Inductively Coupled Plasma Optical Emission Spectrometer
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| Brand | Ability Technology |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Manufacturer |
| Product Category | Domestic |
| Model | LTP-ICP-OES |
| Instrument Type | Full-Spectrum Direct-Reading |
| Detection Limit (As, Sb, Pb, Sn, Se, Hg, Cd) | <1 µg/L |
| Repeatability (RSD) | ≤5.0% |
| Stability (RSD, 4h) | ≤5.0% |
| Wavelength Range | 200–350 nm |
| Optical Resolution | ≤1.35 nm |
| Brand | Agilent Technologies |
|---|---|
| Origin | Malaysia |
| Manufacturer Status | Original Equipment Manufacturer (OEM) |
| Import Category | Imported Instrument |
| Model | 5800 |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Detection Limit | S (180.669 nm) < 5 µg/L |
| Precision (RSD) | ≤1.0% |
| Short-Term Stability (RSD) | ≤0.5% |
| Wavelength Range | 167–785 nm |
| Optical Resolution | ≤0.0065 nm (at As 188.980 nm) |
| Brand | Agilent Technologies |
|---|---|
| Origin | Malaysia |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | 5900 ICP-OES |
| Instrument Type | Full-Spectrum Direct-Reading |
| Detection Limit | S (180.669 nm) < 5 µg/L |
| Repeatability | ≤1.0% RSD |
| Short-Term Stability | RSD ≤0.5% |
| Wavelength Range | 167–785 nm |
| Optical Resolution | ≤0.0065 nm (at As 188.980 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Type | Full-Spectrum Simultaneous ICP-OES |
| Detection Limit (Zn at 213.856 nm) | 0.06 ppb |
| Precision (RSD) | ≤0.5% |
| Long-Term Stability (RSD, 4h) | ≤1.5% |
| Wavelength Range | 160–900 nm |
| Optical Resolution | 0.003 nm (at 200 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported Instrument |
| Model | PlasmaQuant 9100 |
| Detection Principle | Full-Spectrum Direct-Reading ICP-OES |
| Optical Range | 160–900 nm |
| Optical Resolution | ≤3 pm |
| Wavelength Accuracy | <0.0004 nm |
| Observation Modes | Dual-View (Radial + Axial) with Four Simultaneous Viewing Configurations |
| Plasma System | High-Stability, High-Power RF Generator (27.12 MHz) |
| Detector | Back-Illuminated CCD with Deep-UV Sensitivity |
| Startup Time | <5 minutes |
| Gas Efficiency | Integrated Plasma Gas Recycling for Cooling & Purge Streams |
| Software | Aspect PQ with ABC and CSI Background Correction Algorithms |
| Compliance | Designed for GLP/GMP environments |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported |
| Model | PlasmaQuant 9200 |
| Instrument Category | Full-Spectrum Simultaneous ICP-OES |
| Wavelength Range | 160–900 nm |
| Optical Resolution | 0.002 nm (at 200 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | PlasmaQuant MS |
| Instrument Type | Full-Spectrum Direct-Reading ICP-MS |
| Detection Limits | Be ≤ 0.1 ppt, Co ≤ 0.2 ppt, In ≤ 0.05 ppt, Bi ≤ 0.05 ppt, U ≤ 0.01 ppt |
| Precision (RSD) | < 3% |
| Short-Term Stability | < 3%, Long-Term Stability: < 4% |
| Brand | East & West Analysis |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Sequential Scanning ICP-OES |
| Detection Limit | Sub-ppb level |
| Precision (RSD) | ≤1.0% |
| Long-term Stability (RSD) | ≤2.0% |
| Wavelength Range | 180–500 nm |
| Optical Resolution | ≤0.012 nm |
| Brand | East & West Analysis |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Manufacturer |
| Product Category | Domestic |
| Model | ICP-7760HP |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Price Range | USD 70,000–100,000 (FOB Beijing) |
| Brand | East & West Analysis |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Origin | Domestic (China) |
| Model | ICP-7762 |
| Price | Upon Request |
| Wavelength Range | 165–800 nm |
| Observation Mode | Vertical Torch Dual-View Configuration |
| Detector | CCD with Auto-Adaptive Purge |
| Purge Gas System | Independent Dual-Path Purging (CCD + Optics Chamber) |
| Purge Gas Options | Argon or Nitrogen (Selectable) |
| Brand | Elite |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Model | ICP-OES 1800 |
| Wavelength Range | 165–900 nm |
| Repeatability (RSD) | ≤1.5% |
| Short-Term Stability | <0.01% |
| Brand | EXPEC/SpectrumLab |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | EXPEC 6000 |
| Pricing | Upon Request |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Detection Limit | µg/L-level |
| Repeatability | <0.5% RSD |
| Stability | <1% RSD over 4 h |
| Wavelength Range | 165–870 nm |
