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KJ GROUP OTF-1200X-5L Single-Zone Open-End Tube Furnace

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Brand KJ GROUP
Origin Liaoning, China
Manufacturer Type Authorized Distributor
Country of Origin China
Model OTF-1200X-5L
Power Supply AC 220 V, 50/60 Hz, 6 kW
Maximum Temperature 1200 °C (≤1 h), Continuous Operation at 1100 °C
Heating Zone Length 880 mm
Uniform Temperature Zone 440 mm
Quartz Tube Dimensions OD 125 mm, ID 120 mm, L 1400 mm
Heating Element Mo-doped Fe-Cr-Al Alloy Wire with Zirconia Coating
Cooling System Dual-layer Shell with Forced Air Circulation
Surface Temperature <55 °C
Temperature Control 30-Stage PID Programmable Controller
Temperature Accuracy ±1 °C
Ramp Rate Up to 20 °C/min
Vacuum Performance 10⁻² torr (Mechanical Pump), 10⁻⁵ torr (Turbomolecular Pump)
Leak Rate <5 mtorr/min
Overall Dimensions 1100 × 450 × 670 mm
Net Weight 80 kg

Overview

The KJ GROUP OTF-1200X-5L is a single-zone, open-end tube furnace engineered for high-precision thermal processing under controlled atmospheres. Designed around a robust horizontal quartz tube configuration (OD 125 mm, ID 120 mm, L 1400 mm), it supports a wide range of laboratory-scale thermal treatments—including annealing, sintering, calcination, chemical vapor deposition (CVD), and precursor decomposition—within a stable temperature envelope up to 1200 °C for short-duration cycles or continuously at 1100 °C. Its core architecture integrates a high-purity polycrystalline alumina fiber insulation lining and an imported U.S.-sourced alumina reflective coating applied to the inner chamber surface, enhancing thermal efficiency, minimizing contamination, and extending service life. The furnace operates on a dual-shell mechanical design with integrated forced-air cooling, ensuring external surface temperatures remain below 55 °C during extended operation—a critical safety and ergonomic feature for shared laboratory environments.

Key Features

  • Dual-layer stainless steel housing with active air-circulation cooling system, maintaining safe-to-touch exterior surfaces (<55 °C) even at maximum operating temperature.
  • High-density polycrystalline alumina fiber insulation combined with a proprietary alumina-based reflective coating on the inner furnace wall to improve radiative efficiency and reduce thermal drift.
  • PID-based temperature controller supporting up to 30 programmable ramp-hold segments, enabling precise thermal profiles for complex multi-step processes such as gradient annealing or staged CVD precursor introduction.
  • Mo-doped Fe-Cr-Al resistance heating elements coated with stabilized zirconia, offering enhanced oxidation resistance and long-term stability at elevated temperatures.
  • CE-certified design compliant with EN 61000-6-3 (EMC emission) and EN 61000-6-2 (immunity), meeting baseline requirements for integration into ISO/IEC 17025-accredited laboratories.

Sample Compatibility & Compliance

The OTF-1200X-5L accommodates standard cylindrical samples up to Ø120 mm in diameter and 440 mm in length within its uniform temperature zone. It supports inert (N₂, Ar), reducing (H₂/N₂ mixtures), oxidizing (O₂), and vacuum environments. When configured with optional KF25 vacuum flanges and turbomolecular pumping systems, it achieves base pressures down to 10⁻⁵ torr—suitable for low-pressure CVD, thin-film synthesis, and volatile residue removal protocols aligned with ASTM F1921 and ISO 11140 standards. The furnace’s vacuum integrity (<5 mtorr/min leak rate) and repeatable thermal uniformity (±1 °C) support GLP-compliant process documentation when paired with validated data logging hardware.

Software & Data Management

While the standard unit features a front-panel PID controller with real-time temperature display and manual program editing, optional RS485/Modbus RTU interface enables integration with third-party SCADA or LabVIEW-based monitoring platforms. For regulated environments, users may deploy external validated data loggers (e.g., Omega OM-DAQPRO-5300 series) to capture time-stamped temperature, power draw, and alarm events—supporting audit trails required under FDA 21 CFR Part 11 when configured with electronic signature and change-control workflows.

Applications

  • Thermal treatment of ceramic precursors and metal-organic frameworks (MOFs) under nitrogen or argon for crystallinity optimization.
  • Graphene and transition metal dichalcogenide (TMD) synthesis via atmospheric- or low-pressure CVD using pre-mixed gas delivery systems.
  • Post-deposition annealing of sol-gel-derived oxide thin films (e.g., TiO₂, ZnO) to control phase composition and grain growth.
  • Controlled pyrolysis of polymer-derived ceramics and carbonization of biomass-derived templates.
  • Calibration and validation of thermocouples and infrared sensors across the 300–1200 °C range per ASTM E230/E230M.

FAQ

What vacuum level can be achieved with the standard configuration?
The base system includes a mechanical pump capable of reaching 10⁻² torr; upgrading to a turbomolecular pump package enables 10⁻⁵ torr base pressure.
Is the quartz tube included with the furnace?
Yes—one high-purity fused quartz tube (OD 125 mm, ID 120 mm, L 1400 mm) is supplied as standard equipment.
Can this furnace be used for hydrogen atmosphere processing?
Yes, provided appropriate gas-handling components (leak-tight stainless steel tubing, dual-stage regulators, and H₂-compatible flow meters) are installed and all connections are certified for Class II, Group B hazardous locations per NEC Article 500.
What electrical infrastructure is required for installation?
A dedicated 220 V AC, 30 A circuit with grounded outlet and overcurrent protection is mandatory; voltage fluctuation must remain within ±5 % of nominal rating.
Are calibration certificates available for the built-in thermocouple?
The furnace ships with a Type K thermocouple traceable to NIST standards; full UKAS or ISO/IEC 17025 calibration reports are available upon request at additional cost.

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