluidic pathways are constructed from H₂O₂-compatible materials (316L SS, PFA, FKM-free elastomers), validated for repeated 3% H₂O₂ exposure per ISO 14644-2 Annex B.
What is the typical resistivity control range for the N4R-1.0-50 model?
0.15–1.7 MΩ·cm, with setpoint accuracy maintained at ±0.03 MΩ·cm across its full flow range (100–1000 L/h).
How is compliance with pharmaceutical or semiconductor water standards documented?
Factory calibration certificates include NIST-traceable conductivity probe verification; IQ/OQ documentation templates are provided for GMP validation per ASTM E2500 and SEMI E173 guidelines.