| Optical Resolution | <7 pm at 200 nm |
| Brand | EXPEC/SpectrumLab |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Regional Classification | Domestic (China) |
| Model | EXPEC 6100 |
| Pricing | Upon Request |
| Instrument Type | Full-Spectrum Simultaneous Readout |
| Brand | EXPEC / Superspectro |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | EXPEC 6500 |
| Instrument Type | Full-Spectrum Simultaneous Readout |
| Detection Limit | μg/L-level |
| Repeatability | <0.5% RSD |
| 8-h Stability | <1% RSD |
| Wavelength Range | 165–900 nm (extendable to 130 nm) |
| Optical Resolution | <7 pm at 200 nm |
| Brand | EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Regional Classification | Domestic (China) |
| Model | SPEC Pro 6000 |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Brand | EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Domestic |
| Model | SUPEC 6020 |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Detection Limit | Not Specified |
| Precision (RSD) | Not Specified |
| Stability | Not Specified |
| Wavelength Range | Not Specified |
| Optical Resolution | Not Specified |
| Brand | EXPEC |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | SUPEC 6020 / SUPEC 7020 |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES (6020) / Quadrupole ICP-MS (7020) |
| Detection Limit | Not Specified |
| Precision (RSD) | Not Specified |
| Stability | Not Specified |
| Wavelength Range | Not Specified |
| Optical Resolution | Not Specified |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Detection Limit | Sub-ppb (µg/L) |
| Precision | RSD ≤ 0.5% |
| Wavelength Range | 165–870 nm |
| Optical Resolution | ≤ 0.007 nm @ 200 nm |
| Spectral Coverage | Simultaneous multi-element analysis across 72 elements including major metals and non-metals |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | ICP-5500 |
| Detector | High-resolution overflow-resistant CCD |
| RF Source | All-solid-state self-excited 27.12 MHz generator |
| Optical System | Precision thermostatically controlled Czerny–Turner monochromator with holographic grating |
| Gas Control | Integrated automatic argon flow management module |
| Standby Mode | iStandby (reduces Ar consumption by >50%) |
| Calibration | Real-time full-spectrum calibration using interference-free Ne emission lines |
| Sample Introduction | Multi-channel high-precision peristaltic pump with integrated nebulizer and spray chamber |
| Compliance | Designed to support ISO/IEC 17025, ASTM D1976, EPA Method 200.7, USP <232>/<233>, and GLP/GMP data integrity requirements |
| Software | FPI-SpectraSuite v4.x with 21 CFR Part 11-compliant audit trail, electronic signatures, and raw data archiving |
| Brand | GBC |
|---|---|
| Origin | Australia |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Quantima / Integra |
| Instrument Type | Sequential Scanning ICP-OES |
| Detection Limit (Cu) | 0.7 ppb |
| Precision (RSD) | ≤0.5% |
| Long-Term Stability (RSD) | ≤1.0% |
| Wavelength Range | 160–800 nm |
| Optical Resolution | 0.006 nm (160–200 nm) |
| RF Generator Frequency | 40.68 MHz |
| Argon Consumption (aqueous samples) | <11 L/min |
| Brand | HORIBA |
|---|---|
| Origin | France |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | Ultima Expert |
| Instrument Type | Sequential Scanning ICP-OES |
| Detection Limit | Not Specified |
| Precision (RSD) | ≤1% |
| Long-Term Stability (RSD) | ≤2% |
| Wavelength Range | 160–800 nm |
| Optical Resolution | ≤0.005 nm at 200 nm (Constant Resolution Across Full Range) |
| Brand | LabTech |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Sequential Scanning ICP-OES |
| Detection Limit | <1 ppb (typ. for key elements) |
| Precision (RSD) | ≤1% |
| Stability (RSD, 4h) | ≤2% |
| Wavelength Range | 165–900 nm |
| Optical Resolution | 6 pm / 7 pm / 10 pm @ 257.610 nm (Mn line, measured) |
| Brand | LabTech |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Manufacturer |
| Regional Category | Domestic (China) |
| Model | LabICP 2000 ICP-OES |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Optical Design | Prism + High-Resolution Echelle Grating Two-Dimensional Cross-Dispersed System |
| Detector | Megapixel Large-Area CCD |
| Plasma Orientation | Vertical Torch |
| Observation Modes | Radial, Axial, Dual-View, and Attenuated Variants |
| Gas Control | Mass Flow Controllers (MFCs) for All Gases |
