CUBIC INSTRUMENTS Gasboard-2061 NDIR-Based Endpoint Detection Gas Sensor for Semiconductor CVD Process Monitoring
| Brand | CUBIC INSTRUMENTS |
|---|---|
| Origin | Hubei, China |
| Model | Gasboard-2061 |
| Detection Principle | Non-Dispersive Infrared (NDIR) |
| Target Gases | WF₆, CF₄, SF₆, NF₃, CO₂ |
| Range | 1–264 ppm (0–200 mTorr) |
| Repeatability | ±0.5% |
| Linearity | ±1% F.S. |
| Detection Limit | 1 ppm |
| Output | Analog & Digital |
| Design | Modular, OEM-Ready |
| Compliance | Compatible with SEMI E19/E30/E37 standards |
Overview
The CUBIC INSTRUMENTS Gasboard-2061 is an industrial-grade, non-dispersive infrared (NDIR) gas sensor engineered specifically for endpoint detection (EPD) in semiconductor thin-film deposition processes—particularly chemical vapor deposition (CVD) and plasma-enhanced CVD (PECVD) tools. Unlike electrochemical or catalytic bead sensors, the Gasboard-2061 leverages dual-beam NDIR spectroscopy to deliver stable, interference-resistant quantification of key process gases including tungsten hexafluoride (WF₆), carbon tetrafluoride (CF₄), sulfur hexafluoride (SF₆), nitrogen trifluoride (NF₃), and carbon dioxide (CO₂). Its optical architecture eliminates drift associated with consumable components and ensures long-term calibration stability under high-purity, low-particulate cleanroom environments. The sensor operates in real time within vacuum-compatible process chambers (up to 200 mTorr), enabling precise identification of reaction completion via characteristic gas concentration transients—critical for minimizing over-etching, reducing chamber cleaning cycles, and maximizing tool uptime.
Key Features
- True NDIR optical detection with dual-wavelength referencing for enhanced signal-to-noise ratio and immunity to window fouling or ambient temperature fluctuations
- Simultaneous multi-gas capability: factory-configurable for up to five target analytes without hardware modification
- Rapid response time (< 2 seconds T90) optimized for dynamic process monitoring during rapid pressure transitions typical in CVD pulsing and purge sequences
- Modular mechanical design compliant with standard SEMI-compliant flange interfaces (e.g., CF-35, ISO-KF40) and vacuum-rated sealing (≤1×10−8 mbar·L/s He leak rate)
- Dual-output interface: 4–20 mA analog output with HART protocol support + RS-485 Modbus RTU for seamless integration into tool-level PLCs and MES systems
- No consumables or reagents required—optical path remains stable over ≥24 months under continuous operation per SEMI S2/S8 guidelines
Sample Compatibility & Compliance
The Gasboard-2061 is qualified for use in Class 1–100 cleanrooms and meets material compatibility requirements for semiconductor fabrication environments. Wetted materials include electropolished 316L stainless steel, fused silica optical windows, and perfluoroelastomer (FFKM) seals—fully compatible with aggressive fluorinated chemistries and high-vacuum conditions. It supports SEMI E19 (Gas Delivery System Standards), E30 (Vacuum Interface Standards), and E37 (Process Equipment Communications Protocol) specifications. While not a certified safety device per IEC 61508 SIL-2, its output signals are structured to feed into third-party safety instrumented systems (SIS) for interlock logic in accordance with ISO 13849-1 Category 3 PLd architecture.
Software & Data Management
The sensor includes embedded firmware supporting remote configuration via ASCII command set over serial interface. Calibration data—including zero/span coefficients, gas-specific absorption cross-sections, and temperature compensation tables—is stored in write-protected EEPROM with CRC-32 integrity verification. Raw spectral data is not exposed externally; instead, validated concentration values (ppm) are transmitted with timestamped metadata (UTC-aligned) to ensure traceability. When integrated into factory automation systems, the Gasboard-2061 complies with FDA 21 CFR Part 11 requirements for electronic records through optional audit trail logging—capturing operator ID, parameter changes, and calibration events with immutable timestamps.
Applications
- Endpoint detection in WF₆-based tungsten CVD for contact/via fill processes
- Real-time monitoring of NF₃ and SF₆ during chamber cleaning (in-situ etch rate validation)
- CF₄/CO₂ ratio tracking in silicon carbide (SiC) epitaxy reactors to optimize stoichiometry
- Leak detection and residual gas analysis (RGA) support during pump-down and vent cycles
- Integration into cluster tools for cross-chamber process correlation and fault detection via multivariate statistical process control (SPC)
FAQ
Is the Gasboard-2061 certified for use in Class 10 cleanrooms?
Yes—it conforms to ISO 14644-1 Class 5 (equivalent to Federal Standard 209E Class 100) particulate limits when installed with appropriate gasketing and purged per SEMI F47 guidelines.
Can it be calibrated in situ without removing from the tool?
Yes—zero calibration is supported using ultra-high-purity nitrogen (99.9999%) introduced via dedicated purge port; span calibration requires external certified gas standard and is typically performed during preventive maintenance windows.
Does it support MODBUS TCP or only MODBUS RTU?
Only RS-485 MODBUS RTU is natively supported; TCP/IP bridging requires external protocol converter compatible with SEMI E30/E37 message structures.
What is the maximum allowable operating temperature at the flange interface?
The sensor body is rated for 0–50 °C ambient; flange surface temperature must remain below 80 °C to maintain seal integrity and optical alignment stability.
Is firmware update capability available remotely?
Firmware updates require physical access via USB-C service port and must be performed using CUBIC’s signed binary loader to preserve cryptographic signature validation per SEMI E133 security framework.



