PIE Scientific
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| Brand | PIE Scientific |
|---|---|
| Origin | USA |
| Model | Tergeo Basic |
| RF Frequency | 13.56 MHz |
| RF Power | 75 W (optional 150 W) |
| Chamber Internal Diameter × Depth | 110 mm × 280 mm |
| Chamber Volume | 2.6 L |
| Chamber Material | High-Purity Fused Quartz |
| Gas Inlets | 2 standard, optional 3rd |
| Control Interface | 7-inch full-color touchscreen, fully automated |
| Plasma Type | Capacitively Coupled RF Plasma (CCP), non-microwave, non-underfill, non-wafer-specific |
| Compliance | CE, RoHS, FCC Class A |
| Brand | PIE Scientific |
|---|---|
| Model | Tergeo EM |
| Origin | USA |
| RF Frequency | 13.56 MHz |
| RF Power | 75 W (optional 150 W) |
| Chamber Dimensions | Ø110 mm × Depth 280 mm |
| Chamber Volume | 2.6 L |
| Chamber Material | High-Purity Fused Quartz |
| Gas Inlets | 2 standard, optional 3rd inlet |
| Control Interface | 7-inch full-color touchscreen, fully automated |
| Plasma Type | Capacitively Coupled RF Plasma (CCP), no microwave, no downstream-only, no wafer-specific configuration |
| Compliance | Designed for GLP-compliant lab environments |
| Brand | PIE Scientific |
|---|---|
| Origin | USA |
| Model | SEMI-KLEEN |
| RF Frequency | 13.56 MHz |
| RF Power Output | 0–100 W (continuously adjustable) |
| Max Input Power | 200 W |
| Vacuum Interface | KF40 (NW40) flange |
| Ignition Pressure | <0.1 mTorr |
| Operating Pressure Range | <0.1 mTorr to >1.0 Torr |
| Leak Rate | <0.005 sccm |
| Gas | Ambient air (no external gas supply required) |
| Control | Microprocessor-based touchscreen interface with programmable cleaning protocols |
| Plasma Monitoring | Integrated real-time plasma intensity sensor |
| Automatic RF Matching | Yes |
| Particle Filtration | Dual-stage proprietary particulate filter compliant with semiconductor-grade cleanliness requirements |
| Compliance | Designed for GLP/GMP-adjacent vacuum system maintenance |