Pfeiffer Vacuum HiPace 1200–2300 Series Turbo Molecular Pump

Overview

The Pfeiffer Vacuum HiPace 1200–2300 series represents a high-performance line of oil-free turbo molecular pumps engineered for demanding ultra-high vacuum (UHV) and high-vacuum (HV) applications in research, semiconductor manufacturing, thin-film deposition, and analytical instrumentation. Based on the principle of momentum transfer—where high-speed rotating turbine blades impart kinetic energy to gas molecules to direct them toward the exhaust—the HiPace series achieves exceptional pumping speeds across a broad molecular weight spectrum. Its hybrid ceramic bearing architecture ensures mechanical stability at rotational speeds up to 90,000 rpm while minimizing particle generation and wear. Designed for integration into complex vacuum systems, each model operates reliably under variable orientation (0°–180°), including fully inverted mounting—a critical capability for space-constrained or gravity-sensitive configurations such as electron microscopy columns or vertical sputtering chambers.

Key Features

• Wide nominal pumping speed range from 1200 to 2300 L/s (measured with nitrogen), with consistently high compression ratios (>1 × 10⁸ for N₂) enabling effective isolation between roughing and high-vacuum stages.
• Hybrid bearing system combining precision steel races with silicon nitride rolling elements—delivering extended service life (rated >100,000 operating hours), low vibration, and resistance to thermal drift.
• Corrosion-resistant C-series variants available for aggressive process gases (e.g., Cl₂, NF₃, CF₄), featuring passivated stainless-steel components and chemically inert surface treatments compliant with semiconductor etch chamber requirements.
• Integrated TC 1200 controller supports direct connection to standard AC mains (90–265 V, 50/60 Hz), eliminating need for external power supplies; includes real-time status monitoring, soft-start ramping, and fault logging via RS-485 or optional Ethernet interface.
• IP54-rated enclosure ensures operational robustness in industrial environments subject to dust ingress and incidental moisture exposure—validated per IEC 60529.
• Compliant with SEMI S2 safety guidelines for semiconductor equipment, UL 61010-1, CSA C22.2 No. 61010-1, and TÜV-certified electromagnetic compatibility (EMC) per EN 61000-6-3/6-4.

Sample Compatibility & Compliance

The HiPace 1200–2300 series demonstrates uniform performance across light (H₂, He) and heavy (Ar, Xe, CF₄) gases, making it suitable for multi-gas processes such as plasma-enhanced chemical vapor deposition (PECVD) and reactive ion etching (RIE). All models meet ISO 27800 (vacuum technology — terminology and definitions) and are compatible with common vacuum system materials (316L stainless steel, copper gaskets, Viton® and Kalrez® elastomers). The C-series configuration satisfies ASTM F2437-22 requirements for corrosion resistance in fluorinated and chlorinated plasma environments. For regulated industries—including pharmaceutical analytical labs and medical device manufacturing—the integrated TC 1200 controller supports audit-ready event logging and may be configured to align with FDA 21 CFR Part 11 data integrity expectations when paired with validated SCADA platforms.

Software & Data Management

While the TC 1200 provides standalone operation, optional Pfeiffer Vacuum Control Software (version 5.x+) enables remote configuration, real-time parameter visualization (rotational speed, bearing temperature, vibration amplitude, gas load), and export of time-stamped CSV logs. The software supports GLP/GMP-compliant workflows through user-access control levels, electronic signature prompts, and immutable log archiving. Communication protocols include Modbus TCP and OPC UA, facilitating seamless integration into FactoryTalk, Siemens Desigo, or LabVIEW-based automation infrastructures. Firmware updates are delivered via secure HTTPS and verified using SHA-256 checksums.

Applications

• Semiconductor fabrication: Load lock evacuation, etch chamber base pressure maintenance, and CVD/PVD process gas handling.
• Analytical instrumentation: Coupling with mass spectrometers (MS), secondary ion mass spectrometers (SIMS), and surface analysis tools requiring stable UHV conditions (<1 × 10⁻⁷ hPa).
• Research laboratories: Ultra-cold atom traps, synchrotron beamline front-ends, and quantum computing dilution refrigerator fore-vacuum stages.
• Industrial coating: Roll-to-roll web coating lines and architectural glass sputtering where uptime and particulate cleanliness are mission-critical.
• R&D vacuum systems: Modular test benches integrating with Pfeiffer’s DuoLine rotary vane pumps or ACP dry scroll backing pumps for optimized total cost of ownership.

FAQ

Can the HiPace 1200–2300 be operated in inverted orientation?
Yes—each model is certified for full 0°–180° mounting flexibility, including upside-down installation, without performance degradation or lubrication issues.
What backing pump is recommended for optimal performance?
Pfeiffer recommends pairing with Duo 2.5 or ACP 20 dry pumps for hydrocarbon-free operation; ultimate pressure and pump-down time depend on backing conductance and gas load profile.
Does the TC 1200 controller support analog or digital process interlocks?
Yes—the controller provides configurable digital I/O (2 inputs, 2 outputs) and 0–10 V analog output for rotational speed feedback, compatible with PLC-based safety interlock circuits.
Is firmware update capability included out-of-the-box?
Yes—firmware updates are performed via USB or Ethernet using Pfeiffer’s official Vacuum Control Software; no additional license required.
How is bearing health monitored during operation?
The TC 1200 continuously measures motor current draw, rotor acceleration time, and high-frequency vibration signatures—deviations trigger diagnostic alerts before mechanical failure occurs.