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| Brand | Ambrell |
|---|---|
| Origin | USA |
| Model | EASYHEAT 0112 |
| Maximum Power | 1.2 kW |
| Operating Frequency | 150–400 kHz |
| Input Voltage | 105–129 V / 198–250 V, Single-Phase |
| Input Apparent Power | 1.6 kVA |
| Heating Method | Non-contact electromagnetic induction |
| Application Type | Atmospheric (non-vacuum), rapid thermal annealing for conductive materials |
| Brand | Kaufman & Robinson, Inc. (KRI) |
|---|---|
| Origin | USA |
| Model | EH 3000 HC |
| Discharge Voltage/Current | 50–300 V / up to 20 A |
| Beam Divergence (HWHM) | >45° |
| Cooling | Water-cooled |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂ |
| Dimensions | Ø9.7" × H6" |
| Application | IBAD for high-density, uniform optical thin-film deposition |
| Brand | NS |
|---|---|
| Origin | Japan |
| Model | 4 IBE |
| Sample Holder | 4" φ, single wafer |
| Ion Incidence Angle | 0° to ±90° |
| Ion Source | KDC-40 Kaufman-type (KRI, USA) |
| Base Pressure | ≤1×10⁻⁴ Pa |
| Turbomolecular Pump | Pfeiffer, 350 L/s |
| Etch Uniformity | ≤±5% |
| Cooling | Direct substrate cooling |
| Motion Control | Planetary rotation (rotation + revolution) |
| Gas Compatibility | Ar, O₂, N₂, CF₄, Xe, and mixed process gases |
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