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Leica DM750M Metallurgical Microscope

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Brand Leica
Origin Germany
Model DM750M
Configuration Upright
Total Magnification 1000×
Eyepiece 10×
Objective Lenses 40×–100×
Illumination LED Reflected Light (Brightfield, Polarized, Oblique)
Stage Universal Mechanical Stage (Compatible with Transmitted & Reflected Light)
Image Analysis System Integrated
Objective Turret 4- or 5-Position
LED Lifetime >20,000 hours

Overview

The Leica DM750M Metallurgical Microscope is an upright, reflected-light optical microscope engineered for routine and advanced materials characterization in industrial quality control laboratories, metallurgical research facilities, and academic materials science departments. Designed according to ISO 9001-compliant manufacturing standards in Wetzlar, Germany, the DM750M employs Köhler illumination principles in both reflected and transmitted light configurations—enabling high-contrast, low-glare imaging of opaque metallic specimens, polished cross-sections, coatings, composites, and sintered ceramics. Its modular architecture supports standardized DIN/ISO 8037-1 mechanical interfaces, ensuring compatibility with Leica’s full portfolio of objective lenses, contrast modules, and digital imaging components. Unlike entry-level educational microscopes, the DM750M features a rigid, vibration-damped cast-aluminum stand and precision-ground optical pathways that maintain axial alignment stability under extended operational duty cycles—a critical requirement for ASTM E3–22 and ISO 643-compliant microstructural analysis.

Key Features

  • Universal mechanical stage with 76 × 52 mm travel range and dual-mode positioning (reflected/transmitted light compatible), accommodating specimens up to Ø30 mm via interchangeable sample clamps
  • LED-based reflected-light illumination system delivering stable, flicker-free white light (CCT ≈ 5700 K) with integrated field diaphragm and aperture diaphragm controls for precise Koehler alignment
  • Four- or five-position objective turret supporting Leica HC PL Fluotar and EC Epiplan objectives (5×, 10×, 20×, 50×, 100× oil immersion), enabling total magnifications from 50× to 1000× with 10× wide-field eyepieces (20 mm field number)
  • Dedicated epi-illumination path with selectable brightfield, polarized, and oblique illumination modes—optimized for grain boundary delineation, phase identification, inclusion analysis, and surface defect mapping
  • Ergonomic observation tube options: fixed trinocular, inclined binocular (30°), ergonomic tilting (0–35°), and C-mount-compatible video tube—all compliant with EN 62366-1 usability engineering requirements
  • Integrated LED power management circuitry ensuring constant luminance output across ambient temperatures from 15°C to 30°C, with thermal shutdown protection and >20,000-hour rated lifetime

Sample Compatibility & Compliance

The DM750M accommodates standard metallographic specimens (25 × 30 mm, 30 × 40 mm, Ø25 mm, Ø30 mm) as well as non-standard geometries using optional vacuum chucks and magnetic holders. Its robust stage design meets ISO 10793-1 mechanical load specifications (max. 5 kg static load). The system complies with IEC 61000-6-3 (EMC emissions) and IEC 61000-6-2 (immunity), and its optical components conform to ISO 10110-1 surface quality standards (scratch-dig ≤ 10-5). For regulated environments, the microscope integrates seamlessly with Leica Application Suite (LAS) X software configured for 21 CFR Part 11 compliance—including electronic signatures, audit trails, and user role-based access control—supporting GLP and GMP documentation workflows per ISO/IEC 17025:2017 Annex A.2.

Software & Data Management

Digital imaging is enabled via Leica’s USB 3.0–compatible DMC series cameras (e.g., DMC 2900, DMC 5400), offering 5.0 MP to 20.0 MP resolution, hardware-triggered acquisition, and real-time frame rates up to 60 fps at full resolution. LAS X software provides calibrated measurement tools (grain size per ASTM E112, inclusion rating per ASTM E45, phase fraction quantification), automated stitching for large-area mosaics, and export to TIFF, JPEG2000, or vendor-neutral NDPI-compatible formats. All image metadata—including objective ID, magnification, illumination mode, exposure time, and calibration date—is embedded in EXIF tags and preserved during DICOM conversion for archival traceability.

Applications

  • Microstructural evaluation of ferrous and non-ferrous alloys per ASTM E3, ISO 643, and JIS G 0551
  • Failure analysis of fracture surfaces, fatigue cracks, and intergranular corrosion
  • Coating thickness measurement and adhesion assessment on electroplated, PVD, and thermal-spray layers
  • Particle size and morphology analysis in powder metallurgy and additive manufacturing feedstocks
  • Quality assurance of weld zones, heat-affected zones (HAZ), and brazed joints in aerospace and automotive components
  • Teaching and training in materials engineering curricula requiring reproducible, standards-aligned imaging protocols

FAQ

Does the DM750M support both reflected and transmitted light observation?
Yes—the universal mechanical stage and dual-path condenser design allow rapid reconfiguration between epi-illumination (for opaque metals) and transmitted-light Köhler illumination (for transparent polymers, thin sections, or inclusions in resin mounts).
Is the LED illumination system field-serviceable?
No—the LED module is permanently sealed and thermally coupled to the housing; replacement requires factory recalibration to maintain color temperature uniformity and intensity linearity.
Can third-party software be used for image analysis?
Yes—Leica provides TWAIN and GenICam drivers, enabling integration with MATLAB Image Processing Toolbox, FIJI/ImageJ, and commercial metrology platforms such as Olympus Stream or Thermo Scientific Amira.
What objective lens series is recommended for quantitative grain size analysis?
Leica EC Epiplan 5×/0.12 and 10×/0.25 objectives are optimized for ASTM E112 linear intercept measurements due to their flat-field correction and minimal distortion across the 20 mm field of view.
Is the DM750M suitable for ISO/IEC 17025-accredited testing laboratories?
Yes—when paired with LAS X software configured for audit trail logging, instrument calibration records, and operator authentication, the system satisfies clause 6.4.10 (equipment verification) and clause 7.7 (result reporting) requirements.

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