Huaai
Filter
Showing all 4 results
| Brand | Huaai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | OEM Manufacturer |
| Model | HA-9660-VOCs |
| Pricing | Upon Request |
| Compliance | HJ 1013–2018, HJ 1010–2018, HJ 1012–2018, GB 16297–1996, DB32/2862–2016, GB 18580–2017, HJ/T 400–2007 |
| Detection Principle | Gas Chromatography with FID/TCD/PDD Detectors |
| Sample Throughput | 50 mL/min |
| Carrier Gas | N₂/H₂/Ar/He (150 mL/min, 0.4 MPa) |
| Analysis Cycle | ≤2 min |
| LOD (NMHC) | ≤0.8 mg/m³ (≈0.13 µmol/mol) |
| Repeatability (RSD) | ≤2% |
| Linearity Error | ±2% F.S. |
| 24-h Drift | ±3% F.S. |
| Power | AC 220 V, 50–60 Hz, 400 W |
| Dimensions | 482 mm (W) × 222 mm (H) × 400 mm (D), 5U Rack-Mountable |
| Weight | 20 kg |
| Data Interface | RS-232/RS-485, Modbus RTU |
| Brand | Huaai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic (China-Made) |
| Model | Fuel Hydrogen Analysis System |
| Pricing | Upon Request |
| Brand | Huaai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Region of Origin | Domestic (China) |
| Model | GC-9560 |
| Instrument Type | Laboratory Gas Chromatograph |
| Application Field | High-Purity Gas Analysis (Specialized for Kr, He, Ne, Xe, Ar) |
| Oven Temperature Range | 0–400 °C |
| Maximum Ramp Rate | 40 °C/min |
| Cooling Rate (350 °C → 50 °C) | ≤8 min |
| Carrier Gas Flow Control Range | 0–500 mL/min |
| Carrier Gas Pressure Control Range | 0–0.4 MPa |
| Injector Maximum Operating Temperature | 399 °C |
| Injector Pressure Setting Range | 0–0.4 MPa |
| Injector Total Flow Setting Range | 0–500 mL/min |
| Detection Limit (for N₂, O₂, CH₄, CO, CO₂, H₂, H₂O, CF₄) | ≤5 ppb (v/v) |
| Detector Type | High-Sensitivity Helium Ionization Detector (HID) |
| Column Configuration | Multi-Column Oven with Independent Temperature Zones |
| Sample Introduction | Dual-Channel Valve System with Purge-Protected Switching Valves |
| Flow Compensation | Automatic Inlet Pressure Correction Algorithm for Variable Base-Gas Matrices |
| Compliance Reference | GB/T 5829–2006 (Krypton Specification), GB/T 28123–2011 (High-Purity Noble Gases), ASTM D7606–22 (Trace Impurity Analysis in Ultra-High-Purity Gases) |
| Brand | Huaai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer | Yes |
| Instrument Type | Laboratory Gas Chromatograph |
| Application | High-Purity Fluorine-Containing Gas Analysis |
| Temperature Control Range | Ambient +8°C to 399°C |
| Oven Ramp Rate | 1–40°C/min |
| Oven Cool-Down Rate | ~7 min (from 350°C to 50°C) |
| Carrier Gas Flow Range & Control | 0–500 mL/min |
| Carrier Gas Pressure Range & Control | 0–0.4 MPa |
| Injector Max Operating Temperature | 399°C |
| Injector Pressure Setpoint Range | 0–0.4 MPa |
| Injector Total Flow Setpoint Range | 0–500 mL/min |
| Detector | Dual Corrosion-Resistant Thermal Conductivity Detectors (TCD) |
| Sampling | Negative-Pressure Sampling with 316L Stainless Steel Adsorption Vessel and PTFE-Sealed Valves |
| Valve Type | VICI 1/8" Six-Port and Four-Port Switching Valves |
| Software | PC-Based Bidirectional Remote Control with 6 Programmable Event Outputs for Valve/Pump Sequencing |
| Compliance | Designed for GLP-compliant HF gas analysis in semiconductor, fluoropolymer, and specialty gas manufacturing environments |
