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| Brand | BEQ |
|---|---|
| Origin | Anhui, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | BTF-ALD-100 |
| Precursor Configuration | 2 heated metal precursor lines (up to 200 °C) + 1 H₂O precursor line |
| Sample Capacity | Up to 4-inch wafers (100 mm), fully compatible with ≤4″ substrates |
| Uniformity | < ±1% non-uniformity over 4″ Al₂O₃ film after 300 ALD cycles |
| Base Pressure | ≤5 × 10⁻⁵ Torr (with dual-stage rotary vane pump, ≥16 m³/h) |
| Temperature Control | Substrate heating up to 300 °C (±0.5 °C) |
| Vacuum Gauge | MKS digital capacitance manometer (10⁻⁵–10⁵ Torr) |
| Sealing | Perfluoroelastomer (FFKM) O-rings, leak rate < 5 × 10⁻⁷ Pa·L/s |
| MFC Accuracy | ±1% FS for two analog mass flow controllers |
| Power Supply | 380 V AC, 50–60 Hz, 5 kW |
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