EQ185nm UV Lamp by Deepflow
| Brand | Deepflow |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | PRC |
| Model | CYQUVLPO1 |
| Pricing | Available Upon Request |
Overview
The EQ185nm UV Lamp (Model CYQUVLPO1) is a specialized low-pressure mercury vapor ultraviolet light source engineered for advanced photochemical oxidation in ultra-pure water (UPW) systems. Unlike conventional 254 nm germicidal lamps, this lamp emits intense vacuum-ultraviolet (VUV) radiation at a peak wavelength of 185 nm—capable of photolyzing dissolved molecular oxygen (O₂) and water (H₂O) to generate hydroxyl radicals (•OH) and atomic oxygen. These highly reactive species enable the oxidative degradation of trace organic contaminants—including total organic carbon (TOC), endotoxins, and low-molecular-weight organics—down to sub-ppb levels. Integrated into the final polishing stage of ultra-pure water systems, the EQ185nm lamp serves as a critical non-membrane, chemical-free TOC reduction component compliant with ASTM D5127, ISO 3696 Grade 1, and SEMI F63 specifications for semiconductor-grade water.
Key Features
- Vacuum-ultraviolet emission centered at 185 ± 2 nm, optimized for photolytic OH• generation in aqueous phase
- Fused silica quartz envelope with high VUV transmittance (>85% at 185 nm), resistant to solarization under continuous operation
- Low-pressure mercury discharge design with stable spectral output over rated lifetime (≥ 9,000 hours)
- Integrated thermal management system ensuring consistent lamp wall temperature (40–50 °C) for optimal Hg vapor pressure and output stability
- CE-marked electrical interface with IEC 61000-6-3 EMC compliance; designed for 24/7 operation in Class 100 cleanroom environments
- Modular mounting configuration compatible with standard UPW loop manifolds (1/2″–3/4″ sanitary tri-clamp or NPT connections)
Sample Compatibility & Compliance
The EQ185nm UV Lamp operates exclusively within closed-loop ultra-pure water distribution systems delivering resistivity ≥ 18.2 MΩ·cm (25 °C) and TOC < 1 ppb. It is not intended for direct exposure to ambient air, biological samples, or non-deionized liquids. The lamp complies with key regulatory and industry frameworks governing high-purity water production: ISO 14644-1 (cleanroom classification), USP “Water for Pharmaceutical Purposes”, and FDA 21 CFR Part 211 for pharmaceutical water systems. Its performance validation supports GLP/GMP audit requirements, including documented lamp intensity decay curves and scheduled replacement protocols aligned with ASTM D4195-22 Annex A2.
Software & Data Management
While the EQ185nm UV Lamp itself is a passive optical component without embedded firmware, it is routinely integrated into supervisory control and data acquisition (SCADA) platforms used in UPW systems. Compatible controllers monitor real-time UV intensity via calibrated photodiode sensors (traceable to NIST SRM 2032), log cumulative operating hours, and trigger maintenance alerts upon reaching 85% of nominal output or 9,000-hour service life. Data logs comply with 21 CFR Part 11 requirements when paired with validated electronic record systems—supporting full audit trails, user access controls, and electronic signatures for qualification documents (IQ/OQ/PQ).
Applications
- Final TOC polishing in semiconductor fab UPW systems (meeting SEMI F63 ≤ 0.5 ppb TOC)
- Reduction of pyrogenic organics in biopharmaceutical process water and WFI (Water for Injection) loops
- Prevention of biofilm precursor accumulation in stainless-steel distribution piping
- Supporting regeneration cycles of mixed-bed ion exchange resins by oxidizing organic fouling agents
- Validation studies requiring trace-level organic removal where ozone or hydrogen peroxide addition is prohibited
FAQ
What is the primary photochemical mechanism enabled by 185 nm UV irradiation?
Photolysis of water molecules generates hydroxyl radicals (H₂O + hν185nm → H• + •OH), while O₂ dissociation yields atomic oxygen (O₂ + hν185nm → 2O), both contributing to non-selective oxidation of organic impurities.
Can this lamp be used independently outside an ultra-pure water system?
No—185 nm photons are strongly absorbed by atmospheric oxygen and moisture; operation requires a sealed, deaerated, high-resistivity water path to ensure effective photon delivery and radical yield.
How often must the lamp be replaced to maintain TOC reduction efficacy?
Based on accelerated aging tests per ASTM D4195-22, replacement is recommended at 9,000 operational hours or when downstream TOC increases by >0.1 ppb under steady-state flow conditions—whichever occurs first.
Is the CYQUVLPO1 model compatible with third-party UV intensity monitoring systems?
Yes—its standardized 0–10 V analog output interface and Modbus RTU support integration with major UPW OEM controllers (e.g., Veolia, Evoqua, Sartorius, ELGA).
Does Deepflow provide validation documentation for GMP environments?
Deepflow supplies Factory Acceptance Test (FAT) reports, material certifications (3.1 EN 10204), and lamp spectral output characterization data; site-specific IQ/OQ protocols must be executed by qualified system integrators per client SOPs.
