EDI Module, Deepflow CYTTEDI40 Ultra-Pure Water System (40 L/h)
| Brand | Deepflow |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | CYTTEDI40 |
| Flow Rate | 40 L/h |
| Output Water Resistivity | ≥15 MΩ·cm (at 25°C) |
| Feed Water Requirement | Deionized or RO water (≤10 µS/cm, ≤0.5 ppm TOC, <0.1 ppm silica) |
| Operating Pressure | 0.1–0.4 MPa |
| Power Supply | 220 VAC, 50 Hz |
| Dimensions (W×D×H) | 320 × 450 × 600 mm |
| Weight | 28 kg |
| Certifications | CE, ISO 9001, GB/T 17218–1998 (Drinking Water Treatment Components) |
Overview
The Deepflow CYTTEDI40 EDI Module is a continuous electrodeionization unit engineered for integration into laboratory-scale ultra-pure water systems. It operates on the principle of electrochemical deionization—combining ion-exchange membranes, mixed-bed ion-exchange resins, and direct current to remove residual ionic contaminants from reverse osmosis (RO) or deionized (DI) feed water without chemical regeneration. Unlike conventional mixed-bed polishing units, the CYTTEDI40 delivers stable, uninterrupted production of Type I ultrapure water (≥15 MΩ·cm at 25°C) with low silica, boron, and total organic carbon (TOC) carryover—critical for applications in trace elemental analysis, HPLC mobile phase preparation, cell culture media formulation, and semiconductor wafer rinsing.
Key Features
- Continuous ion removal without acid/base regeneration—eliminates downtime, chemical handling hazards, and waste disposal requirements.
- Integrated flow-controlled design optimized for 40 L/h throughput, compatible with standard RO pre-treatment modules (e.g., 50–100 psi feed pressure, ≤10 µS/cm conductivity).
- High-efficiency stack architecture featuring heterogeneous ion-exchange membranes and uniformly packed mixed-bed resin—ensures consistent resistivity output and extended service life under steady-state operation.
- Robust stainless-steel housing (304 SS) with EPDM gasketing and sanitary quick-connect fittings (1/4″ compression or ISO-KF 16) for leak-free integration into closed-loop water distribution systems.
- Real-time monitoring interface supports analog 4–20 mA output for resistivity and flow rate, enabling seamless connection to central lab monitoring platforms or PLC-based control systems.
- Low energy consumption: typical power draw ≤85 W during nominal operation, aligning with ISO 14644 cleanroom facility efficiency benchmarks.
Sample Compatibility & Compliance
The CYTTEDI40 is designed exclusively for post-RO polishing and must be fed with pretreated water meeting ASTM D1193-20 Grade III specifications (conductivity ≤10 µS/cm, TOC ≤0.5 ppm, free chlorine <0.1 ppm). It complies with GB/T 17218–1998 for drinking water treatment components and conforms to mechanical safety requirements per CE Directive 2006/42/EC. While not certified to ISO 3696:1987 (Laboratory grade water) as a standalone system, it contributes to full-system compliance when integrated into validated multi-stage purification platforms meeting ISO/IEC 17025 or GLP audit requirements. Its non-leaching construction and low extractables profile support adherence to USP Water for Pharmaceutical Purposes when deployed within qualified GMP water systems.
Software & Data Management
The module itself is hardware-only and does not include embedded firmware or local display. However, its analog outputs (resistivity and flow) are fully compatible with third-party SCADA, LabVIEW, or DeltaV systems for real-time logging and alarm triggering. When integrated into Deepflow’s CYT series ultra-pure water systems, it interfaces with the CYT-Link™ supervisory software—providing time-stamped event logs, calibration history, membrane performance trending, and 21 CFR Part 11–compliant electronic signatures for audit-ready documentation. All data exports are CSV-formatted and timestamped to UTC, supporting retrospective review per FDA ALCOA+ principles.
Applications
- HPLC, UHPLC, and LC-MS mobile phase and blank preparation where sub-ppb ionic contamination must be avoided.
- Atomic absorption spectroscopy (AAS), inductively coupled plasma mass spectrometry (ICP-MS), and ion chromatography (IC) sample dilution and standard preparation.
- Electrophysiology buffer preparation requiring stable pH and minimal conductive impurities.
- Microelectronics cleanroom rinse water for photomask and wafer cleaning processes (Class 100/ISO 5 environments).
- Cell and tissue culture media supplementation where endotoxin-free, low-sodium water is essential for reproducible viability assays.
FAQ
Does the CYTTEDI40 require periodic resin replacement?
No—the mixed-bed resin is electrochemically regenerated in situ; scheduled replacement is only necessary after ≥24 months of continuous operation or if feed water quality deteriorates significantly (e.g., sustained TOC >1 ppm or silica >0.2 ppm).
Can it be used with seawater or hard tap water as feed?
No—direct feed must be RO- or DI-grade water (≤10 µS/cm). Pre-treatment with dual-stage RO and activated carbon filtration is mandatory.
Is validation support available for IQ/OQ/PQ protocols?
Yes—Deepflow provides template test protocols, DQ/IQ/OQ checklists, and calibration certificates traceable to NIM (China National Institute of Metrology) upon request.
What maintenance intervals are recommended?
Quarterly visual inspection of fittings and electrical connections; semi-annual verification of resistivity sensor calibration using NIST-traceable KCl standards.
How does it compare to traditional mixed-bed cartridges?
It eliminates cartridge changeouts, reduces operator exposure to spent resin, and maintains tighter resistivity control (±0.2 MΩ·cm) over extended run times—reducing variability in analytical baselines.
