Hiden PSM In-Line Plasma Mass Spectrometer

Overview

The Hiden PSM In-Line Plasma Mass Spectrometer is a purpose-engineered differential-pumping quadrupole mass spectrometer designed for real-time, in situ analysis of reactive species in low-temperature plasma environments. Unlike conventional off-line or extractive mass spectrometers, the PSM integrates directly into plasma processing systems via a flanged differential-pumping manifold—enabling simultaneous, time-resolved quantification of neutrals, radicals, positive and negative ions without significant beam attenuation or surface recombination artifacts. Its operational principle relies on energy-filtered ion transmission through a robust triple-stage quadrupole mass filter, coupled with pulsed ion counting detection synchronized to plasma modulation. This architecture supports high-fidelity measurement of transient species kinetics, energy distribution functions (EDFs), and mass-resolved ion fluxes under industrially relevant plasma conditions—including RF, microwave, and pulsed DC discharges.

Key Features

• Differential pumping manifold with ISO-KF or CF flange interface, enabling direct coupling to plasma reactors while maintaining <1×10⁻⁶ mbar operating pressure in the analyzer region
• Triple-stage filtered quadrupole mass analyzer engineered for long-term mass stability and reproducible peak shape across the full 0–2500 u mass range
• Pulsed ion counting detector with 1 µs temporal gating resolution—critical for resolving species evolution during nanosecond-to-millisecond plasma pulses
• Electron attachment ion source option for appearance potential mass spectrometry (AP-MS), supporting quantitative identification of electronegative radicals (e.g., CF_x, O⁻, F⁻) via tunable electron energy control
• Integrated Penning vacuum gauge with hardware interlock circuitry for automatic system shutdown in case of overpressure events (>1×10⁻³ mbar)
• Optional ±100 eV electrostatic energy analyzer (extendable to ±1000 eV) for acquisition of ion energy distribution functions (IEDFs) with <0.5 eV energy resolution
• Mu-Metal and Radio-Metal magnetic shielding packages available to suppress external field-induced mass shift and signal noise in high-EMI laboratory environments

Sample Compatibility & Compliance

The PSM is compatible with a broad spectrum of plasma chemistries including fluorocarbon, oxygen, nitrogen, hydrogen, argon, and mixed-gas discharges used in semiconductor etching, thin-film deposition, surface functionalization, and plasma medicine. It operates under ISO/IEC 17025-aligned calibration protocols; mass scale accuracy is traceable to NIST-standard perfluorotributylamine (PFTBA) and argon isotopic references. The system meets CE marking requirements for electromagnetic compatibility (EN 61326-1) and safety (EN 61010-1). When deployed in regulated manufacturing environments, MASsoft software supports audit-trail-enabled operation compliant with FDA 21 CFR Part 11 and EU Annex 11 requirements—including user access controls, electronic signatures, and immutable data logging.

Software & Data Management

MASsoft Professional is the native control and analysis platform for the PSM, providing integrated instrument configuration, real-time spectral acquisition, time-resolved mass/energy mapping, and post-processing tools for kinetic modeling. The software supports synchronized multi-channel acquisition (mass spectra, gate timing, RF power, bias voltage) with timestamped HDF5 file export for third-party analysis (e.g., Python-based plasma diagnostics pipelines). All raw and processed datasets are stored with embedded metadata (instrument ID, calibration date, operator, gas composition, pressure setpoints), ensuring full experimental traceability. Remote operation is supported via Ethernet LAN using TCP/IP command protocol, enabling integration into factory automation systems (SECS/GEM) or central process monitoring platforms.

Applications

• Real-time monitoring of etchant radical depletion (e.g., CF₂, Cl) and byproduct generation (e.g., COF₂, SiF₄) in silicon and dielectric etch processes
• Quantitative assessment of ion energy distributions at wafer surfaces under varying bias conditions for process window optimization
• In situ characterization of plasma-assisted atomic layer deposition (ALD) precursors and ligand-scavenging intermediates
• Time-resolved study of afterglow chemistry in pulsed plasmas for biomedical device sterilization and wound treatment validation
• Diagnostic support for plasma modeling efforts—including comparison of measured IEDFs and neutral densities against PIC/MCC simulations

FAQ

Can the PSM analyze both ions and neutrals simultaneously?
Yes—the differential pumping design and optional electron attachment source enable concurrent detection of positive/negative ions and ground-state neutrals/radicals without hardware reconfiguration.
What vacuum interface options are available for reactor integration?
Standard configurations include ISO-KF 40/63 and CF 63/100 flanges; custom adapters for ConFlat, DN, or proprietary plasma chamber ports can be supplied upon request.
Is MASsoft compatible with Windows 10/11 and MATLAB?
MASsoft Professional runs natively on 64-bit Windows 10/11 and provides a documented COM API and ASCII data export for MATLAB, Python, and LabVIEW integration.
How is mass calibration maintained during extended operation?
The triple-stage quadrupole architecture minimizes thermal drift; automated daily calibration routines using internal reference gases (Ar, N₂) ensure mass accuracy within ±0.1 u over 72-hour continuous operation.
Does the system support GLP/GMP-compliant data handling?
Yes—when configured with MASsoft’s Audit Trail module and network-authenticated user accounts, the PSM satisfies GLP, GMP, and ISO 9001 documentation requirements for regulated R&D and production environments.