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| Brand | PHI (Physical Electronics) |
|---|---|
| Model | TRIFT™ |
| Origin | Japan |
| Instrument Type | Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) |
| Mass Analyzer | Triple-Focusing Reflectron TOF |
| Spatial Resolution | ≤ 100 nm (typical, dependent on primary ion source and sample conditions) |
| Imaging Modes | 256 × 256, 512 × 512, 1024 × 1024 pixel formats |
| Depth Profiling | Sputter-driven sequential layer removal with synchronized mass spectral acquisition |
| 3D Reconstruction | Voxel-based data integration from depth-resolved imaging stacks |
| Sample Stage Temperature Range | –150 °C to +200 °C (LN₂ cooling + resistive heating) |
| Sample Mounting Options | Back-mount (25 mm diameter), front-mount (100 mm × 100 mm planar support) |
| Compliance | Designed for GLP/GMP-aligned workflows |
| Brand | ULVAC-PHI |
|---|---|
| Origin | Japan |
| Model | PHI oTOF3+ |
| Type | TOF-SIMS Instrument with TRIFT Analyzer |
| Ion Sources | Liquid Metal Ion Gun (Ga⁺), Optional Ar-GCIB, Cs⁺, O₂⁺ |
| Spatial Resolution | <50 nm (high-resolution mode), <500 nm (high-mass-resolving mode) |
| Automation | Fully Automated Sample Transfer & Unattended Multi-Sample Analysis |
| Charge Neutralization | Dual-Beam Electron/Ar⁺ Neutralization System |
| Optional Features | Parallel Imaging MS/MS, FIB Cross-Sectioning, Cryo-Stage, Detachable Glovebox Integration |
| Compliance | Designed for GLP/GMP environments |
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