Deepflow CYUVWPM01 Dual-Wavelength UV Lamp (185 nm / 254 nm)
| Brand | Deepflow |
|---|---|
| Model | CYUVWPM01 |
| Wavelengths | 185 nm and 254 nm |
| Application | Integrated UV irradiation module for ultrapure water systems |
| Origin | Shanghai, China |
| Distribution Type | Authorized Distributor |
| Compliance | Designed to meet ISO 3696 Grade 1 and ASTM D1193 Type I water specifications for TOC reduction and microbial control |
Overview
The Deepflow CYUVWPM01 Dual-Wavelength UV Lamp is an engineered ultraviolet irradiation module specifically designed for integration into high-performance ultrapure water (UPW) generation and recirculation systems. Operating simultaneously at two discrete germicidal and photo-oxidative wavelengths—185 nm and 254 nm—the lamp leverages distinct photophysical mechanisms to achieve dual-mode purification. At 254 nm, the lamp delivers strong absorption by nucleic acids, enabling highly effective inactivation of bacteria, viruses, and spores through DNA/RNA dimerization. At 185 nm, photons possess sufficient energy to cleave molecular oxygen (O₂) and water vapor (H₂O) in the gas phase or dissolved species in aqueous streams, generating hydroxyl radicals (•OH) and atomic oxygen—powerful oxidants that mineralize trace organic contaminants, including low-molecular-weight organics and total organic carbon (TOC). This synergistic action ensures continuous, non-additive, and chemical-free TOC reduction and microbiological control downstream of polishing stages such as ion exchange or electrodeionization.
Key Features
- Simultaneous dual-wavelength emission at precisely stabilized 185 nm and 254 nm peaks, optimized for both germicidal efficacy and advanced oxidation
- High-purity synthetic fused silica quartz sleeve with >90% transmittance at both target wavelengths, minimizing spectral attenuation and thermal drift
- Low-pressure mercury vapor discharge lamp architecture with cold-cathode design for stable output over extended operational lifetimes (typical rated life ≥ 9,000 hours)
- Integrated quartz sleeve cooling channel compatible with inline UPW loop configurations; supports continuous operation at flow rates up to 2.0 L/min without thermal quenching
- Electromagnetic interference (EMI)-shielded ballast with soft-start circuitry to suppress inrush current and extend lamp longevity
- Modular DIN-rail mounting interface and standardized 1/4″ NPT inlet/outlet ports for seamless integration into existing UPW distribution skids
Sample Compatibility & Compliance
The CYUVWPM01 is intended exclusively for use in closed-loop ultrapure water systems where feed water meets ASTM D1193 Type I or ISO 3696 Grade 1 specifications (resistivity ≥ 18.2 MΩ·cm at 25°C, TOC ≤ 5 ppb, bacteria ≤ 1 CFU/mL). It is not suitable for direct exposure of biological samples, solvents, or high-ionic-strength buffers. The lamp complies with IEC 61000-6-3 (EMC emission limits) and IEC 62471 (Photobiological Safety Classification: Risk Group 2 for 254 nm; Risk Group 3 for 185 nm—requiring interlocked enclosures per ANSI Z136.1). When deployed within validated UPW systems, it supports adherence to pharmacopeial requirements including USP “Water for Pharmaceutical Purposes” and EP 2.2.43 “Water for Injection”, particularly for TOC control and bioburden suppression in final polishing loops.
Software & Data Management
As a hardware-only irradiation module, the CYUVWPM01 does not include embedded firmware or onboard data logging. However, it is fully compatible with third-party UPW system controllers (e.g., Siemens Desigo, Rockwell Logix, or custom SCADA platforms) via analog 4–20 mA intensity monitoring output and digital dry-contact status feedback (lamp-on / lamp-fault). Integration enables real-time UV intensity trending, predictive maintenance scheduling based on cumulative operating hours, and audit-trail-capable event logging aligned with FDA 21 CFR Part 11 requirements when paired with compliant supervisory software. Lamp performance validation follows ASTM D6166-22 (“Standard Practice for UV Intensity Measurement in Water Treatment”) using NIST-traceable radiometers calibrated at both 185 nm and 254 nm.
Applications
- Final-stage TOC abatement in semiconductor-grade UPW systems (SEMI F63 compliant)
- Microbial control in recirculating loops of clinical laboratory water systems (CLSI GP32-A5)
- Prevention of biofilm re-growth in point-of-use (POU) distribution manifolds serving HPLC, LC-MS, and cell culture applications
- Supporting validation of water-for-injection (WFI) systems under EU GMP Annex 1 and WHO TRS 970
- In-line disinfection of purified water used in clean steam generators and pharmaceutical rinse cycles
FAQ
Is the CYUVWPM01 suitable for retrofitting into existing UPW systems?
Yes—its modular mechanical interface, standardized electrical connections, and compatibility with industry-standard control signals enable straightforward integration into legacy and new-build UPW skids.
Does the lamp require periodic recalibration?
No recalibration is required for the lamp itself; however, annual verification of UV intensity using a NIST-traceable radiometer is recommended per ASTM D6166-22 and internal quality protocols.
Can this lamp be operated in air or only submerged in water?
It is designed for operation within a quartz-sleeved, water-jacketed chamber. Direct air exposure at 185 nm will generate ozone and poses occupational safety risks; operation outside a sealed, water-cooled housing is prohibited.
What is the typical service life under continuous operation?
Rated lifetime is ≥ 9,000 hours at nominal power; actual service life depends on thermal management, power cycling frequency, and feed water quality (e.g., silica scaling or particulate fouling of the quartz sleeve).