| Software | HiICP Platform with Real-Time & Offline Analysis Capabilities |
| Cooling | Thermoelectrically Cooled CCD with MPS Thermal Isolation Structure |
| Purge | Positive-Pressure Sealed Spectrometer Chamber with Independent Front-Optics Purge |
| RF Generator | Solid-State Crystal-Controlled RF Source with Real-Time Power Monitoring |
| Brand | NCS |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Sequential Scanning ICP-OES |
| Detection Limit (Zn at 213.856 nm) | ≤0.003 µg/L |
| Precision (RSD) | ≤0.5% at 1 mg/L (n=10) |
| Short-term Stability (RSD) | ≤0.75% (500×LOD) |
| Long-term Stability (RSD) | ≤1.25% (500×LOD) |
| Wavelength Range | 165–800 nm (2400 g/mm grating) |
| Optical Resolution | ≤0.012 nm (2400 g/mm) |
| Brand | NCS |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | Plasma 2000 |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Detection Limit | Zn at 213.856 nm ≤ 0.003 mg/L |
| Repeatability | RSD ≤ 0.5% (1 mg/L, n = 10) |
| Short-Term Stability | RSD ≤ 0.5% (500 × LOD) |
| Long-Term Stability | RSD ≤ 1.0% (500 × LOD) |
| Wavelength Range | 165–950 nm |
| Optical Resolution | 0.007 nm (at 200 nm) |
| Brand | NCS |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Origin Category | Domestic |
| Model | Plasma 3000 |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Detection Limit | Sub-ppt to ppt (ng/L–µg/L) |
| Precision | RSD ≤ 0.5% (1 mg/L, n = 10) |
| Short-Term Stability | RSD ≤ 0.5% (500×LOD) |
| Long-Term Stability | RSD ≤ 1.0% (4 h, 500×LOD) |
| Wavelength Range | 165–950 nm |
| Optical Resolution | 0.006 nm @ 200 nm |
| Brand | PerkinElmer |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | Avio 200 |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Gas Consumption | <8 L/min Ar (typical operational mode) |
| Startup Time | <5 minutes from cold start to analysis-ready |
| Dual-View Capability | Axial and Radial Simultaneous Observation without Sensitivity Loss |
| Linear Dynamic Range | Up to 9 orders of magnitude |
| Detector | Back-Illuminated CCD with On-Chip Background Correction |
| Plasma Technology | Flat Plate™ RF Generator and PlasmaShear™ Air-Based Tail Flame Elimination |
| Torch Orientation | Vertical, Tool-Free Adjustable Base with Interchangeable Injector Tubes |
| Software Platform | Syngistix for ICP-OES (21 CFR Part 11 Compliant) |
| Brand | PerkinElmer |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | Avio 500 |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Argon Consumption | <10 L/min (typical operational mode) |
| Plasma Orientation | Dual-View (Axial & Radial) |
| Plasma Technology | Flat Plasma™ |
| Background Correction | Real-Time Synchronous Background Correction |
| Detection Capability | Multi-element, simultaneous quantitative analysis of metals and some non-metals in liquid samples |
| Software Platform | Syngistix™ for ICP-OES |
| Brand | PerkinElmer |
|---|---|
| Model | Avio 550 |
| Origin | Imported |
| Configuration | Refurbished Unit |
| Dimensions (W×D×H) | 76 × 84 × 87 cm |
| Plasma Observation | Dual-view (Axial and Radial) |
| Detection Principle | Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) |
| Nebulization System | 4-channel, 12-roller peristaltic pump |
| Plasma Torch Design | Vertical, tool-free, maintenance-free torch with integrated tail-flame cutoff |
| Argon Consumption | Ultra-low |
| Diagnostic Capability | Real-time plasma imaging via integrated color plasma camera |
| Data Acquisition | Universal Data Acquisition (UDA) — full-wavelength, simultaneous, time-resolved detection |
| Brand | PerkinElmer |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | Avio 550/560 |
| Pricing | Upon Request |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Plasma Configuration | Dual-View (Axial and Radial) |
| Detection Technology | Solid-State CCD Detector Array |
| Gas Consumption | Ultra-Low Argon Flow (<10 L/min typical plasma gas) |
| Torch Design | Vertical, Tool-Free, Maintenance-Free Plasma Torch with Integrated Tail-Flame Suppression |
| Optical System | Flat-Field Echelle Spectrometer with UV-Visible Wavelength Coverage (165–900 nm) |
| Pump System | 4-Channel, 12-Roller Peristaltic Pump |
| Dimensions (W×D×H) | 76 × 84 × 87 cm |
| Camera Integration | Integrated Color Plasma Torch Imaging System for Real-Time Torch & Injector Monitoring |