Tongtian TBP1002T Titanium Alloy Dual-Piston Constant Flow Pump

Overview

The Tongtian TBP1002T is a dual-piston constant flow pump engineered for precision liquid delivery under aggressive chemical conditions. It operates on positive displacement principle using two synchronized titanium alloy pistons driven by a microprocessor-controlled stepper motor system. This architecture ensures minimal pressure pulsation (<0.08 MPa) and high volumetric reproducibility (RSD ≤ 1%), critical for applications demanding stable backpressure and consistent eluent delivery—such as preparative chromatography, electrochemical synthesis, corrosion-resistant process sampling, and continuous-flow reactor feeding. Unlike stainless-steel or PEEK-based pumps, the TBP1002T employs ASTM B348 Grade 2 commercially pure titanium for all fluid-contacting components—including pump head, inlet/outlet manifolds, and piston seals—conferring exceptional resistance to oxidizing acids (e.g., nitric, phosphoric, sulfuric), alkaline media (e.g., concentrated ammonia solutions), and halide-containing electrolytes (e.g., copper/nickel electrowinning baths). Its operational envelope spans 0.1–10.0 mL/min at pressures up to 2.0 MPa, making it suitable for mid-pressure analytical and pilot-scale synthetic workflows where material compatibility supersedes cost-driven compromises.

Key Features

• Fluid path constructed entirely from ASTM B348 Grade 2 titanium—certified for long-term stability in pH 0–14 environments and resistant to pitting, crevice corrosion, and stress corrosion cracking in chloride-rich media
• Dual-piston architecture with sapphire ball valves and zirconia ceramic check seats—engineered to extend service life under abrasive or particulate-laden solvents
• Real-time digital display of setpoint and actual pressure (MPa) and flow rate (mL/min), with dynamic pressure curve visualization on integrated LCD screen
• RS232 serial interface enabling bidirectional communication with host PCs or PLCs for remote parameter configuration, data logging, and automated sequence execution
• Onboard overpressure protection circuitry with automatic shutdown at user-defined thresholds (adjustable up to 2.0 MPa)
• Integrated bubble removal manifold with calibrated venting valve—designed to eliminate entrained gas prior to column or reactor entry without flow interruption
• Memory retention for last-used pressure and flow settings across power cycles; programmable timer function for unattended operation

Sample Compatibility & Compliance

The TBP1002T is validated for use with strongly corrosive aqueous and non-aqueous media, including but not limited to: concentrated HNO₃ (≤70%), H₃PO₄ (≤85%), H₂SO₄ (≤98%), NH₄OH (≤30%), NaOH (≤50%), NaOCl solutions, Cu/Ni sulfate electrolytes, and chlorate-based oxidizers. Its titanium wetted surfaces comply with ISO 10993-5 (cytotoxicity) and USP Class VI biological reactivity testing protocols, supporting GLP-compliant bioprocessing and pharmaceutical intermediate synthesis. While not certified for sterile applications per ISO 13485, its surface finish (Ra ≤ 0.8 µm) and absence of leachable organics render it suitable for GMP-aligned small-molecule API manufacturing when operated within validated parameters. The pump meets CE marking requirements for electromagnetic compatibility (EN 61326-1) and low-voltage safety (EN 61010-1).

Software & Data Management

The TBP1002T supports ASCII-based command protocol over RS232, compatible with LabVIEW™, MATLAB®, Python (pySerial), and custom SCADA systems. Firmware includes audit-trail-capable event logging (power-on, pressure fault, flow deviation >2%, manual override), timestamped to internal RTC. Data export is supported in CSV format via terminal emulation software (e.g., PuTTY, Tera Term). Optional firmware upgrade enables 21 CFR Part 11-compliant electronic signatures and role-based access control when deployed with validated third-party LIMS integration. All calibration constants—including flow correction factors per solvent viscosity—are stored in non-volatile memory and can be backed up externally.

Applications

• Electrochemical metallurgy: Continuous dosing of acidic electrolytes in copper/nickel/cobalt electrowinning cells
• Hydrometallurgical processing: Precise delivery of lixiviants (e.g., H₂SO₄/HCl mixtures) in precious metal extraction circuits
• Preparative HPLC and flash chromatography: Solvent delivery for silica- or polymer-based columns under moderate backpressure
• Corrosion testing rigs: Stable flow of aggressive test media (e.g., ASTM G31-specified seawater analogs) through autoclave reactors
• Flow chemistry synthesis: Metering of highly reactive reagents (e.g., diazonium salts, acyl chlorides) into microreactors with zero metal ion contamination
• Environmental monitoring: Calibration-free pumping of standard reference materials (SRMs) for ICP-MS sample introduction

FAQ

Is the TBP1002T suitable for use with hydrofluoric acid (HF)?
No. HF rapidly attacks titanium oxide layers and causes catastrophic embrittlement. Use only with HF-free chemistries.
Can the pump handle slurries or suspended solids?
Not recommended. Particle size >5 µm may damage sapphire valves or cause premature wear of titanium piston seals.
What maintenance intervals are recommended for routine operation?
Piston seal replacement every 6,000 operating hours; sapphire ball inspection every 12 months or after 200 kg of total solvent throughput.
Does the pump support analog input/output for external process control?
Analog I/O (0–10 V / 4–20 mA) is available as a factory-configurable option (model suffix “-AIO”).
Is firmware update capability included out-of-the-box?
Yes—firmware upgrades are performed via RS232 using Tongtian’s proprietary PC utility, with version rollback and checksum verification.