Empowering Scientific Discovery

Shuyun Instrument (Shanghai) Co., Ltd.

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BrandULVAC-PHI
OriginJapan
ModelPHI GENESIS 900
Excitation SourceCr Kα (5414.7 eV)
Probe Depth~30 nm
Spatial Resolution<10 µm (focused beam mode)
Energy Resolution<0.3 eV (at Fermi edge, pass energy 20 eV)
Analyzer TypeHemispherical Deflector Analyzer (HDA) with 180° double-pass optics
Vacuum SystemUHV base pressure <5×10⁻¹⁰ Torr
AutomationFully motorized sample stage, multi-axis tilt/rotation, in-situ transfer capability
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BrandPHI (Physical Electronics)
ModelTRIFT™
OriginJapan
Instrument TypeTime-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS)
Mass AnalyzerTriple-Focusing Reflectron TOF
Spatial Resolution≤ 100 nm (typical, dependent on primary ion source and sample conditions)
Imaging Modes256 × 256, 512 × 512, 1024 × 1024 pixel formats
Depth ProfilingSputter-driven sequential layer removal with synchronized mass spectral acquisition
3D ReconstructionVoxel-based data integration from depth-resolved imaging stacks
Sample Stage Temperature Range–150 °C to +200 °C (LN₂ cooling + resistive heating)
Sample Mounting OptionsBack-mount (25 mm diameter), front-mount (100 mm × 100 mm planar support)
ComplianceDesigned for GLP/GMP-aligned workflows
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BrandULVAC-PHI
OriginJapan
ModelPHI oTOF3+
TypeTOF-SIMS Instrument with TRIFT Analyzer
Ion SourcesLiquid Metal Ion Gun (Ga⁺), Optional Ar-GCIB, Cs⁺, O₂⁺
Spatial Resolution<50 nm (high-resolution mode), <500 nm (high-mass-resolving mode)
AutomationFully Automated Sample Transfer & Unattended Multi-Sample Analysis
Charge NeutralizationDual-Beam Electron/Ar⁺ Neutralization System
Optional FeaturesParallel Imaging MS/MS, FIB Cross-Sectioning, Cryo-Stage, Detachable Glovebox Integration
ComplianceDesigned for GLP/GMP environments
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BrandULVAC-PHI
OriginJapan
ModelPHI 710
CategoryImported Instrument
Vendor TypeAuthorized Distributor
PricingUpon Request
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