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| Brand | Atometrics |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM Manufacturer |
| Product Category | Domestic |
| Model | WPM Series |
| Pricing | Upon Request |
| Instrument Type | Non-Contact Profilometer / Surface Roughness Analyzer |
| Operating Principle | White-Light Interferometry |
| Vertical Resolution | 0.001 nm |
| Surface Topography Repeatability (PSI mode, 3×3 filter, 1M points, Sqj/� | 2): 0.03 nm |
| Step Height Accuracy (12 µm NIST-traceable step standard, n=50) | ±0.3% |
| XY Positional Repeatability | <0.19 µm |
| Maximum Vertical Scan Speed | 400 µm/s |
| Typical Vertical Scan Speed | 35 µm/s |
| Maximum Lateral Resolution | 0.19 µm |
| Multi-Layer Thin-Film Measurement Capability | Up to 10 layers |
| Roughness Standards Compliance | ISO 25178, ISO 4287, ISO 287 |
| Overlay Measurement Support | Custom algorithm-enabled |
| Bump & RDL Profile Reconstruction | Enabled via phase-resolved interferometric imaging |
| CMP Uniformity Analysis | Full-wafer die-level topography mapping with dishing/erosion quantification |
| Brand | Atometrics |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM Manufacturer |
| Product Category | Domestic |
| Model | NA-500 |
| Pricing | Upon Request |
| Instrument Type | Non-contact Profilometer / Surface Roughness Analyzer |
| Operating Principle | White-Light Interferometry |
| Vertical Resolution | Sub-nanometer (≤ 0.03 nm) |
| Scan Speed | Up to 400 µm/s |
| Measurement Range | Large-Range Vertical Scanning (Typical Z-range > 10 mm) |
| Compliance | ISO 25178-2, ISO 4287, ASTM E1392, USP <1058> (for instrument qualification) |
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