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ETI PA5080 CVS Online Analyzer

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Brand ETI
Origin Guangdong, China
Manufacturer Type Authorized Distributor
Origin Category Domestic (China)
Model PA5080
Pricing Upon Request
Application Domain Electroplating Process Monitoring in Electronics, Semiconductor Fabrication, and Metal Surface Finishing
Electrode Configuration Three-Electrode System (Platinum Rotating Disk Working Electrode, 5 mm diameter
Temperature Control Full-System & Flow-Path Thermal Regulation (±0.2 °C stability)
Power Supply 198–242 V AC, 50 Hz ±0.5 Hz, 1000 W
Ambient Operating Range 15–35 °C
Human-Machine Interface 15-inch Full-Color Touchscreen (Windows OS)
Cabinet Dimensions Approx. 650 mm (W) × 750 mm (D) × 1750 mm (H)
Measurement Principle Cyclic Voltammetric Stripping (CVS) with Potentiodynamic Scanning and Faradaic Current Integration
Automation Capability Integrated Reagent Dosing Control for Organic Additive Correction Based on Real-Time Analytical Deviation
Software Compliance Audit Trail, User Access Levels, Electronic Signature Support (FDA 21 CFR Part 11 Ready)

Overview

The ETI PA5080 CVS Online Analyzer is an industrial-grade electrochemical process analyzer engineered for continuous, real-time monitoring of organic additives—accelerators, suppressors, and levelers—in acid copper electroplating baths used across semiconductor wafer fabrication, advanced PCB manufacturing, and precision metal finishing lines. It implements Cyclic Voltammetric Stripping (CVS), a potentiodynamic electroanalytical technique that quantifies additive concentration by measuring the Faradaic current response during controlled potential sweeps across a rotating platinum disk electrode (RDE). The system operates under rigorously stabilized thermal conditions—both bath sampling loop and internal cell temperature are actively regulated to ±0.2 °C—to eliminate thermal drift, a primary source of measurement variance in CVS-based assays. Unlike benchtop CVS instruments, the PA5080 integrates seamlessly into plant-level automation infrastructure via Modbus TCP, OPC UA, and 4–20 mA analog I/O, enabling closed-loop feedback control of replenishment pumps based on statistically validated analytical deviation thresholds.

Key Features

  • Three-electrode electrochemical cell with 5 mm diameter platinum rotating disk working electrode (RDE), Ag/AgCl reference electrode, and platinum auxiliary electrode—optimized for high reproducibility in aggressive sulfuric acid/copper sulfate electrolytes.
  • Full-system temperature regulation architecture: Peltier-controlled bath conditioning module, thermostatically managed flow path, and insulated cell housing ensure thermal homogeneity throughout sample transport and measurement phases.
  • Open-architecture analysis engine: Users may define custom scan parameters—including initial/final potentials, scan rate, rotation speed (100–3000 rpm), and pulse protocols—via intuitive Windows-based touchscreen interface.
  • Automated reagent dosing interface: Programmable logic controller (PLC)-compatible outputs trigger precise metering pump activation when analyte concentrations exceed user-defined upper/lower control limits.
  • Robust industrial cabinet design: IP54-rated enclosure (650 × 750 × 1750 mm) with vibration-damped mounting, integrated filtration, and chemical-resistant wetted materials (PTFE, PEEK, 316L SS) for long-term deployment in harsh production environments.
  • Comprehensive diagnostics: Real-time electrode health monitoring, flow-rate verification, temperature logging, and automatic baseline correction routines embedded in firmware.

Sample Compatibility & Compliance

The PA5080 is validated for use with standard acid copper plating chemistries containing chloride ions (40–80 ppm), sulfuric acid (180–220 g/L), and Cu²⁺ (50–80 g/L). It accommodates organic additive formulations from major suppliers including Atotech, MacDermid Alpha, and Technic. All electrochemical measurements adhere to ASTM B764-20 Standard Test Method for Cyclic Voltammetric Analysis of Acid Copper Plating Baths. Data integrity controls—including operator authentication, time-stamped audit trails, electronic signatures, and immutable raw data storage—meet requirements for GLP and GMP environments. System firmware supports FDA 21 CFR Part 11 compliance when deployed with validated Windows OS configuration and domain-authenticated user management.

Software & Data Management

The embedded Windows 10 IoT Enterprise platform hosts ETI’s proprietary CVSControl Suite, a deterministic, multi-threaded application designed for 24/7 unattended operation. It provides synchronized acquisition of voltammogram traces, peak current integration, calibration curve fitting (linear, quadratic, or user-defined polynomial), and SPC charting (X̄-R, CUSUM). Raw CV data (.cvd binary format) and processed reports (.csv, .pdf) are stored locally on encrypted SSD and optionally mirrored to network shares or cloud-based MES platforms. Role-based access control enforces separation of duties: Operators view live trends and initiate manual dosing; Engineers modify method parameters and perform calibration; Administrators manage users, audit logs, and system updates. All changes are logged with ISO 8601 timestamps, user ID, and before/after values.

Applications

  • Semiconductor backend processes: Monitoring accelerator depletion in through-silicon via (TSV) and redistribution layer (RDL) copper electrofill baths to prevent void formation and ensure uniform step coverage.
  • Advanced packaging: Controlling suppressor concentration in fan-out wafer-level packaging (FOWLP) plating lines to maintain tensile stress profiles within ±5 MPa tolerance.
  • High-reliability PCB manufacturing: Detecting leveler degradation in HDI microvia filling applications where >95% void-free fill is required per IPC-6012 Class 3 specifications.
  • Metal finishing for aerospace components: Enabling predictive maintenance of bright nickel strike baths by correlating CVS-derived additive ratios with deposit ductility (ASTM B488) and corrosion resistance (ASTM B117).
  • Electroplating R&D labs: Supporting DOE-driven formulation optimization through rapid screening of novel additive blends under dynamically adjustable CVS protocols.

FAQ

What electrochemical technique does the PA5080 employ?
It uses Cyclic Voltammetric Stripping (CVS), a potentiodynamic method that measures the charge transfer kinetics of organic additives adsorbed on a rotating platinum electrode surface.
Can the PA5080 interface with existing DCS or MES systems?
Yes—it supports native Modbus TCP, OPC UA (PubSub and Client/Server), and configurable 4–20 mA analog outputs for seamless integration into Emerson DeltaV, Honeywell Experion, Siemens PCS7, and Rockwell FactoryTalk environments.
Is method development possible without vendor support?
Yes—the open method editor allows qualified users to define new scan waveforms, adjust rotation speeds, set integration windows, and import custom calibration models using CSV-formatted reference data.
How frequently does the system require electrode maintenance?
Under typical operating conditions (24/7 in filtered bath streams), the Pt RDE requires polishing every 7–14 days; full electrode assembly replacement is recommended every 6 months or after 2,000 measurement cycles.
Does the PA5080 meet international electrical safety standards?
Yes—it is CE-marked per EN 61010-1:2019 (Safety Requirements for Electrical Equipment for Measurement, Control, and Laboratory Use) and complies with RoHS 2011/65/EU and REACH (EC 1907/2006) directives.

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