Elaborate
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| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Model | ETD-2000MH |
| Target Material | Multiple weak-magnetic targets (e.g., Au, Ag, Pt) |
| Target Diameter | 60–80 mm |
| Control Mode | Manual |
| Chamber Dimensions | Borosilicate glass, Ø180 mm × H240 mm |
| Sample Stage Diameter | 180 mm |
| Sputtering Gases | Ar, N₂, O₂, or custom gas mixtures |
| Ultimate Vacuum | ≤5×10⁻⁵ Pa |
| Pumping System | Turbo-molecular pump (80 L/s) + Two-stage rotary vane backing pump |
| Operating Voltage | 220 V, 50 Hz |
| Sputtering Current Range | 0–500 mA |
| Standard Target | Au (60 mm Ø × 0.1 mm thick) |
| Optional Targets | Ag, Pt, Cr, NiCr, C, etc. |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Model | ETD-80AF |
| Target Material | Carbon Rod |
| Control Method | Manual |
| Chamber Dimensions (D×H) | 170 mm × 200 mm |
| Sample Stage Diameter | 170 mm |
| Base Pressure | 2×10⁻² mbar |
| Operating Voltage | 220 V, 50 Hz |
| Maximum Evaporation Current | 100 A |
| Adjustable Evaporation Current Range | 0–80 A |
| Vacuum Pump | High-Performance Two-Stage Rotary Vane Pump (2 L/s) |
| Compatible Substrates | Non-conductive, beam-sensitive specimens (e.g., biological tissues, polymers, ceramics) |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ETD-SSS |
| Target Material | Stainless Steel |
| Target Diameter | 50 mm |
| Control Method | Manual |
| Chamber Dimensions (Ø × H) | 100 mm |
| Sample Stage Diameter | 15 mm |
| Sputtering Gas | Ambient Air |