MiXran Meg1052 UV-Fused Silica Corner Cube Retroreflector
| Brand | MiXran |
|---|---|
| Model | Meg1052 |
| Substrate | UV-grade fused silica |
| Coating | Protected aluminum (UV-optimized) |
| Diameter | 12.7–50.8 mm |
| Height | 10.16–37.5 mm |
| Total internal reflection angle tolerance | <3″, <5″, or <10″ |
| Surface quality | 20–10 scratch-dig |
| Wavefront distortion | λ/10 @ 633 nm |
| Damage threshold | >1 J/cm² @ 355 nm, 10 ns pulse |
Overview
The MiXran Meg1052 is a high-precision, UV-grade fused silica corner cube retroreflector engineered for demanding optical metrology, laser alignment, interferometry, and space-qualified beam return applications. Unlike standard BK7 or N-BK7 retroreflectors, the Meg1052 utilizes synthetic fused silica with exceptional transmission from 185 nm to 2.1 µm—enabling stable performance in deep-ultraviolet (DUV) systems such as excimer laser setups (e.g., KrF at 248 nm, ArF at 193 nm), UV lithography calibration tools, and vacuum ultraviolet (VUV) spectroscopy platforms. Its monolithic, three-mirror geometry ensures near-perfect autocollimation: incident light is reflected back parallel to its input path regardless of angular orientation, with deviation controlled to ≤3 arcseconds (standard grade) or ≤10 arcseconds (high-stability variant), depending on specification tier. The device operates via total internal reflection (TIR) at each interface, eliminating reliance on metallic film adhesion for primary functionality—thus enhancing long-term thermal and radiation stability.
Key Features
- UV-optimized fused silica substrate with OH-content <1 ppm and refractive index homogeneity Δn <5×10⁻⁶ over aperture
- Protected aluminum coating (UVAL) deposited via electron-beam evaporation, providing >92% average reflectance from 250–2000 nm and enhanced oxidation resistance versus bare Al
- Three precision-ground and polished orthogonal faces with λ/10 surface flatness (rms) at 633 nm and 20–10 scratch-dig surface quality
- Thermal expansion coefficient of 0.55×10⁻⁶ /°C (20–100°C), minimizing misalignment drift in temperature-varying environments
- Compatible with ultra-high vacuum (UHV) conditions (<10⁻⁹ mbar) following bake-out; no outgassing contaminants detected per ASTM E595
- Available in seven standardized aperture sizes (12.7 mm to 50.8 mm) with height-to-diameter ratios optimized for mechanical mounting rigidity and minimal diffraction edge effects
Sample Compatibility & Compliance
The Meg1052 is designed for integration into Class 100 cleanroom-compatible optical benches, laser cavity end mirrors, satellite-based LIDAR calibration targets, and semiconductor process control sensors. All units undergo 100% interferometric verification using Zygo Verifire™ systems and are supplied with individual test reports including transmitted wavefront error (TWE), peak-to-valley (PV) deviation, and spectral reflectance curves (200–1100 nm). Manufacturing complies with ISO 9001:2015 and adheres to material traceability requirements per MIL-PRF-13830B. The protected aluminum coating meets NASA low-outgassing specifications (SP-R-0022A) and is compatible with GLP-compliant calibration workflows in regulated photonic R&D labs.
Software & Data Management
While the Meg1052 is a passive optical component, its performance data—including measured wavefront maps, spectral reflectance datasets, and environmental stress test logs—are archived in MiXran’s secure, audit-trail-enabled Quality Management System (QMS), compliant with FDA 21 CFR Part 11 for electronic records. Customers receive encrypted digital certificates of conformance (CoC) and spectral performance files in ASCII-compatible .csv and .spectrum formats, fully importable into Zemax OpticStudio, CODE V, and FRED optical design environments. Batch-level metrology data can be integrated via REST API into enterprise MES or PLM platforms for full supply chain traceability.
Applications
- Laser interferometer gravitational-wave observatory (LIGO)-style displacement sensing and cavity length stabilization
- UV laser beam steering and closed-loop alignment in maskless lithography tools
- Calibration reference for optical coordinate measuring machines (CMMs) and laser trackers (e.g., Leica AT960, API Radian)
- Retroreflective targets in airborne and orbital LIDAR altimeters requiring DUV durability and zero thermal hysteresis
- High-energy pulsed laser diagnostics where dielectric coatings risk damage but metal films lack broadband UV response
- Ultrafast pump-probe experiments requiring polarization-insensitive, dispersion-free return paths
FAQ
What distinguishes the Meg1052 from standard BK7 corner cubes?
The Meg1052 uses UV-grade fused silica instead of optical glass, enabling transmission down to 185 nm and superior resistance to solarization under prolonged UV exposure.
Is the protected aluminum coating suitable for use in vacuum environments?
Yes—the UVAL coating has been validated for UHV compatibility per ASTM E595 and shows no measurable water vapor desorption after 24-hour bake-out at 120°C.
Can the Meg1052 be mounted in kinematic fixtures without inducing stress birefringence?
Absolutely—the low CTE fused silica substrate and symmetric geometry minimize thermally induced stress; recommended mounting uses indium foil or elastomeric pads to avoid point-loading.
Do you provide custom angular tolerances or non-standard diameters?
Yes—custom configurations down to ≤1″ angular deviation and apertures up to 75 mm are available under NRE agreement with full metrology reporting.
Are calibration certificates NIST-traceable?
Wavefront and reflectance measurements are performed using NIST-traceable interferometers and spectrophotometers; certificates include uncertainty budgets per ISO/IEC 17025.
