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| Brand | Annealsys |
|---|---|
| Origin | France |
| Product Type | Rapid Thermal Processing (RTP) Furnace |
| Temperature Range | Up to 2000°C (Zenith series) |
| Heating Rate | >250°C/s (AS-Micro) |
| Vacuum Capability | Down to 10⁻⁶ Torr (AS-Master) |
| Sample Diameter Support | 2 mm to 200 mm |
| Chamber Type | Cold-wall stainless steel or quartz tube |
| Heating Source | Halogen lamp array or tungsten filament |
| Temperature Measurement | Dual-sensor (pyrometer + thermocouple) |
| Control System | Digital PID with auto-tuning |
| Compliance | Designed for GLP/GMP-aligned lab environments, compatible with ASTM F1531 (RTP process validation), ISO 14644-1 Class 5 cleanroom integration |
| Brand | Annealsys |
|---|---|
| Origin | France |
| Model Series | RTP/RTCVD, DLI-CVD, DLI-ALD |
| Temperature Range | 0–2000 °C |
| Max. Ramp Rate | 250 °C/s |
| Cool-down Rate | 250 °C/s |
| Vacuum Capability | Down to 10⁻⁶ Torr |
| Heating Technology | Halogen Lamp (RTP), Tungsten Heater (Zenith), Dual-Side IR (AS-Premium) |
| Chamber Type | Cold-wall stainless steel or quartz tube |
| Substrate Compatibility | 2″ to 200 mm wafers, custom substrates, compound semiconductors |
| Compliance | Designed for GLP/GMP-aligned labs |
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