Microworks
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| Brand | Microworks |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Optical Component |
| Model | Grating |
| Component Type | Optical Element |
| Substrate Options | 4-inch (70–90 mm diameter), 6-inch (up to 110 mm diameter, subject to design constraints) |
| Fabrication Technology | X-ray LIGA with electroformed Ni/Au structures |
| Typical Grating Periods | G1 = 2.4 µm or 4.37 µm (Ni) |
| Beam Compatibility | Parallel and cone-beam geometries |
| Structural Form | Planar or curved (custom curvature available) |
| Aspect Ratio | >100:1 |
| Minimum Feature Size | <1 µm |
| Compliance | Designed for Talbot-Lau interferometry in laboratory and synchrotron environments |
| Key | Brand: Microworks |
|---|---|
| Origin | Switzerland |
| Model | FZP-S38/84 |
| Membrane Material | SiC |
| Membrane Thickness | 0.2 µm |
| Outermost Zone Width (ΔRₙ) | 38 nm |
| Diameter (D) | 84 µm |
| Total Zones (N) | 550 |
| Absorber Thickness (Tₘ) | 160 nm |
| Absorber Material | Tantalum (Ta) |
| Substrate | Silicon, 10 mm × 10 mm × 1 mm |
| Brand | Microworks |
|---|---|
| Origin | Germany |
| Model | TALINT EDU |
| Component Category | Optical & X-ray Interferometric Components |
| Dimensions | 60 cm × 15 cm × 20 cm |
| Grating Substrate | Graphite (G0/G2, 400 µm) / Silicon (G1, 200 µm) |
| G0/G2 Absorber | Au (>150 µm / >50 µm) |
| G1 Phase Shifter | Au (7.7 µm @ 40 keV) or Ni (7.4 µm @ 21 keV) |
| Grating Periods | 6.00 µm (40 keV design) or 4.80 µm (21 keV design) |
| G0/G2 Duty Cycle | 0.55 ± 0.05 |
| G1 Duty Cycle | 0.50 ± 0.05 |
| G0/G2 Effective Area | 15 mm × ? / 70 mm × ? |
| G1 Effective Area | 70 mm × ? |
| G0–G1 & G1–G2 Separation | 29 cm (precision dowel-mounted) |
| Field of View (sample) | 35 mm |
| Phase-Stepping Actuation | Closed-loop piezoelectric translation stage, 30 nm resolution (includes controller) |
| Fringe Visibility | >15% typical |
| Mounting Base | M6 threaded holes on 25 mm grid spacing |