AWL CFC15 Continuous Filtration and Drying System
| Brand | AWL |
|---|---|
| Origin | United Kingdom |
| Model | CFC15 |
| Temperature Range | Ambient to 80 °C (standard configuration) |
| Temperature Control Accuracy | < 0.5 °C |
| Filtration Throughput Options | 2.5 L/h, 6.5 L/h, 25 L/h |
| Filter Media Pore Size | 2–40 µm |
| Filter Disc Material | 316L Stainless Steel or Hastelloy® |
| Operating Vacuum | < 40 mbar (absolute) |
| Compressed Air Requirement | 4–6 bar, 1.0 L/min |
| Wetted Materials | Fully customizable per application |
| Compliance | ISO 9001 certified design and manufacturing |
| Regulatory Alignment | Supports GLP/GMP workflows with audit-ready operation logs |
Overview
The AWL CFC15 Continuous Filtration and Drying System is an engineered solution for integrated solid–liquid separation and in-line drying within continuous manufacturing environments. Unlike conventional batch filtration units—such as pressure leaf filters or rotary vacuum drum filters—the CFC15 employs a patented rotating disc filtration architecture operating under controlled vacuum or inert gas (e.g., nitrogen) overlay. This design enables true continuous processing: feed slurry enters the system, undergoes cake formation, washing, dewatering, and optional low-temperature drying—all within a single, compact unit without manual intervention or process interruption. The system’s core principle relies on precise differential pressure control across a multi-layer sintered metal filter disc, ensuring consistent cake thickness, high solids recovery (>99.9%), and negligible product hold-up. Its linear scalability from laboratory to pilot and production scale makes it particularly suited for Quality-by-Design (QbD) implementation in pharmaceutical and fine chemical synthesis.
Key Features
- Patented rotating disc filtration technology—first commercially deployed continuous filtration platform of its kind
- Three standard throughput configurations (2.5, 6.5, and 25 L/h) with interchangeable filter discs and drive modules
- Adjustable cake height control via programmable rotational speed and feed rate synchronization
- Integrated wash and displacement steps with volumetric dosing accuracy ±1.5%
- Optional in-situ drying module using heated inert gas purge (ambient to 80 °C, ±0.5 °C control)
- Full automation via touchscreen HMI with preconfigured SOP sequences and recipe management
- Wetted parts constructed from 316L stainless steel or Hastelloy® C-276; pore size range 2–40 µm sintered metal media
- Compliance-ready architecture: supports 21 CFR Part 11–compliant electronic records when paired with validated software packages
Sample Compatibility & Compliance
The CFC15 accommodates a broad spectrum of crystalline, amorphous, and flocculent suspensions typical in API isolation, catalyst recovery, and intermediate purification. It handles particle sizes ranging from submicron colloids to >500 µm agglomerates, provided rheological and compressibility characteristics remain within defined operational envelopes. All fluid-contact surfaces are electropolished to Ra ≤ 0.4 µm and passivated per ASTM A967. The system conforms to ISO 9001:2015 quality management standards at design, assembly, and commissioning stages. For regulated environments, mechanical and functional qualification protocols align with ICH Q5A, Q7, and USP Analytical Instrument Qualification guidelines. Optional IQ/OQ documentation packages are available upon request.
Software & Data Management
The embedded control system runs on a real-time Linux OS with deterministic I/O response (<10 ms). Process parameters—including filtrate flow rate, vacuum level, disc rotation speed, temperature setpoints, and wash volume—are logged at 1 Hz resolution and stored locally on encrypted SSD storage (16 GB minimum). Data export is supported via CSV, PDF, and OPC UA interfaces. When integrated with enterprise MES or LIMS platforms, the CFC15 provides timestamped, user-attributed event logs compliant with ALCOA+ principles. Audit trail functionality captures all parameter changes, recipe loads, and manual overrides with immutable digital signatures.
Applications
- Continuous downstream processing of APIs following flow hydrogenation or photoredox reactions
- In-line isolation of metal-organic framework (MOF) precursors with minimal solvent retention
- Catalyst recovery and recycle loops in asymmetric epoxidation or cross-coupling sequences
- Final isolation of biocatalytically synthesized chiral intermediates under nitrogen blanket
- GMP-compliant polishing step prior to lyophilization or direct tablet compression
- Process intensification of classical batch crystallizations by coupling with continuous antisolvent addition modules
FAQ
Is the CFC15 suitable for heat-sensitive compounds?
Yes—the system operates at ambient temperature by default and supports nitrogen-purged, low-energy drying at ≤80 °C with PID-controlled heater jackets and real-time thermocouple feedback.
Can it interface with existing flow chemistry platforms?
Yes—standard 1/2″ VCR or Swagelok™ ports enable seamless integration with Syrris, Vapourtec, or Chemtrix reactors via pressure-balanced transfer lines and back-pressure regulators.
What validation support is provided?
AWL supplies FAT/SAT documentation, material traceability dossiers (EN 10204 3.1), and optional GMP-compliant IQ/OQ protocols executed by certified field engineers.
How is filter cleaning managed between campaigns?
Automated CIP cycles use programmed solvent pulses, ultrasonic agitation (optional), and vacuum-assisted drying; full regeneration is verified via post-cycle permeability testing.
Does the system meet explosion protection requirements for solvent-laden environments?
ATEX Zone 1 and IECEx-certified versions are available with flameproof enclosures (II 2G Ex db IIB T4 Gb) and intrinsically safe instrumentation loops.
