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| Brand | LightFab |
|---|---|
| Origin | Germany |
| Model | LightFab 3D |
| Technology | Selective Laser-Induced Etching (SLE) |
| Primary Substrate | Fused Silica / Borosilicate Glass |
| Process Type | Two-Step Direct-Write 3D Micromachining (Laser Modification + Wet Chemical Etching) |
| Feature Resolution | Sub-µm Structural Detail |
| Etch Selectivity (Quartz) | >500:1 |
| Application Domain | Integrated Photonics, Microfluidics, MEMS-on-Glass, 3D Waveguide Writing, Hermetic Glass Packaging |
| Brand | Yi Xin Technology |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Aerosol Printing |
| Pricing | Available Upon Request |
| Brand | Exaddon |
|---|---|
| Origin | Switzerland |
| Model | CERES |
| Printing Resolution | Up to 1 µm (typical) |
| Printable Materials | Copper, Gold, Silver, Platinum, Nickel, and other electrodepositable metals |
| Operating Environment | Ambient laboratory conditions (no vacuum or inert gas required) |
| Technology Principle | Localized electrochemical deposition (LECD) with microfluidic ion delivery and nanoscale electrode positioning |
| Brand | Noivion |
|---|---|
| Origin | Czech Republic |
| Model | AtOx |
| Operating Principle | Pulsed high-voltage dielectric barrier discharge (DBD) in pure oxygen gas |
| Max Pulse Voltage | ≤25 kV |
| Pulse Width | <1 µs |
| Adjustable Pulse Frequency | 1–100 Hz |
| Typical Atomic Oxygen Flux Range | 5–6 × 10¹⁵ atoms/(s·cm²) |
| Estimated AO Kinetic Energy | 1–5 eV (corresponding to 4–8 km/s) |
| Compliance | ASTM E2089, QJ 20422-2-2016 |
| Brand | LPKF |
|---|---|
| Origin | Germany |
| Model | LPKF ProtoLaser H4 / S4 / U4 / R4 |
| Laser Types | Nanosecond Green (532 nm), Nanosecond UV (355 nm), Picosecond Green (515 nm), Mechanical + Laser Hybrid |
| Max. Processing Accuracy | 100 µm line width / 50 µm spacing |
| Safety Class | Class 1 Laser System |
| Footprint | < 1 m² |
| Power Supply | Standard AC Outlet + Compressed Air (6 bar) |
| Brand | Cressington |
|---|---|
| Origin | United Kingdom |
| Model | 208HR |
| Target Materials | Au, Pt, Pt/Pd, AgI, Ir |
| Target Diameter | 57 mm |
| Control Mode | Automatic |
| Chamber Diameter | 150 mm |
| Sample Stage | 100 mm diameter, rotatable and tilt-adjustable |
| Sputtering Gas | Argon |
| Vacuum System | Integrated turbomolecular pumping (implied by HR designation and industry standard) |
| Cooling | Cold-stage sputtering architecture |
| Compliance | Designed for SEM/EPMA sample preparation per ISO 16700 and ASTM E1558 practices |
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