Rikuri
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| Brand | Rikuri |
|---|---|
| Origin | Japan |
| Model | CuNi-5Z |
| Instrument Type | Portable |
| Detection Principle | Photometric (Absorbance-based) |
| Target Analytes | Cu²⁺, Ni²⁺ |
| Measurement Range | Cu: 0.0–80.0 g/L |
| CuSO₄ | 0.0–300 g/L |
| Ni | 0.0–199.9 g/L |
| Absorbance | 0.000–1.999 AU |
| Temperature | 0.0–50.0 °C |
| Accuracy | ±2% FS |
| Resolution | 0.1 g/L (for metal ions) |
| Response Time | 1 s |
| Operating Environment | −5–45 °C, ≤85% RH |
| Power Supply | 3× AAA alkaline batteries (LR03) |
| Sensor Wetted Materials | PPS, PFA, Fluoroelastomer |
| Cable Length | 2 m |
| Brand | Rikuri |
|---|---|
| Origin | Japan |
| Model | NI-502 |
| Instrument Type | Online Multi-Ion Analyzer |
| Measurement Principle | Absorption Photometry (Visible Spectrophotometric Detection at Characteristic Wavelength) |
| Measurement Range | 0–199.9 g/L (High Range) / 0.00–19.99 g/L (Low Range) |
| Detection Limit | 1 g/L |
| Resolution | 0.1 g/L (High Range), 0.01 g/L (Low Range) |
| Accuracy | ±2% FS |
| Response Time | ≤1 s |
| Output Signal | Isolated 4–20 mA DC (3-Stage Range Selection) |
| Alarm Outputs | Dual SPDT Dry Contacts (AC 200 V, 1 A resistive load max) |
| Operating Environment | 0–40 °C, ≤85% RH |
| Power Supply | AC 85–240 V, 50/60 Hz |
| Sensor Options | High-Temperature Flow-Cell Sensor (for plating bath immersion) or Ambient-Temperature Immersion Probe |
| Compliance | Designed for continuous industrial process monitoring in electroplating and semiconductor wet processing lines |